Developer for a photopolymer protective layer
    2.
    发明申请
    Developer for a photopolymer protective layer 审中-公开
    光敏聚合物保护层的显影剂

    公开(公告)号:US20100261116A1

    公开(公告)日:2010-10-14

    申请号:US11803451

    申请日:2007-05-14

    IPC分类号: G03F7/004 G03F7/20

    摘要: This invention relates to a composition used as a developer that contains a surfactant to improve the developing of photoresist, which may contain at least 50 mol % of monomers containing carboxylic acid. The present invention is also a process for the use of the composition.

    摘要翻译: 本发明涉及用作显影剂的组合物,该组合物含有用于改善光致抗蚀剂显影的表面活性剂,其可以含有至少50mol%含羧酸的单体。 本发明也是使用该组合物的方法。