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公开(公告)号：US20080180188A1
公开(公告)日：2008-07-31
申请号：US11669682
申请日：2007-01-31
IPC分类号： H01P5/10
CPC分类号： G01N30/6095 , B01L3/5027 , B01L2200/12 , B01L2300/0877 , B01L2300/0887 , B82Y15/00 , Y10T436/2575
摘要： In some embodiments of the present invention, the buried silicon oxide technology is employed in the fabrication of fluid channels, particularly nanochannels. For example, a fluid channel can be made in a buried silicon oxide layer by etching the buried oxide layer with a method that selectively removes silicon oxide but not silicon. Thus, one dimension of the resulting fluid channel is limited by the thickness of the buried oxide layer. It is possible to manufacture a very thin buried oxide layer with great precision, thus a nanochannel can be fabricated in a controlled manner. Moreover, in addition to buried oxide, any pairs of substances with a high etch ratio with respect to each other can be used in the same way. Further provided are the fluid channels, apparatuses, devices and systems comprising the fluid channels, and uses thereof.
摘要翻译： 在本发明的一些实施例中，掩埋氧化硅技术用于制造流体通道，特别是纳米通道。 例如，通过用选择性地去除氧化硅而不是硅的方法蚀刻掩埋氧化物层，可以在掩埋氧化硅层中制造流体通道。 因此，所得流体通道的一个尺寸受到掩埋氧化物层的厚度的限制。 可以以很高的精度制造非常薄的掩埋氧化物层，因此可以以受控的方式制造纳米通道。 此外，除了掩埋氧化物之外，可以以相同的方式使用具有相对于彼此的高蚀刻比的任何物质对。 进一步提供了包括流体通道的流体通道，装置，装置和系统及其用途。
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公开(公告)号：US08168140B2
公开(公告)日：2012-05-01
申请号：US11669682
申请日：2007-01-31
CPC分类号： G01N30/6095 , B01L3/5027 , B01L2200/12 , B01L2300/0877 , B01L2300/0887 , B82Y15/00 , Y10T436/2575
摘要： In some embodiments of the present invention, the buried silicon oxide technology is employed in the fabrication of fluid channels, particularly nanochannels. For example, a fluid channel can be made in a buried silicon oxide layer by etching the buried oxide layer with a method that selectively removes silicon oxide but not silicon. Thus, one dimension of the resulting fluid channel is limited by the thickness of the buried oxide layer. It is possible to manufacture a very thin buried oxide layer with great precision, thus a nanochannel can be fabricated in a controlled manner. Moreover, in addition to buried oxide, any pairs of substances with a high etch ratio with respect to each other can be used in the same way. Further provided are the fluid channels, apparatuses, devices and systems comprising the fluid channels, and uses thereof.
摘要翻译： 在本发明的一些实施例中，掩埋氧化硅技术用于制造流体通道，特别是纳米通道。 例如，通过用选择性地去除氧化硅而不是硅的方法蚀刻掩埋氧化物层，可以在掩埋氧化硅层中制造流体通道。 因此，所得流体通道的一个尺寸受到掩埋氧化物层的厚度的限制。 可以以很高的精度制造非常薄的掩埋氧化物层，因此可以以受控的方式制造纳米通道。 此外，除了掩埋氧化物之外，可以以相同的方式使用具有相对于彼此的高蚀刻比的任何物质对。 进一步提供了包括流体通道的流体通道，装置，装置和系统及其用途。
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3.发明授权
公开(公告)号：US5750978A
公开(公告)日：1998-05-12
申请号：US598718
申请日：1996-02-08
CPC分类号： G01J1/4228 , G01J1/02 , G01J1/0252 , G01J1/04 , G01J1/0403 , G01J3/02 , G01J3/0202 , G01J3/0286 , G01J3/2803
摘要： A method and apparatus for mounting an optical sensor in an optical instrument. The optical sensor is attached to a rigid substrate. The substrate has two locator holes, with the sensor mounted between the holes. Rigid locator pins attached to the housing of the instrument protrude into the locator holes. A spring pushing against the substrate forces the locator holes against corresponding locator pins, aligning the substrate within a plane. In a first embodiment, the holes are positioned so that the optical sensor is rigidly held at its midpoint, minimizing dimensional deviations along the length of the sensor with temperature change. The sensor assembly is easily removable and the mounting apparatus does not mechanically stress the substrate or the sensor with temperature changes. The mounting apparatus is easily manufactured, allows precise alignment, and is inexpensive.
摘要翻译： 一种用于将光学传感器安装在光学仪器中的方法和装置。 光学传感器连接到刚性基板。 基板具有两个定位孔，传感器安装在孔之间。 连接到仪器外壳的刚性定位销突出到定位孔中。 推靠在基板上的弹簧迫使定位孔抵靠相应的定位销，使基板在平面内对齐。 在第一实施例中，孔被定位成使得光学传感器被刚性地保持在其中点，从而使具有温度变化的传感器长度的尺寸偏差最小化。 传感器组件易于拆卸，并且安装设备不会在温度变化时对基板或传感器进行机械应力。 安装装置易于制造，允许精确对准，并且便宜。
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