公开(公告)号：US20050088638A1

公开(公告)日：2005-04-28

申请号：US10975429

申请日：2004-10-29

申请人： Johannes Jasper ,  Erik Loopstra ,  Theodorus Modderman ,  Gerrit Nijmeijer ,  Nicolaas van Asten ,  Frederik Heuts ,  Jacobus Geman ,  Richard Du Croo de Jongh ,  Marcus Boonman ,  Jacob Klinkhamer ,  Thomas Castenmiller

发明人： Johannes Jasper ,  Erik Loopstra ,  Theodorus Modderman ,  Gerrit Nijmeijer ,  Nicolaas van Asten ,  Frederik Heuts ,  Jacobus Geman ,  Richard Du Croo de Jongh ,  Marcus Boonman ,  Jacob Klinkhamer ,  Thomas Castenmiller

IPC分类号： G01B9/02 ,  G01B11/00 ,  G01B11/02 ,  G01B11/245 ,  G01B11/25 ,  G01B11/30 ,  G03F7/207 ,  G03F7/22 ,  G03F9/00 ,  H01L21/027 ,  G03B27/52

CPC分类号： G03F9/7026 ,  G03F9/70 ,  G03F9/7034 ,  G03F9/7049 ,  G03F9/7096

摘要： In an off-axis levelling procedure a height map of the substrate is generated at a measurement station. The height map is referenced to a physical reference surface of the substrate table. The physical reference surface may be a surface in which is inset a transmission image sensor. At the exposure station the height of the physical reference surface is measured and related to the focal plane of the projection lens. The height map can then be used to determine the optimum height and/or tilt of substrate table to position the exposure area on the substrate in best focus during exposure. The same principles can be applied to (reflective) masks.