公开(公告)号：US20100028790A1

公开(公告)日：2010-02-04

申请号：US12476578

申请日：2009-06-02

申请人： Rolf Seltmann ,  Jens Busch ,  Uwe Schulze

发明人： Rolf Seltmann ,  Jens Busch ,  Uwe Schulze

IPC分类号： G03F7/20 ,  G03B27/42

CPC分类号： G03F9/7046 ,  G03F7/70525 ,  G03F7/70633 ,  G03F9/7088

摘要： By taking into consideration the combination of the substrate holders in various lithography tools used during the imaging to two subsequent device layers, enhanced alignment accuracy may be accomplished. Furthermore, restrictive tool dedications for critical lithography processes may be significantly relaxed by providing specific overlay correction data for each possible process flow, wherein, in some illustrative embodiments, a restriction of the number of possible process flows may be accomplished by implementing a rule for selecting a predefined substrate holder when starting the processing of an associated group of substrates.

摘要翻译： 通过考虑到在成像期间使用的各种光刻工具中的衬底保持器与两个后续器件层的组合，可以实现增强的对准精度。 此外，通过为每个可能的处理流程提供特定的覆盖校正数据，可以显着地减轻关键光刻工艺的限制性工具，其中在一些说明性实施例中，可以通过实施用于选择的规则来实现对可能的工艺流程的限制 当开始相关联的基片组的处理时，预定义的衬底保持器。

公开(公告)号：US08039181B2

公开(公告)日：2011-10-18

申请号：US12476578

申请日：2009-06-02

申请人： Rolf Seltmann ,  Jens Busch ,  Uwe Schulze

发明人： Rolf Seltmann ,  Jens Busch ,  Uwe Schulze

IPC分类号： G03C5/00 ,  G03F9/00

CPC分类号： G03F9/7046 ,  G03F7/70525 ,  G03F7/70633 ,  G03F9/7088

摘要： By taking into consideration the combination of the substrate holders in various lithography tools used during the imaging to two subsequent device layers, enhanced alignment accuracy may be accomplished. Furthermore, restrictive tool dedications for critical lithography processes may be significantly relaxed by providing specific overlay correction data for each possible process flow, wherein, in some illustrative embodiments, a restriction of the number of possible process flows may be accomplished by implementing a rule for selecting a predefined substrate holder when starting the processing of an associated group of substrates.

摘要翻译： 通过考虑到在成像期间使用的各种光刻工具中的衬底保持器与两个后续器件层的组合，可以实现增强的对准精度。 此外，通过为每个可能的处理流程提供特定的覆盖校正数据，可以显着地减轻关键光刻工艺的限制性工具，其中在一些说明性实施例中，可以通过实施用于选择的规则来实现对可能的工艺流程的限制 当开始相关联的基片组的处理时，预定义的衬底保持器。

公开(公告)号：US20100249967A1

公开(公告)日：2010-09-30

申请号：US12415258

申请日：2009-03-31

申请人： Robert Barlovic ,  Uwe Schulze ,  Jan Raebiger ,  Joerg Weigang ,  Jens Busch ,  Rolf Seltmann

发明人： Robert Barlovic ,  Uwe Schulze ,  Jan Raebiger ,  Joerg Weigang ,  Jens Busch ,  Rolf Seltmann

IPC分类号： G06F17/00

CPC分类号： G05B19/41865 ,  G05B2219/31459 ,  G05B2219/32269 ,  Y02P90/20 ,  Y10T83/0457 ,  Y10T83/155 ,  Y10T483/1712

摘要： Metrology data associated with a plurality of workpieces processed at a selected operation in the process flow including a plurality of operations is retrieved. A processing context associated with each of the workpieces is determined. The processing context identifies at least one previous tool used to perform an operation on the associated workpiece prior to the selected operation. A plurality of performance metrics is determined for a plurality of tools capable of performing the selected operation based on the metrology data. Each performance metric is associated with a particular tool and a particular processing context. A set of the performance metrics is identified for the plurality of tools having a processing context matching a processing context of a selected workpiece awaiting performance of the selected operation. The selected workpiece is dispatched for processing in a selected one of the plurality of tools based on the set of performance metrics.

摘要翻译： 检索与在包括多个操作的处理流程中的所选操作处理的多个工件相关联的计量数据。 确定与每个工件相关联的处理上下文。 处理上下文在所选择的操作之前识别用于对相关联的工件执行操作的至少一个先前的工具。 针对能够基于测量数据执行所选择的操作的多个工具确定多个性能度量。 每个性能度量与特定工具和特定的处理环境相关联。 针对具有与所选择的工件等待执行所选择的操作的所选择的工件的处理环境匹配的处理环境的多个工具识别出一组性能度量。 基于所述一组性能度量，在所述多个工具中选择的一个工具中调度所选择的工件以进行处理。

公开(公告)号：US08155770B2

公开(公告)日：2012-04-10

申请号：US12415258

申请日：2009-03-31

申请人： Robert Barlovic ,  Uwe Schulze ,  Jan Raebiger ,  Joerg Weigang ,  Jens Busch ,  Rolf Seltmann

发明人： Robert Barlovic ,  Uwe Schulze ,  Jan Raebiger ,  Joerg Weigang ,  Jens Busch ,  Rolf Seltmann

IPC分类号： B26D5/00 ,  G06F19/00 ,  B31B1/00 ,  B31B1/28 ,  B26D7/06

CPC分类号： G05B19/41865 ,  G05B2219/31459 ,  G05B2219/32269 ,  Y02P90/20 ,  Y10T83/0457 ,  Y10T83/155 ,  Y10T483/1712

摘要： Metrology data associated with a plurality of workpieces processed at a selected operation in the process flow including a plurality of operations is retrieved. A processing context associated with each of the workpieces is determined. The processing context identifies at least one previous tool used to perform an operation on the associated workpiece prior to the selected operation. A plurality of performance metrics is determined for a plurality of tools capable of performing the selected operation based on the metrology data. Each performance metric is associated with a particular tool and a particular processing context. A set of the performance metrics is identified for the plurality of tools having a processing context matching a processing context of a selected workpiece awaiting performance of the selected operation. The selected workpiece is dispatched for processing in a selected one of the plurality of tools based on the set of performance metrics.

摘要翻译： 检索与在包括多个操作的处理流程中的所选操作处理的多个工件相关联的计量数据。 确定与每个工件相关联的处理上下文。 处理上下文在所选择的操作之前识别用于对相关联的工件执行操作的至少一个先前的工具。 针对能够基于测量数据执行所选择的操作的多个工具确定多个性能度量。 每个性能度量与特定工具和特定的处理环境相关联。 针对具有与所选择的工件等待执行所选择的操作的所选择的工件的处理环境匹配的处理环境的多个工具识别出一组性能度量。 基于所述一组性能度量，在所述多个工具中选择的一个工具中调度所选择的工件以进行处理。