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公开(公告)号:US08154109B2
公开(公告)日:2012-04-10
申请号:US12888527
申请日:2010-09-23
IPC分类号: H01L23/495
CPC分类号: H01L23/49503 , H01L23/49513 , H01L23/49548 , H01L24/32 , H01L24/48 , H01L24/83 , H01L2224/27013 , H01L2224/2919 , H01L2224/32014 , H01L2224/32057 , H01L2224/32245 , H01L2224/48091 , H01L2224/48247 , H01L2224/48465 , H01L2224/73265 , H01L2224/83385 , H01L2224/8385 , H01L2924/00014 , H01L2924/01005 , H01L2924/01006 , H01L2924/01029 , H01L2924/01033 , H01L2924/01047 , H01L2924/0105 , H01L2924/01078 , H01L2924/01082 , H01L2924/0133 , H01L2924/014 , H01L2924/0665 , H01L2924/07802 , H01L2924/14 , H01L2924/15747 , H01L2924/181 , H01L2924/18301 , H01L2924/00 , H01L2924/01028 , H01L2924/01046 , H01L2924/01079 , H01L2924/3512 , H01L2924/00012 , H01L2224/45099 , H01L2224/45015 , H01L2924/207
摘要: A lead frame (410) including a die pad (100) for mounting at least one integrated circuit (405) thereon and a plurality of lead fingers (413). The die pad (100) includes a metal including substrate (105) having a periphery that includes a plurality of sides (111-114), an intersection of the sides forming corners (115). A first plurality of grooves including least one groove (106) is formed in a top side surface of the substrate and is associated with each of the corners (115). The groove (106) has a dimension oriented at least in part at an angle of 75 to 105 degrees relative to a bisecting line (118) originating from the corners (115). A lead-frame-based packaged semiconductor device (400) includes a lead frame (410) including at least one metal comprising die pad (418) and a plurality of lead fingers (413) around the die pad (418). At least one integrated circuit (405) is mounted on the top surface of the die pad (418), and electrically connected to the plurality of lead fingers (413). A mold compound (414) encapsulates the integrated circuit (405), wherein the mold compound (414) is present inside the first plurality of grooves to form a restraint from delaminating between the mold compound (414) and the die pad (418).
摘要翻译: 一种引线框架(410),包括用于在其上安装至少一个集成电路(405)的芯片焊盘(100)和多个引线指(413)。 管芯焊盘(100)包括具有包括多个侧面(111-114)的周边的基板(105)的金属,所述边缘形成拐角(115)的交点。 包括至少一个凹槽(106)的第一多个凹槽形成在基底的顶侧表面中并且与每个角部(115)相关联。 凹槽(106)具有至少部分地相对于源自角部(115)的平分线(118)以75至105度的角度定向的尺寸。 基于引线框架的封装半导体器件(400)包括引线框架(410),引线框架(410)包括至少一个包括管芯焊盘(418)的金属和围绕管芯焊盘(418)的多个引线指(413)。 至少一个集成电路(405)安装在芯片焊盘(418)的顶表面上,并且电连接到多个引线指(413)。 模具化合物(414)封装集成电路(405),其中模制化合物(414)存在于第一多个沟槽内,以形成在模具化合物(414)和芯片焊盘(418)之间分层的约束。
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2.
公开(公告)号:US08129224B2
公开(公告)日:2012-03-06
申请号:US12906240
申请日:2010-10-18
申请人: Siva P Gurrum , Kapil H Sahasrabudhe , Vikas Gupta
发明人: Siva P Gurrum , Kapil H Sahasrabudhe , Vikas Gupta
CPC分类号: H01L23/367 , H01L23/3171 , H01L24/14 , H01L24/16 , H01L2224/0554 , H01L2224/05548 , H01L2224/05573 , H01L2224/056 , H01L2224/16 , H01L2924/00014 , H01L2924/01079 , H01L2924/01084 , H01L2924/10253 , H01L2924/14 , H01L2924/19041 , H01L2924/00 , H01L2224/05599 , H01L2224/0555 , H01L2224/0556
摘要: A thermal management configuration for a flip chip semiconductor device is disclosed. The device includes a high power silicon based die having a metal bonding surface. A plurality of interconnects are formed on the metal surface and connected to a substrate. A plurality of thermal management stud bumps are formed on the metal bonding surface, the thermal management stud bumps positioned distinct from the interconnects and local to die hot spots, exposed ends of the thermal management stud bumps spaced from the substrate.
摘要翻译: 公开了一种用于倒装芯片半导体器件的热管理配置。 该器件包括具有金属接合表面的高功率硅基管芯。 在金属表面上形成多个互连件并连接到基板。 在金属接合表面上形成多个热管理突起,热管理突起凸起与互连不同,并且局部到管芯热点,热管理突起隆起与衬底间隔开的暴露端。
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公开(公告)号:US20130025745A1
公开(公告)日:2013-01-31
申请号:US13191731
申请日:2011-07-27
IPC分类号: C23C8/80
CPC分类号: C23C8/04 , C23C2/006 , C23C8/02 , C23C8/12 , C23C8/52 , C23C8/72 , C23C8/80 , C23C14/04 , C23C18/1633 , H01L21/4821
摘要: A method for selectively plating a leadframe (1100) by oxidizing selected areas (401, 402, 403, 404) of the leadframe made of a first metal (102) and then depositing a layer (901) of a second metal onto un-oxidized areas. The selective oxidations are achieved by selective active marking
摘要翻译: 一种用于通过对由第一金属(102)制成的引线框架的选定区域(401,402,403,404)进行氧化,然后将第二金属的层(901)沉积到未氧化的层上来选择性地电镀引线框架(1100)的方法 地区 选择性氧化通过选择性活性标记来实现
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