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1.发明申请COPOLYIMIDE, LIQUID CRYSTAL ALIGNING LAYER COMPRISING THE SAME , AND LIQUID CRYSTAL DISPLAY COMPRISING THE SAME 审中-公开含有它们的共聚酰亚胺，液晶结晶层和包含它们的液晶显示器公开(公告)号：US20100060834A1
公开(公告)日：2010-03-11
申请号：US12312191
申请日：2008-01-07
Applicant: Xing-Zhong Fang , Kyung-Jun Kim , Byung-Hyun Lee , Jung-Ho Jo , Dong-Hyun Oh , Wan-Hee Goh , Sang-Kook Kim , Hye-Ran Seong , Hye-Won Jeong , Yun-Jeong Lee
Inventor： Xing-Zhong Fang , Kyung-Jun Kim , Byung-Hyun Lee , Jung-Ho Jo , Dong-Hyun Oh , Wan-Hee Goh , Sang-Kook Kim , Hye-Ran Seong , Hye-Won Jeong , Yun-Jeong Lee
CPC classification number: C08G73/1042 , C08G73/16 , G02F1/133723 , G02F1/133788 , Y10T428/1023
Abstract: The present invention relates to a novel polyimide copolymer, a method of preparing the polyimide copolymer, a liquid crystal aligning layer including the polyimide copolymer, a method of producing the liquid crystal aligning layer, and a liquid crystal display including the liquid crystal aligning layer. The liquid crystal aligning layer that includes the polyimide copolymer according to the present invention is advantageous in that when ultraviolet rays are radiated on movable chains of the polyamic acid copolymer to perform alignment before a polyimide copolymer is imidized and heat treatment is then performed to conduct imidization, thermal stability is excellent, residual images are not formed, and alignment of liquid crystals is excellent.
Abstract translation: 本发明涉及一种新型的聚酰亚胺共聚物，一种聚酰亚胺共聚物的制备方法，包含该聚酰亚胺共聚物的液晶取向层，该液晶取向层的制造方法以及包括该液晶取向层的液晶显示器。 包含本发明的聚酰亚胺共聚物的液晶取向层的优点在于，当聚酰亚胺共聚物酰亚胺化之前，当将聚酰胺酸共聚物的活性链上的紫外线照射到可动链上进行取向，然后进行热处理以进行酰亚胺化时 ，热稳定性优异，不形成残留图像，液晶的取向优异。
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公开(公告)号：US20070161775A1
公开(公告)日：2007-07-12
申请号：US11606299
申请日：2006-11-30
Applicant: Xing-Zhong Fang , Byung-Hyun Lee , Kyung-Jun Kim , Hye-Won Jeong , Yun-Jeong Lee
Inventor： Xing-Zhong Fang , Byung-Hyun Lee , Kyung-Jun Kim , Hye-Won Jeong , Yun-Jeong Lee
IPC: C08G69/08
Abstract: Disclosed is polyimide of the following Formula 1, a polyamic acid which is a precursor of the polyimide, and a method for preparing thereof. In Formula 1, R is a tetravalent organic group, and n is an integer of 1 to 1000. A liquid crystal alignment layer which contains the polyimide according to the present invention has excellent thermal stability, no residual images, and excellent alignment of liquid crystals.
Abstract translation: 公开了下式1的聚酰亚胺，作为聚酰亚胺前体的聚酰胺酸及其制备方法。 在式1中，R为四价有机基团，n为1〜1000的整数。本发明的含有聚酰亚胺的液晶取向膜具有优异的热稳定性，无残留图像，液晶优异取向 。
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3.发明申请Method of producing liquid crystal aligning layer, liquid crystal aligning layer produced using the same, and liquid crystal display including liquid crystal aligning layer 审中-公开制造液晶取向层的方法，使用其制造的液晶取向层以及包括液晶取向层的液晶显示器公开(公告)号：US20070128378A1
公开(公告)日：2007-06-07
申请号：US11606345
申请日：2006-11-30
Applicant: Kyung-Jun Kim , Byung-Hyun Lee , Hye-Won Jeong , Yun-Jeong Lee
Inventor： Kyung-Jun Kim , Byung-Hyun Lee , Hye-Won Jeong , Yun-Jeong Lee
IPC: C09K19/00
CPC classification number: C09D179/08 , C08G73/14 , C08G73/16 , G02F1/133723 , G02F1/133788 , Y10T428/10 , Y10T428/1005
Abstract: Disclosed is a method of producing a liquid crystal aligning layer, a liquid crystal aligning layer produced using the same, and a liquid crystal display including the liquid crystal aligning layer. In the liquid crystal aligning layer that is produced using the method, ultraviolet rays are radiated on movable chains of a polyamic acid polymer while the polyamic acid polymer is not imidized to perform alignment, and heat treatment is then performed to conduct imidization. Thus, thermal stability is excellent, residual images are not formed, and alignment of liquid crystals is excellent.
