公开(公告)号：US07551375B2

公开(公告)日：2009-06-23

申请号：US11386236

申请日：2006-03-21

申请人： Johannes Rau ,  Josef Distl ,  Armin Schoeppach ,  Hubert Holderer

发明人： Johannes Rau ,  Josef Distl ,  Armin Schoeppach ,  Hubert Holderer

IPC分类号： G02B7/02

CPC分类号： G03F7/70825 ,  C03C27/046 ,  C04B37/04 ,  C04B2237/12 ,  Y10T29/49144

摘要： The invention relates to processes for connecting an optical element of a microlithographic projection exposure apparatus to a mount, and also relates to an assembly. A process includes the following steps: forming a substance mixture at a processing temperature from at least a first component, which is solid at the processing temperature, and a second component, which is liquid at the processing temperature, the first component being dispersed in the second component, introducing the substance mixture in the unset state between the optical element and the mount, and setting the substance mixture so as to form a diffusion alloy from the first and second components.

摘要翻译： 本发明涉及用于将微光刻投影曝光装置的光学元件连接到安装件的方法，并且还涉及一种组件。 一种方法包括以下步骤：在加工温度下从处于加工温度下为固体的至少第一组分和在处理温度下为液体的第二组分形成物质混合物，第一组分分散在 将所述物质混合物引入所述光学元件和所述安装件之间的未设定状态，并且将所述物质混合物设定为从所述第一和第二成分形成扩散合金。

公开(公告)号：US20060243779A1

公开(公告)日：2006-11-02

申请号：US11386236

申请日：2006-03-21

申请人： Johannes Rau ,  Josef Distl ,  Armin Schoeppach ,  Hubert Holderer

发明人： Johannes Rau ,  Josef Distl ,  Armin Schoeppach ,  Hubert Holderer

IPC分类号： B23K31/02

CPC分类号： G03F7/70825 ,  C03C27/046 ,  C04B37/04 ,  C04B2237/12 ,  Y10T29/49144

摘要： The invention relates to processes for connecting an optical element of a microlithographic projection exposure apparatus to a mount, and also relates to an assembly. A process includes the following steps: forming a substance mixture at a processing temperature from at least a first component, which is solid at the processing temperature, and a second component, which is liquid at the processing temperature, the first component being dispersed in the second component, introducing the substance mixture in the unset state between the optical element and the mount, and setting the substance mixture so as to form a diffusion alloy from the first and second components.

公开(公告)号：US06824277B2

公开(公告)日：2004-11-30

申请号：US10079580

申请日：2002-02-22

申请人： Ansgar Freitag ,  Ulrich Bingel ,  Josef Distl ,  Uwe W. Hamm

发明人： Ansgar Freitag ,  Ulrich Bingel ,  Josef Distl ,  Uwe W. Hamm

IPC分类号： G02B702

CPC分类号： G02B7/02 ,  G02B27/0006 ,  G03F7/70808 ,  G03F7/70825 ,  G03F7/70883 ,  G03F7/70916 ,  G03F7/70983 ,  Y10S359/90 ,  Y10T428/31678

摘要： A method for reducing the contamination of at least one optical component (2, 3) contained in the beam guidance space (6) and held by a frame (4, 5) defining the beam guidance space and a corresponding optical beam guidance system. The surfaces of the frame bordering on the beam guidance space are at least partially coated with a degassing barrier layer (7) that preferably does not increase reflectivity. The method and system have use, for example, in lithography irradiation systems working with UV light.

摘要翻译： 一种用于减少包含在光束引导空间（6）中并由限定光束引导空间的框架（4,5）保持的至少一个光学部件（2,3）的污染的方法和相应的光束引导系统。 与束引导空间相邻的框架的表面至少部分地涂覆有优选不增加反射率的脱气阻挡层（7）。 该方法和系统例如在使用UV光的光刻照射系统中使用。