Method of providing a patterned relief of cured photoresist on a flat
substrate surface and device for carrying out such a method
    2.
    发明授权
    Method of providing a patterned relief of cured photoresist on a flat substrate surface and device for carrying out such a method 失效
    在平坦基板表面上提供固化的光致抗蚀剂的图案化浮雕的方法和用于执行这种方法的装置

    公开(公告)号:US5425848A

    公开(公告)日:1995-06-20

    申请号:US214888

    申请日:1994-03-15

    摘要: A description is given of a method and a device (1) for providing (replicating) a patterned resyntetic resin relief (37) on the surface (25) of a glass substrate (27). For this purpose, a UV-curable acrylate lacquer (33) is applied to the surface (25), after which a transparent mould (3) having a relief (13) is rolled-off over the surface (25). By means of a UV light source (17) and an elliptic mirror (21), the lacquer is cured at the location of the focal line (23), thereby forming said relief (37). The relief (13) of the mould (3) is replicated on the glass substrate (27). The method described enables a relief of small dimensions (10.times.10 .mu.m) to be seamlessly provided on a large fiat surface (1.times.1 m), without being hindered by large release forces.

    摘要翻译: 给出了在玻璃基板(27)的表面(25)上提供(复制)图案化再生树脂浮雕(37)的方法和装置(1)的描述。 为此,将UV可固化的丙烯酸酯漆(33)施加到表面(25)上,之后在表面(25)上滚动具有浮雕(13)的透明模具(3)。 通过UV光源(17)和椭圆镜(21),在焦线(23)的位置处固化漆,从而形成所述浮雕(37)。 模具(3)的浮雕(13)被复制在玻璃基板(27)上。 所描述的方法使得可以在大的平坦表面(1x1m)上无缝地提供小尺寸(10x10μm)的浮雕,而不受大的释放力的阻碍。