Abstract translation: 公开了一种制造液晶取向层的方法，使用该方法制造的液晶取向层以及包括该液晶取向层的液晶显示器。 在使用该方法制造的液晶取向层中，在聚酰胺酸聚合物不被酰亚胺化的同时将紫外线照射到聚酰胺酸聚合物的可动链上，进行取向，然后进行热处理进行酰亚胺化。 因此，热稳定性优异，不形成残留图像，液晶的取向优异。
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4.发明授权Alignment film for LCD using photoreactive polymer and LCD comprising the same 有权使用光反应性聚合物的LCD用对准膜和包含该反应性聚合物的LCD公开(公告)号：US07541073B2
公开(公告)日：2009-06-02
申请号：US11334357
申请日：2006-01-19
Applicant: Kyung Jun Kim , Keon Woo Lee , Byung Hyun Lee , Min Young Lim , Hye Won Jeong , Sung Ho Chun , Heon Kim , Sung Joon Oh
Inventor： Kyung Jun Kim , Keon Woo Lee , Byung Hyun Lee , Min Young Lim , Hye Won Jeong , Sung Ho Chun , Heon Kim , Sung Joon Oh
CPC classification number: G02F1/133788 , C08J5/18 , C08J2365/00 , G02F1/133711 , Y10T428/10 , Y10T428/1005 , Y10T428/1036
Abstract: The present invention provides a composition for forming a liquid crystal alignment film, which comprises a photoreactive polymer including a multicyclic compound having a photoreactive group on a main chain thereof. The present invention also provides a liquid crystal alignment film produced using the composition, and a liquid crystal display including the liquid crystal alignment film. The photoreactive polymer including the multicyclic compound on the main chain thereof has a high glass transition temperature, thus thermal stability is excellent. Since lattice vacancy is relatively large, the photoreactive group is capable of moving relatively freely in the main chain of the polymer, thus it is possible to improve a slow photoreaction rate, which is considered a disadvantage of a conventional polymer material.
Abstract translation: 本发明提供了一种用于形成液晶取向膜的组合物，其包含在其主链上包含具有光反应性基团的多环化合物的光反应性聚合物。 本发明还提供使用该组合物制造的液晶取向膜和包括液晶取向膜的液晶显示器。 包含其主链上的多环化合物的光反应性聚合物具有高玻璃化转变温度，因此热稳定性优异。 由于晶格空位相对较大，所以光反应基团能够在聚合物的主链中相对自由地移动，因此可以提高慢的光反应速率，这被认为是常规聚合物材料的缺点。
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公开(公告)号：US09012595B2
公开(公告)日：2015-04-21
申请号：US12940403
申请日：2010-11-05
Applicant: Sang Woo Kim , Chanhyo Park , Kyungjun Kim , Hyeran Seong , Sejin Shin , Hye Won Jeong , Jung Ho Jo
Inventor： Sang Woo Kim , Chanhyo Park , Kyungjun Kim , Hyeran Seong , Sejin Shin , Hye Won Jeong , Jung Ho Jo
CPC classification number: G03F7/0233 , C08G73/1042 , C08L61/04 , C08L79/08 , C08L2205/02 , G03F7/0048 , C08L2666/14
Abstract: The present invention provides polyimide applied to the buffer coating of semiconductors and a photosensitive resin composition including the same. The polyimide is a polyimide polymer represented by Chemical Formula 1 below. Further, the present invention provides a photosensitive resin composition, including 1) BDA-series soluble polyimide having an i-ray permeability of 70% or more; 2) a polyamic acid having elongation of 40% or more; 3) a novolak resin, and 4) diazonaphthoquinone-series photosensitive substance and having a high resolution, high sensitivity, an excellent film characteristic, and mechanical physical properties which are the requirements of semiconductor buffer coating.
