公开(公告)号：US06501849B1

公开(公告)日：2002-12-31

申请号：US09474499

申请日：1999-12-29

Applicant: Rajiv Gupta ,  Christopher James Daily ,  Rasiklal Punjalal Shah ,  Valtino Xavier Afonso

Inventor： Rajiv Gupta ,  Christopher James Daily ,  Rasiklal Punjalal Shah ,  Valtino Xavier Afonso

IPC: G06K900

CPC classification number: G06F19/321 ,  A61B6/581 ,  A61B8/565 ,  A61B8/587 ,  G06F19/00 ,  G06T5/50 ,  G06T7/0004 ,  G16H40/40

Abstract: A system for performing image-based diagnosis of a machine includes a database containing a plurality of historical images taken from a plurality of machines, a diagnostic unit configured to diagnose a new artifact image from the machine and to communicate historical and non-historical images or data associated with the system to a remote facility. The plurality of historical images include a plurality of ideal images generated from the plurality of machines using all possible machine settings and a plurality of artifact images generated from the plurality of machines, each of the artifact images having known faults associated therewith and a corresponding corrective action for repairing the faults. The diagnostic unit includes a diagnostic image processor and a diagnostic fault isolator. The diagnostic image processor includes means for finding an ideal image from the plurality of historical images that most closely matches the new artifact image, means for assigning an artifact category to the new artifact image based on the matched ideal image, and means for extracting an artifact feature from the new artifact image according to the assigned category. The diagnostic fault isolator includes means for generating a plurality of metrics for the extracted artifact feature and means for applying the plurality of metrics to identify an artifact image from the plurality of historical images that most closely matches the new artifact image and a corrective action for repairing the unknown fault.

Abstract translation: 用于执行机器的基于图像的诊断的系统包括：数据库，其包含从多个机器获取的多个历史图像;诊断单元，被配置为诊断来自机器的新的伪影图像，并且传达历史和非历史图像; 与系统相关联的数据到远程设施。 多个历史图像包括使用所有可能的机器设置从多个机器生成的多个理想图像和从多个机器产生的多个伪像图像，每个伪影图像具有与之相关联的已知故障和相应的校正动作 用于修理故障。 诊断单元包括诊断图像处理器和诊断故障隔离器。 所述诊断图像处理器包括用于从所述多个与所述新伪影图像最接近匹配的历史图像中找到理想图像的装置，用于基于匹配的理想图像将伪像类别分配给所述新伪影图像的装置，以及用于提取伪像的装置 根据分配的类别从新的工件图像的特征。 诊断故障隔离器包括用于生成用于所提取的伪影特征的多个度量的装置，以及用于应用所述多个度量来识别来自最接近匹配新伪影图像的多个历史图像和修复修正动作的装置的装置 未知故障。

公开(公告)号：US20050204216A1

公开(公告)日：2005-09-15

申请号：US10798912

申请日：2004-03-11

Applicant: James Daily ,  Steven Douskey ,  Michael Hamilton

Inventor： James Daily ,  Steven Douskey ,  Michael Hamilton

IPC: G01R31/28 ,  G01R31/3185 ,  G06F11/00

CPC classification number: G01R31/318563

Abstract: A method and apparatus are provided for customizing and monitoring multiple interfaces, such as, multiple IEEE 1149.1 standard joint test access group (JTAG) interfaces and implementing enhanced fault tolerance and isolation features. A first interface is connected to a pair of master sources. A second interface is connected to a plurality of target interfaces; and a third interface is provided for a plurality of predefined control signals. A pair of redundant selectors is provided for coupling a select signal to the first multiplexer for selecting one of the plurality of target interfaces. A pair of redundant ATTENTION monitor functions is provided for monitoring ATTENTION signals for each of the plurality of target interfaces

Abstract translation: 提供了一种方法和装置，用于定制和监视多个接口，例如多个IEEE 1149.1标准联合测试接入组（JTAG）接口，并实现增强的容错和隔离特性。 第一个接口连接到一对主源。 第二接口连接到多个目标接口; 并且为多个预定义的控制信号提供第三接口。 提供一对冗余选择器，用于将选择信号耦合到第一多路复用器，用于选择多个目标接口之一。 提供了一对冗余注意监视功能，用于监视多个目标接口中的每一个的“注意”信号

公开(公告)号：US20060151072A1

公开(公告)日：2006-07-13

申请号：US10553841

申请日：2004-04-15

Applicant: James Daily ,  Brad Lemon ,  Joseph Hirt ,  Prabhat Kumar ,  Gerhard Gille

Inventor： James Daily ,  Brad Lemon ,  Joseph Hirt ,  Prabhat Kumar ,  Gerhard Gille

IPC: C22C27/04 ,  C22F1/18

CPC classification number: C22B34/34 ,  B21C23/001 ,  B21C23/01 ,  B21J1/025 ,  B21J5/00 ,  B22F3/16 ,  B22F3/162 ,  B22F3/24 ,  B22F2003/248 ,  B22F2998/00 ,  B22F2998/10 ,  C22C1/02 ,  C22C1/1094 ,  C22C27/04 ,  C22C32/0031 ,  C22F1/18 ,  C23C14/3414 ,  H01J2235/081 ,  H05H6/00 ,  B22F9/24 ,  B22F3/20 ,  B22F3/17

