公开(公告)号：US20140224767A1

公开(公告)日：2014-08-14

申请号：US14179749

申请日：2014-02-13

申请人： Walter R. MERRY ,  Sergio Fukuda SHOJI ,  Yang YANG ,  Duy D. NGUYEN ,  Justin PHI

发明人： Walter R. MERRY ,  Sergio Fukuda SHOJI ,  Yang YANG ,  Duy D. NGUYEN ,  Justin PHI

IPC分类号： C23F1/08 ,  C23C16/50

CPC分类号： H01J37/3299 ,  C23C14/54 ,  C23C16/52

摘要： Methods and systems for adapting and/or tuning feedforward control parameters in a plasma processing chamber. In embodiments, a dependent process parameter, such as a chamber component temperature, is controlled with a feedforward control algorithm based on one or more independent process parameters, such as RF power. A control algorithm may calculate steady-state deviation of the dependent parameter from a process recipe setpoint, estimate an amount by which an existing control gain coefficient is to be changed to better achieve the setpoint, associate the new control gain coefficient with the particular recipe operation, and store the new control gain coefficient for subsequent execution of the recipe operation. In embodiments, the amount by which a gain coefficient is to be changed is based on a model function derived from a lookup table associating gain coefficients with setpoints of the dependent process parameter and values of the independent process parameter.

摘要翻译： 用于在等离子体处理室中适配和/或调谐前馈控制参数的方法和系统。 在实施例中，使用基于一个或多个独立过程参数（例如RF功率）的前馈控制算法来控制依赖过程参数，例如腔室部件温度。 控制算法可以计算依赖参数与过程配方设定点的稳态偏差，估计要改变现有控制增益系数以更好地实现设定点的量，将新的控制增益系数与特定配方操作相关联 并存储新的控制增益系数用于后续执行配方操作。 在实施例中，增益系数将被改变的量是基于从增益系数与依赖过程参数的设定点和独立过程参数的值相关联的查找表导出的模型函数。

公开(公告)号：US20110186545A1

公开(公告)日：2011-08-04

申请号：US12905624

申请日：2010-10-15

申请人： Chetan MAHADESWARASWAMY ,  Walter R. MERRY ,  Sergio Fukuda SHOJI ,  Chunlei ZHANG ,  Yashaswini B. PATTAR ,  Duy D. NGUYEN ,  Tina TSONG ,  Shane C. NEVIL ,  Douglas A. BUCHBERGER, JR. ,  Fernando M. SILVEIRA ,  Brad L. MAYS ,  Kartik RAMASWAMY ,  Hamid NOORBAKHSH

发明人： Chetan MAHADESWARASWAMY ,  Walter R. MERRY ,  Sergio Fukuda SHOJI ,  Chunlei ZHANG ,  Yashaswini B. PATTAR ,  Duy D. NGUYEN ,  Tina TSONG ,  Shane C. NEVIL ,  Douglas A. BUCHBERGER, JR. ,  Fernando M. SILVEIRA ,  Brad L. MAYS ,  Kartik RAMASWAMY ,  Hamid NOORBAKHSH

IPC分类号： C23F1/08 ,  C23F1/00 ,  C23C16/50 ,  C23C16/458 ,  C23C16/52 ,  G05D23/00

CPC分类号： H01J37/32009 ,  G05B6/02 ,  H01J37/3244 ,  H01J37/32715 ,  H01J37/32935 ,  H01J2237/334 ,  H05H1/0081

摘要： Methods and systems for controlling temperatures in plasma processing chamber with reduced controller response times and increased stability. Temperature control is based at least in part on a feedforward control signal derived from a plasma power input into the processing chamber. A feedforward control signal compensating disturbances in the temperature attributable to the plasma power may be combined with a feedback control signal counteracting error between a measured and desired temperature.

摘要翻译： 用于控制等离子体处理室中的温度的方法和系统，其具有减少的控制器响应时间和增加的稳定性。 温度控制至少部分地基于从输入到处理室的等离子体功率得到的前馈控制信号。 补偿由于等离子体功率引起的温度的干扰的前馈控制信号可以与测量温度和期望温度之间的反馈控制信号抵消误差相组合。