Abstract translation: 本发明提供了应用于半导体缓冲涂层的聚酰亚胺和包含其的感光性树脂组合物。 聚酰亚胺是以下化学式1表示的聚酰亚胺聚合物。 此外，本发明提供一种感光性树脂组合物，其包含1）i射线透过率为70％以上的BDA系可溶性聚酰亚胺; 2）延伸率为40％以上的聚酰胺酸; 3）酚醛清漆树脂，4）重氮萘醌系感光性物质，具有高分辨率，高灵敏度，优异的膜特性和作为半导体缓冲涂层要求的机械物理性能。
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Patent Agency Ranking
公开(公告)号：US20110223538A1
公开(公告)日：2011-09-15
申请号：US13046319
申请日：2011-03-11
Applicant: Sang Woo KIM , Kyoung Ho AHN , Kyung Jun KIM , Se Jin SHIN , Hye Won JEONG , Chan Hyo PARK , Jung Ho JO , Yu Na KIM
Inventor： Sang Woo KIM , Kyoung Ho AHN , Kyung Jun KIM , Se Jin SHIN , Hye Won JEONG , Chan Hyo PARK , Jung Ho JO , Yu Na KIM
IPC: G03F7/004
CPC classification number: G03F7/0007 , C08G73/1039 , C08G73/1042 , C08G73/1046 , C08G73/1082 , C09D179/08 , G03F7/0233 , H01B3/30 , H01B3/306
Abstract: Polyimide or a precursor thereof represented by Chemical Formula 1 or 2 and a photosensitive organic insulator composition having the same are disclosed. The polyimide or the precursor thereof is prepared from diamine including polyalkyleneoxide. The use of the photosensitive organic insulator composition can allow for low temperature curing and shorten a curing time, form a low taper angle, and implement a high sensitivity and high residual film. Also, since the photosensitive organic insulator composition, as a positive photosensitive composition, has excellent solubility with respect to an alkali solution of an exposed portion, the generation of impurity can be minimized.
Abstract translation: 公开了由化学式1或2表示的聚酰亚胺或其前体和具有该化合物的光敏有机绝缘体组合物。 聚酰亚胺或其前体由包括聚环氧烷的二胺制备。 使用光敏有机绝缘体组合物可以实现低温固化和缩短固化时间，形成低锥角，并实现高灵敏度和高残留膜。 此外，由于作为正性感光性组合物的感光性有机绝缘体组合物相对于露出部分的碱溶液具有优异的溶解性，因此可以使杂质的产生最小化。
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公开(公告)号：US20110111341A1
公开(公告)日：2011-05-12
申请号：US12940403
申请日：2010-11-05
Applicant: Sang Woo KIM , Chanhyo PARK , Kyungjun KIM , Hyeran SEONG , Sejin SHIN , Hye Won JEONG , Jung Ho JO
Inventor： Sang Woo KIM , Chanhyo PARK , Kyungjun KIM , Hyeran SEONG , Sejin SHIN , Hye Won JEONG , Jung Ho JO
CPC classification number: G03F7/0233 , C08G73/1042 , C08L61/04 , C08L79/08 , C08L2205/02 , G03F7/0048 , C08L2666/14
Abstract: The present invention provides polyimide applied to the buffer coating of semiconductors and a photosensitive resin composition including the same. The polyimide is a polyimide polymer represented by Chemical Formula 1 below. Further, the present invention provides a photosensitive resin composition, including 1) BDA-series soluble polyimide having an i-ray permeability of 70% or more; 2) a polyamic acid having elongation of 40% or more; 3) a novolak resin, and 4) diazonaphthoquinone-series photosensitive substance and having a high resolution, high sensitivity, an excellent film characteristic, and mechanical physical properties which are the requirements of semiconductor buffer coating.
Abstract translation: 本发明提供了应用于半导体缓冲涂层的聚酰亚胺和包含其的感光性树脂组合物。 聚酰亚胺是以下化学式1表示的聚酰亚胺聚合物。 此外，本发明提供一种感光性树脂组合物，其包含1）i射线透过率为70％以上的BDA系可溶性聚酰亚胺; 2）延伸率为40％以上的聚酰胺酸; 3）酚醛清漆树脂，4）重氮萘醌系感光性物质，具有高分辨率，高灵敏度，优异的膜特性和作为半导体缓冲涂层要求的机械物理性能。
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8.发明申请公开(公告)号：US20110046277A1
公开(公告)日：2011-02-24
申请号：US12861761
申请日：2010-08-23
Applicant: Jung Ho JO , Kyung Jun KIM , Hye Ran SEONG , Hye Won JEONG , Chan Hyo PARK , Yu Na KIM , Sang Woo KIM , Se Jin SHIN , Kyoung Ho AHN
Inventor： Jung Ho JO , Kyung Jun KIM , Hye Ran SEONG , Hye Won JEONG , Chan Hyo PARK , Yu Na KIM , Sang Woo KIM , Se Jin SHIN , Kyoung Ho AHN
CPC classification number: G03F7/0233 , C08G73/1042 , C08G73/1046 , C08G73/105 , C08G73/16 , C08L79/08 , G03F7/0048
Abstract: The present invention relates to polyimide or precursor thereof represented by Chemical Formula 1 or 2 and a photosensitive resin composition including the same. The polyimide or precursor thereof are fabricated using diamine comprising polyalkyleneoxide. The photosensitive resin composition of the present invention has excellent light transmissivity, an excellent resolution, and excellent photo sensitivity and image forming performance. Further, the photosensitive resin composition has high adhesiveness with substrates, such as a silicon film, a silicon oxide film, and a metal film. In particular, an excellent film without failure, such as crack, can be formed.
