PHOTOVOLTAIC DEVICE
    2.
    发明申请
    PHOTOVOLTAIC DEVICE 审中-公开
    光电器件

    公开(公告)号:US20120060891A1

    公开(公告)日:2012-03-15

    申请号:US13209753

    申请日:2011-08-15

    Abstract: A multilayered structure including a first barrier layer adjacent to a substrate, a barrier bi-layer adjacent to the first barrier layer, the barrier bi-layer comprising a second barrier layer and a third barrier layer, a transparent conductive oxide layer adjacent to the barrier bi-layer, and a buffer layer adjacent to the transparent conductive oxide layer and method of forming the same. A multilayered substrate including a barrier layer structure having a plurality of barrier layers being alternating layers of low refractive index material and high refractive index material, a transparent conductive oxide layer adjacent to the barrier bi-layer and a buffer layer adjacent to the transparent conductive oxide layer. The multilayered structure may serve as a front contact for photovoltaic devices.

    Abstract translation: 包括与衬底相邻的第一阻挡层,与第一阻挡层相邻的势垒双层的多层结构,包含第二阻挡层和第三势垒层的阻挡双层,与阻挡层相邻的透明导电氧化物层 双层和与透明导电氧化物层相邻的缓冲层及其形成方法。 一种多层基板,包括具有多个阻挡层的阻挡层结构,所述阻挡层是低折射率材料和高折射率材料的交替层,与所述阻挡双层相邻的透明导电氧化物层和与所述透明导电氧化物相邻的缓冲层 层。 多层结构可以用作光伏器件的前触点。

    PHOTOCATALYTIC COATINGS HAVING IMPROVED LOW-MAINTENANCE PROPERTIES
    3.
    发明申请
    PHOTOCATALYTIC COATINGS HAVING IMPROVED LOW-MAINTENANCE PROPERTIES 有权
    具有改进的低维护性能的光催化涂料

    公开(公告)号:US20070264494A1

    公开(公告)日:2007-11-15

    申请号:US11733979

    申请日:2007-04-11

    Abstract: The invention provides a substrate bearing a photocatalytic coating. In some embodiments, the coating includes a photocatalytic film comprising titania deposited over a layer comprising tungsten oxide, aluminum oxide, niobium oxide or zirconium oxide. Additionally or alternatively, the photocatalytic film can include both titania and a material selected from the group consisting of nitrogen, tantalum, copper and silica. The invention also provides methods of depositing such coatings.

    Abstract translation: 本发明提供一种带有光催化涂层的基底。 在一些实施方案中,涂层包括包含沉积在包含氧化钨,氧化铝,氧化铌或氧化锆的层上的二氧化钛的光催化膜。 另外或替代地,光催化膜可以包括二氧化钛和选自氮,钽,铜和二氧化硅的材料。 本发明还提供沉积这种涂层的方法。

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