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公开(公告)号:US20230003788A1
公开(公告)日:2023-01-05
申请号:US17366316
申请日:2021-07-02
申请人: TESSANDRA ANNE SAGE , STANLEY KATSUYOSHI WAKAMIYA , JONATHAN FRANCIS VAN DYKE , KEVIN COLLAO , JOSHUA P. OSBORNE
发明人: TESSANDRA ANNE SAGE , STANLEY KATSUYOSHI WAKAMIYA , JONATHAN FRANCIS VAN DYKE , KEVIN COLLAO , JOSHUA P. OSBORNE
摘要: One example includes a cryogenic wafer test system. The system includes a first chamber that is cooled to a cryogenic temperature and a wafer chuck confined within the first chamber. The wafer chuck can be configured to accommodate a wafer device-under-test (DUT) comprising a plurality of superconducting die. The system also includes at least one wafer prober configured to implement a test on a superconducting die of the plurality of superconducting die via a plurality of electrical probe contacts. The system further includes a wafer chuck actuator system confined within a second chamber. The wafer chuck actuator system can be configured to provide at least one of translational and rotational motion of the wafer chuck to facilitate alignment and contact of a plurality of electrical contacts of the superconducting die to the respective plurality of electrical probe contacts of the at least one wafer prober.
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公开(公告)号:US11693047B2
公开(公告)日:2023-07-04
申请号:US17366316
申请日:2021-07-02
申请人: Tessandra Anne Sage , Stanley Katsuyoshi Wakamiya , Jonathan Francis Van Dyke , Kevin Collao , Joshua P. Osborne
发明人: Tessandra Anne Sage , Stanley Katsuyoshi Wakamiya , Jonathan Francis Van Dyke , Kevin Collao , Joshua P. Osborne
CPC分类号: G01R31/2849 , G01R1/07342
摘要: One example includes a cryogenic wafer test system. The system includes a first chamber that is cooled to a cryogenic temperature and a wafer chuck confined within the first chamber. The wafer chuck can be configured to accommodate a wafer device-under-test (DUT) comprising a plurality of superconducting die. The system also includes at least one wafer prober configured to implement a test on a superconducting die of the plurality of superconducting die via a plurality of electrical probe contacts. The system further includes a wafer chuck actuator system confined within a second chamber. The wafer chuck actuator system can be configured to provide at least one of translational and rotational motion of the wafer chuck to facilitate alignment and contact of a plurality of electrical contacts of the superconducting die to the respective plurality of electrical probe contacts of the at least one wafer prober.
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