公开(公告)号：US20160148822A1

公开(公告)日：2016-05-26

申请号：US14555467

申请日：2014-11-26

申请人： Phillip Criminale ,  Justin Phi ,  Dan A. Marohl ,  Sergio Fukuda Shoji ,  Brad L. Mays

发明人： Phillip Criminale ,  Justin Phi ,  Dan A. Marohl ,  Sergio Fukuda Shoji ,  Brad L. Mays

IPC分类号： H01L21/67 ,  H01L21/66 ,  H01L21/683 ,  H01J37/32 ,  H01L21/3065

CPC分类号： H01L21/67248 ,  H01J37/32724 ,  H01L21/67017 ,  H01L21/67109 ,  H01L21/6831

摘要： A substrate carrier is described that uses a proportional thermal fluid delivery system In one example the apparatus includes a heat exchanger to provide a thermal fluid to a fluid channel of a substrate carrier and to receive the thermal fluid from the fluid channel, the thermal fluid in the fluid channel to control the temperature of the carrier during substrate processing. A proportional valve controls the rate of flow of thermal fluid from the heat exchanger to the fluid channel, A temperature controller receives a measured temperature from a thermal sensor of the carrier and controls the proportional valve in response to the measured temperature to adjust the rate of flow.

摘要翻译： 描述了使用比例热流体输送系统的衬底载体。在一个示例中，该装置包括热交换器，以将热流体提供给衬底载体的流体通道并从流体通道接收热流体， 流体通道，用于在衬底处理期间控制载体的温度。 比例阀控制从热交换器到流体通道的热流体的流速。温度控制器从载体的热传感器接收测量的温度，并根据测量的温度控制比例阀，以调节速度 流。

公开(公告)号：US20140224767A1

公开(公告)日：2014-08-14

申请号：US14179749

申请日：2014-02-13

申请人： Walter R. MERRY ,  Sergio Fukuda SHOJI ,  Yang YANG ,  Duy D. NGUYEN ,  Justin PHI

发明人： Walter R. MERRY ,  Sergio Fukuda SHOJI ,  Yang YANG ,  Duy D. NGUYEN ,  Justin PHI

IPC分类号： C23F1/08 ,  C23C16/50

CPC分类号： H01J37/3299 ,  C23C14/54 ,  C23C16/52

摘要： Methods and systems for adapting and/or tuning feedforward control parameters in a plasma processing chamber. In embodiments, a dependent process parameter, such as a chamber component temperature, is controlled with a feedforward control algorithm based on one or more independent process parameters, such as RF power. A control algorithm may calculate steady-state deviation of the dependent parameter from a process recipe setpoint, estimate an amount by which an existing control gain coefficient is to be changed to better achieve the setpoint, associate the new control gain coefficient with the particular recipe operation, and store the new control gain coefficient for subsequent execution of the recipe operation. In embodiments, the amount by which a gain coefficient is to be changed is based on a model function derived from a lookup table associating gain coefficients with setpoints of the dependent process parameter and values of the independent process parameter.

摘要翻译： 用于在等离子体处理室中适配和/或调谐前馈控制参数的方法和系统。 在实施例中，使用基于一个或多个独立过程参数（例如RF功率）的前馈控制算法来控制依赖过程参数，例如腔室部件温度。 控制算法可以计算依赖参数与过程配方设定点的稳态偏差，估计要改变现有控制增益系数以更好地实现设定点的量，将新的控制增益系数与特定配方操作相关联 并存储新的控制增益系数用于后续执行配方操作。 在实施例中，增益系数将被改变的量是基于从增益系数与依赖过程参数的设定点和独立过程参数的值相关联的查找表导出的模型函数。