Abstract translation: 本发明涉及由化学式1或2表示的聚酰亚胺或其前体和包含其的感光性树脂组合物。 聚酰亚胺或其前体使用包含聚环氧烷的二胺制造。 本发明的感光性树脂组合物具有优异的透光性，优异的分辨率，优异的光敏性和成像性能。 此外，感光性树脂组合物与硅膜，氧化硅膜，金属膜等基材的粘合性高。 特别地，可以形成无破裂的优异的膜，例如裂纹。
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公开(公告)号：US07795361B2
公开(公告)日：2010-09-14
申请号：US11325414
申请日：2006-01-05
Applicant: Heon Kim , Sung Ho Chun , Keon Woo Lee , Sung Joon Oh , Kyungjun Kim , Jungho Jo , Byung Hyun Lee , Min Young Lim , Hye Won Jeong
Inventor： Heon Kim , Sung Ho Chun , Keon Woo Lee , Sung Joon Oh , Kyungjun Kim , Jungho Jo , Byung Hyun Lee , Min Young Lim , Hye Won Jeong
CPC classification number: C07C69/753 , C07C69/618 , C07C2602/42 , C07D207/404 , C07D311/16 , C08F210/00 , C08F232/08 , C08F4/70
Abstract: Provided are a photoreactive polymer that includes a multi-cyclicmulticyclic compound at as its main chain and a method of preparing the same. The photoreactive polymer exhibits excellent thermal stability since it includes a multi-cyclicmulticyclic compound having a high glass transition temperature at as its main chain. In addition, the photoreactive polymer has a relatively large vacancy so that a photoreactive group can move relatively freely in the main chain therein. As a result, a slow photoreaction rate, which is a disadvantage of a conventional polymer material used to form an alignment layer for a liquid crystal display device, can be overcome.
Abstract translation: 提供一种光反应性聚合物及其制备方法，其包括作为其主链的多环多元环化合物。 光反应性聚合物显示出优异的热稳定性，因为它包括具有高玻璃化转变温度作为其主链的多环多元双环化合物。 此外，光反应性聚合物具有相对大的空位，使得光反应性基团可在其主链中相对自由地移动。 结果，可以克服用于形成用于液晶显示装置的取向层的常规聚合物材料的缺点的缓慢的光反应速率。
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公开(公告)号：USRE45219E1
公开(公告)日：2014-10-28
申请号：US13617667
申请日：2012-09-14
Applicant: Heon Kim , Sung Ho Chun , Keon Woo Lee , Sung Joon Oh , Kyungjun Kim , Jungho Jo , Byung Hyun Lee , Min Young Lim , Hye Won Jeong
Inventor： Heon Kim , Sung Ho Chun , Keon Woo Lee , Sung Joon Oh , Kyungjun Kim , Jungho Jo , Byung Hyun Lee , Min Young Lim , Hye Won Jeong
CPC classification number: C07C69/753 , C07C69/618 , C07C2602/42 , C07D207/404 , C07D311/16 , C08F210/00 , C08F232/08 , C08F4/70
Abstract: Provided are a photoreactive polymer that includes a multi-cyclicmulticyclic compound at as its main chain and a method of preparing the same. The photoreactive polymer exhibits excellent thermal stability since it includes a multi-cyclicmulticyclic compound having a high glass transition temperature at as its main chain. In addition, the photoreactive polymer has a relatively large vacancy so that a photoreactive group can move relatively freely in the main chain therein. As a result, a slow photoreaction rate, which is a disadvantage of a conventional polymer material used to form an alignment layer for a liquid crystal display device, can be overcome.
Abstract translation: 提供一种光反应性聚合物及其制备方法，其包括作为其主链的多环多元环化合物。 光反应性聚合物显示出优异的热稳定性，因为它包括具有高玻璃化转变温度作为其主链的多环多元双环化合物。 此外，光反应性聚合物具有相对大的空位，使得光反应性基团可在其主链中相对自由地移动。 结果，可以克服用于形成用于液晶显示装置的取向层的常规聚合物材料的缺点的缓慢的光反应速率。
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