Abstract: The invention relates to a process for making a cross-directionally worked molybdenum plate, the process comprising: (a) reducing ammonium molybdate and forming molybdenum metal powder; (b) consolidating a molybdenum component comprised of molybdenum metal powder and an alloying element to a first workpiece, the alloying element being selected from the group consisting of titanium, zirconium, hafnium, carbon, lanthanum oxide, and combinations thereof; (c) thermally treating the first workpiece and subjecting the workpiece to thermo-mechanical forces in a first direction, and thereby forming a second workpiece; (d) thermally treating the second workpiece and subjecting the second workpiece to thermo-mechanical forces in a second direction that is different from the first direction; (e) subjecting the thermomechanically treated second workpiece to a recrystallization heat treatment step, and thereby forming a heat-treated crossdirectionally worked workpiece; and (f) subjecting the heat-treated, cross-directionally worked workpiece to a slicing step or a machining step, and thereby forming the cross-directionally worked molybdenum plate. The invention also relates to X-ray targets made from the process.

Abstract translation: 本发明涉及制造交叉方向加工的钼板的方法，该方法包括：（a）还原钼酸铵并形成钼金属粉末; （b）将由钼金属粉末和合金元素组成的钼组分固结到第一工件，所述合金元素选自钛，锆，铪，碳，氧化镧及其组合; （c）热处理所述第一工件并使所述工件在第一方向上受到热机械力，从而形成第二工件; （d）对所述第二工件进行热处理并使所述第二工件在与所述第一方向不同的第二方向上进行热机械力; （e）对热机械处理的第二工件进行再结晶热处理步骤，从而形成经热处理的横向加工的工件; 和（f）对经热处理的交叉方向加工的工件进行切片步骤或机械加工步骤，从而形成交叉加工的钼板。 本发明还涉及由该方法制成的X射线靶。

公开(公告)号：US20060042728A1

公开(公告)日：2006-03-02

申请号：US10931203

申请日：2004-08-31

Applicant: Brad Lemon ,  Joseph Hirt ,  Timothy Welling ,  James Daily ,  David Meendering ,  Gary Rozak ,  Jerome O'Grady ,  Peter Jepson ,  Prabhat Kumar ,  Steven Miller ,  Rong-Chein Wu ,  David Schwartz

Inventor： Brad Lemon ,  Joseph Hirt ,  Timothy Welling ,  James Daily ,  David Meendering ,  Gary Rozak ,  Jerome O'Grady ,  Peter Jepson ,  Prabhat Kumar ,  Steven Miller ,  Rong-Chein Wu ,  David Schwartz

IPC: C22F1/18

CPC classification number: C23C14/3414 ,  B22F1/0003 ,  B22F3/16 ,  B22F3/162 ,  B22F3/24 ,  B22F5/006 ,  B22F2003/248 ,  B22F2301/20 ,  B22F2998/00 ,  B22F2998/10 ,  C21D8/0221 ,  C21D8/0247 ,  C22C1/045 ,  C22C27/04 ,  C22F1/18 ,  C23C14/14 ,  C23C14/3478 ,  C23C14/3485 ,  C23C14/35 ,  C23C14/46 ,  B22F3/172 ,  B22F3/20 ,  B22F3/04 ,  B22F3/10

Abstract: Molybdenum, sputtering targets and sintering characterized as having no or minimal texture banding or through thickness gradient. The molybdenum sputtering targets having a fine, uniform grain size as well as uniform texture, are high purity and can be micro-alloyed to improved performance. The sputtering targets can be round discs, square, rectangular or tubular and can be sputtered to form thin films on substrates. By using a segment-forming method, the size of the sputtering target can be up to 6 m×5.5 m. The thin films can be used in electronic components such as Thin Film Transistor—Liquid Crystal Displays, Plasma Display Panels, Organic Light Emitting Diodes, Inorganic Light Emitting Diode Displays, Field Emission Displays, solar cells, sensors, semiconductor devices, and gate device for CMOS (complementary metal oxide semiconductor) with tunable work functions.

Abstract translation: 钼，溅射靶和烧结表征为没有或最小纹理条纹或通过厚度梯度。 具有精细，均匀的晶粒尺寸以及均匀织构的钼溅射靶是高纯度的，并且可以微合金化以改善性能。 溅射靶可以是圆盘，正方形，矩形或管状，并且可以溅射以在基底上形成薄膜。 通过使用段形成方法，溅射靶的尺寸可以达到6m×5.5μm。 薄膜可以用于薄膜晶体管 - 液晶显示器，等离子体显示面板，有机发光二极管，无机发光二极管显示器，场发射显示器，太阳能电池，传感器，半导体器件和门装置等电子部件中 CMOS（互补金属氧化物半导体）具有可调功能。