公开(公告)号：US20130001722A1

公开(公告)日：2013-01-03

申请号：US13174073

申请日：2011-06-30

Applicant: Cheng-Tsung Chen ,  Hsun-Ying Huang ,  Yung-Cheng Chang ,  Yung-Fu Yeh ,  Yu-Ping Chen ,  Chi-Yuan Liang ,  Shou Shu Lu ,  Juan-Lin Chen ,  Jia-Ren Chen ,  Horng-Daw Shen ,  Chi-Hsun Hsieh

Inventor： Cheng-Tsung Chen ,  Hsun-Ying Huang ,  Yung-Cheng Chang ,  Yung-Fu Yeh ,  Yu-Ping Chen ,  Chi-Yuan Liang ,  Shou Shu Lu ,  Juan-Lin Chen ,  Jia-Ren Chen ,  Horng-Daw Shen ,  Chi-Hsun Hsieh

IPC: H01L31/0232

CPC classification number: H01L31/02325 ,  H01L27/1461 ,  H01L27/1463 ,  H01L27/1464 ,  H01L27/14689 ,  H01L31/0248

Abstract: A system and method for image sensing is disclosed. An embodiment comprises a substrate with a pixel region, the substrate having a front side and a backside. A co-implant process is performed along the backside of the substrate opposing a photosensitive element positioned along the front side of the substrate. The co-implant process utilizes a first pre-amorphization implant process that creates a pre-amorphization region. A dopant is then implanted wherein the pre-amorphization region retards or reduces the diffusion or tailing of the dopants into the photosensitive region. An anti-reflective layer, a color filter, and a microlens may also be formed over the co-implant region.

Abstract translation: 公开了一种用于图像感测的系统和方法。 实施例包括具有像素区域的基板，该基板具有正面和背面。 沿着基板的背面与沿着基板的前侧定位的感光元件相对地进行共注入工艺。 共同植入工艺利用产生前非晶化区域的第一预非晶化植入工艺。 然后注入掺杂剂，其中预非晶化区域延迟或减少掺杂剂进入感光区域的扩散或拖尾。 还可以在共植入区域上形成抗反射层，滤色器和微透镜。

公开(公告)号：US20080296472A1

公开(公告)日：2008-12-04

申请号：US11809644

申请日：2007-06-01

Applicant: Juan-Lin Chen ,  Yung-Fu Yeh ,  Yuk-Tong Lee ,  Nai-Han Cheng

Inventor： Juan-Lin Chen ,  Yung-Fu Yeh ,  Yuk-Tong Lee ,  Nai-Han Cheng

IPC: H01J37/244

CPC classification number: H01J37/3171 ,  H01J37/243 ,  H01J37/304 ,  H01J2237/30472 ,  H01J2237/31703

Abstract: An apparatus for monitoring beam currents of an implanter is provided. The apparatus includes a beam-sensing unit for sensing the beam currents; a position-determining unit for determining scan positions; and a computing unit. The computing unit is configured to perform the functions of receiving the beam currents from the beam-sensing unit; receiving the scan positions from the position-determining unit; and determining a drift status of the implanter from the beam currents, wherein the computing unit is configured to receive the beam currents and the scan position periodically between a starting time and an ending time of a scan process of the implanter.

Abstract translation: 提供一种用于监测注入机的束电流的装置。 该装置包括用于感测束电流的光束感测单元; 位置确定单元，用于确定扫描位置; 和计算单元。 所述计算单元被配置为执行从所述波束感测单元接收波束电流的功能; 从所述位置确定单元接收扫描位置; 以及从所述束电流确定所述注入器的漂移状态，其中所述计算单元被配置为在所述注入器的扫描处理的开始时间和结束时间之间周期性地接收所述波束电流和所述扫描位置。

公开(公告)号：US09048069B2

公开(公告)日：2015-06-02

申请号：US11809644

申请日：2007-06-01

Applicant: Juan-Lin Chen ,  Yung-Fu Yeh ,  Yuk-Tong Lee ,  Nai-Han Cheng

Inventor： Juan-Lin Chen ,  Yung-Fu Yeh ,  Yuk-Tong Lee ,  Nai-Han Cheng

IPC: H01J37/244 ,  H01J37/317 ,  H01J37/24 ,  H01J37/304

CPC classification number: H01J37/3171 ,  H01J37/243 ,  H01J37/304 ,  H01J2237/30472 ,  H01J2237/31703

Abstract: An apparatus for monitoring beam currents of an implanter is provided. The apparatus includes a beam-sensing unit for sensing the beam currents; a position-determining unit for determining scan positions; and a computing unit. The computing unit is configured to perform the functions of receiving the beam currents from the beam-sensing unit; receiving the scan positions from the position-determining unit; and determining a drift status of the implanter from the beam currents, wherein the computing unit is configured to receive the beam currents and the scan position periodically between a starting time and an ending time of a scan process of the implanter.

Abstract translation: 提供一种用于监测注入机的束流的装置。 该装置包括用于感测束电流的光束感测单元; 位置确定单元，用于确定扫描位置; 和计算单元。 所述计算单元被配置为执行从所述波束感测单元接收波束电流的功能; 从所述位置确定单元接收扫描位置; 以及从所述束电流确定所述注入器的漂移状态，其中所述计算单元被配置为在所述注入器的扫描处理的开始时间和结束时间之间周期性地接收所述波束电流和所述扫描位置。

公开(公告)号：US08466530B2

公开(公告)日：2013-06-18

申请号：US13174073

申请日：2011-06-30

Applicant: Cheng-Tsung Chen ,  Hsun-Ying Huang ,  Yung-Cheng Chang ,  Yung-Fu Yeh ,  Yu-Ping Chen ,  Chi-Yuan Liang ,  Shou Shu Lu ,  Juan-Lin Chen ,  Jia-Ren Chen ,  Horng-Daw Shen ,  Chi-Hsun Hsieh

Inventor： Cheng-Tsung Chen ,  Hsun-Ying Huang ,  Yung-Cheng Chang ,  Yung-Fu Yeh ,  Yu-Ping Chen ,  Chi-Yuan Liang ,  Shou Shu Lu ,  Juan-Lin Chen ,  Jia-Ren Chen ,  Horng-Daw Shen ,  Chi-Hsun Hsieh

IPC: H01L31/0232

CPC classification number: H01L31/02325 ,  H01L27/1461 ,  H01L27/1463 ,  H01L27/1464 ,  H01L27/14689 ,  H01L31/0248

Abstract: A system and method for image sensing is disclosed. An embodiment comprises a substrate with a pixel region, the substrate having a front side and a backside. A co-implant process is performed along the backside of the substrate opposing a photosensitive element positioned along the front side of the substrate. The co-implant process utilizes a first pre-amorphization implant process that creates a pre-amorphization region. A dopant is then implanted wherein the pre-amorphization region retards or reduces the diffusion or tailing of the dopants into the photosensitive region. An anti-reflective layer, a color filter, and a microlens may also be formed over the co-implant region.

Abstract translation: 公开了一种用于图像感测的系统和方法。 实施例包括具有像素区域的基板，该基板具有正面和背面。 沿着基板的背面与沿着基板的前侧定位的感光元件相对地进行共注入工艺。 共同植入工艺利用产生前非晶化区域的第一预非晶化植入工艺。 然后注入掺杂剂，其中预非晶化区域延迟或减少掺杂剂进入感光区域的扩散或拖尾。 还可以在共植入区域上形成抗反射层，滤色器和微透镜。