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    Photoresists, polymers and processes for microlithography
    4.
    发明授权
    Photoresists, polymers and processes for microlithography 有权
    光刻胶，聚合物和微光刻工艺

    公开(公告)号：US07276323B2

    公开(公告)日：2007-10-02

    申请号：US10437760

    申请日：2003-05-14

    申请人： Andrew Edward Feiring ,  Jerald Feldman

    发明人： Andrew Edward Feiring ,  Jerald Feldman

    IPC分类号： G03C1/73 ,  G03F7/038 ,  G03F7/20 ,  G03F7/30 ,  G03F7/32

    CPC分类号： G03F7/0395 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0382 ,  G03F7/039 ,  G03F7/0397 ,  Y10S430/108 ,  Y10S430/111 ,  Y10S430/115

    摘要： Photoresists and associated processes for microlithography in the extreme, far, and near UV are disclosed. The photoresists in some embodiments comprise (a) a fluorine-containing copolymer comprising a repeat unit derived from at least one ethylenically unsaturated compound characterized in that at least one ethylenically unsaturated compound is polycyclic and at least one ethylenically unsaturated compound contains at least one fluorine atom covalently attached to an ethylenically unsaturated carbon atom; and (b) at least one photoactive component. In other embodiments, the photoresists comprise a fluorine-containing copolymer comprising a repeat unit derived from at least one polycyclic ethylenically unsaturated compound having at least one atom or group selected from the group consisting of fluorine atom, perfluoroalkyl group, and perfluoroalkoxy group, characterized in that the at least one atom or group is covalently attached to a carbon atom which is contained within a ring structure and separated from each ethylenically unsaturated carbon atom of the ethylenically unsaturated compound by at least one covalently attached carbon atom. The photoresists have high transparency in the extreme/far UV as well as the near UV, high plasma etch resistance, and are useful for microlithography in the extreme, far, and near ultraviolet (UV) region, particularly at wavelengths ≦365 nm. Novel fluorine-containing copolymers are also disclosed.

    摘要翻译： 公开了在极端的，远的和近的紫外线下的微光刻的光致抗蚀剂和相关的工艺。 在一些实施方案中，光致抗蚀剂包含（a）包含衍生自至少一种烯键式不饱和化合物的重复单元的含氟共聚物，其特征在于至少一种烯属不饱和化合物是多环的，并且至少一种烯属不饱和化合物含有至少一个氟原子 共价连接到烯键式不饱和碳原子上; 和（b）至少一种光活性组分。 在其它实施方案中，光致抗蚀剂包括含有共聚物的含氟共聚物，该共聚物包含衍生自至少一种具有至少一个选自氟原子，全氟烷基和全氟烷氧基的原子或基团的多环烯键式不饱和化合物的重复单元，其特征在于 所述至少一个原子或基团共价连接到环状结构中包含的碳原子，并且通过至少一个共价连接的碳原子与烯属不饱和化合物的每个烯属不饱和碳原子分离。 光致抗蚀剂在极端/远紫外线以及近紫外线，高等离子体蚀刻电阻方面具有高透明度，并且可用于极端，远紫外（UV）区域，特别是在波长<= 365nm处的微光刻。 还公开了新的含氟共聚物。

    Process for making fluoropolymers
    6.
    发明授权
    Process for making fluoropolymers 失效
    制备含氟聚合物的方法

    公开(公告)号：US5639837A

    公开(公告)日：1997-06-17

    申请号：US658676

    申请日：1996-06-04

    申请人： William Brown Farnham ,  Andrew Edward Feiring ,  Bruce Edmund Smart ,  Robert Clayton Wheland

    发明人： William Brown Farnham ,  Andrew Edward Feiring ,  Bruce Edmund Smart ,  Robert Clayton Wheland

    IPC分类号： C08F2/00 ,  C08F14/18

    CPC分类号： C08F14/18

    摘要： Disclosed herein is a process in which fluorine containing olefins are polymerized using an initiation system which is a combination of a fluoroaliphatic sulfinate or sulfinic acid and chlorate, bromate or hypochlorite ions. The resulting polymer contains fewer deleterious end groups and is more stable and/or easier to process. The polymers produced are useful as thermoplastics and elastomers.

    摘要翻译： 本文公开的是使用作为氟代脂族亚磺酸盐或亚磺酸与氯酸盐，溴酸盐或次氯酸盐离子的组合的引发体系聚合含氟烯烃的方法。 所得聚合物含有较少有害的末端基团并且更稳定和/或更容易加工。 所生产的聚合物可用作热塑性塑料和弹性体。