Method for manufacturing vertical germanium detectors
    4.
    发明授权
    Method for manufacturing vertical germanium detectors 失效
    垂直锗探测器的制造方法

    公开(公告)号:US07736934B2

    公开(公告)日:2010-06-15

    申请号:US12517712

    申请日:2008-10-20

    IPC分类号: H01L21/00

    摘要: An improved method for manufacturing a vertical germanium detector is disclosed. Initially, a detector window is opened through an oxide layer on a single crystalline substrate. Next, a single crystal germanium layer is grown within the detector window, and an amorphous germanium layer is grown on the oxide layer. The amorphous germanium layer is then polished and removed until only a portion of the amorphous germanium layer is located around the single crystal germanium layer. A tetraethyl orthosilicate (TEOS) layer is deposited on the amorphous germanium layer and the single crystal germanium layer. An implant is subsequently performed on the single crystal germanium layer. After an oxide window has been opened on the TEOS layer, a titanium layer is deposited on the single crystal germanium layer to form a vertical germanium detector.

    摘要翻译: 公开了用于制造垂直锗探测器的改进方法。 最初,检测器窗口通过单晶衬底上的氧化物层开放。 接下来,在检测器窗口内生长单晶锗层,并且在氧化物层上生长非晶锗层。 然后抛光和去除无定形锗层,直到只有一部分非晶锗层位于单晶锗层周围。 在无定形锗层和单晶锗层上沉积原硅酸四乙酯(TEOS)层。 随后在单晶锗层上进行植入。 在TEOS层上打开氧化物窗后,在单晶锗层上沉积钛层以形成垂直锗检测器。

    Method for Manufacturing Vertical Germanium Detectors
    5.
    发明申请
    Method for Manufacturing Vertical Germanium Detectors 失效
    制造垂直锗探测器的方法

    公开(公告)号:US20100029033A1

    公开(公告)日:2010-02-04

    申请号:US12517712

    申请日:2008-10-20

    IPC分类号: H01L31/0232

    摘要: An improved method for manufacturing a vertical germanium detector is disclosed. Initially, a detector window is opened through an oxide layer on a single crystalline substrate. Next, a single crystal germanium layer is grown within the detector window, and an amorphous germanium layer is grown on the oxide layer. The amorphous germanium layer is then polished and removed until only a portion of the amorphous germanium layer is located around the single crystal germanium layer. A tetraethyl orthosilicate (TEOS) layer is deposited on the amorphous germanium layer and the single crystal germanium layer. An implant is subsequently performed on the single crystal germanium layer. After an oxide window has been opened on the TEOS layer, a titanium layer is deposited on the single crystal germanium layer to form a vertical germanium detector.

    摘要翻译: 公开了用于制造垂直锗探测器的改进方法。 最初,检测器窗口通过单晶衬底上的氧化物层开放。 接下来,在检测器窗口内生长单晶锗层,并且在氧化物层上生长非晶锗层。 然后抛光和去除无定形锗层,直到只有一部分非晶锗层位于单晶锗层周围。 在无定形锗层和单晶锗层上沉积原硅酸四乙酯(TEOS)层。 随后在单晶锗层上进行植入。 在TEOS层上打开氧化物窗后,在单晶锗层上沉积钛层以形成垂直锗检测器。