公开(公告)号：US08040532B2

公开(公告)日：2011-10-18

申请号：US12585593

申请日：2009-09-18

Applicant: Yoel Cohen ,  Moshe Finarov ,  Klara Vinokur

Inventor： Yoel Cohen ,  Moshe Finarov ,  Klara Vinokur

IPC: G01B11/28

CPC classification number: G01B11/0625 ,  G01B11/0683 ,  H01L22/12

Abstract: A method and system are presented for use in controlling the processing of a structure. First measured data is provided being indicative of at least one of the following: a thickness (d2) of at least one layer (L2) of the structure W in at least selected sites of the structure prior to the processing of the structure, and a surface profile of the structure prior to processing. An optical measurement is applied to at least the selected sites of the structure after processing and second measured data is generated being indicative of at least one of the following: a thickness of the process structure (d′) and a surface profile of the processed structure. The second measured data is analyzed by interpreting it using the first measured data to thereby determine a thickness (d′1 or d′2) of at least one layer of the process structure. This determined thickness is thus indicative of the quality of the processing.

Abstract translation: 提出了一种用于控制结构处理的方法和系统。 第一测量数据被提供指示以下中的至少一个：在结构处理之前的结构的至少一些选定位置中的结构W的至少一个层（L2）的厚度（d2），以及 处理前的结构表面轮廓。 在处理之后至少对结构的所选位置进行光学测量，并且生成第二测量数据以指示以下中的至少一个：处理结构（d'）的厚度和处理结构的表面轮廓 。 通过使用第一测量数据解释第二测量数据，从而确定至少一层工艺结构的厚度（d'1或d'2）。 因此，该确定的厚度表示处理的质量。

公开(公告)号：US20100010659A1

公开(公告)日：2010-01-14

申请号：US12585593

申请日：2009-09-18

Applicant: Yoel Cohen ,  Moshe Finarov ,  Klara Vinokur

Inventor： Yoel Cohen ,  Moshe Finarov ,  Klara Vinokur

IPC: G06F19/00 ,  G01B11/06

CPC classification number: G01B11/0625 ,  G01B11/0683 ,  H01L22/12

Abstract: A method and system are presented for use in controlling the processing of a structure. First measured data is provided being indicative of at least one of the following: a thickness (d2) of at least one layer (L2) of the structure W in at least selected sites of the structure prior to the processing of the structure, and a surface profile of the structure prior to said processing. An optical measurement is applied to at least the selected sites of the structure after said processing and second measured data is generated being indicative of at least one of the following: a thickness of the processed structure (d′) and a surface profile of the processed structure, The second measured data is analyzed by interpreting it using the first measured data to thereby determine a thickness (d′1 or d′2) of at least one layer of the processed structure. This determined thickness is thus indicative of the quality of said processing.

Abstract translation: 提出了一种用于控制结构处理的方法和系统。 第一测量数据被提供指示以下中的至少一个：在结构处理之前的结构的至少一些选定位置中的结构W的至少一个层（L2）的厚度（d2），以及 所述处理之前的结构的表面轮廓。 在所述处理之后，对至少所述结构的所选位置进行光学测量，并且生成第二测量数据，以指示以下至少之一：处理结构（d'）的厚度和所处理的结构的表面轮廓 结构，通过使用第一测量数据解释第二测量数据，从而确定至少一层处理结构的厚度（d'1或d'2）。 因此，所确定的厚度表示所述处理的质量。

公开(公告)号：US06236489B1

公开(公告)日：2001-05-22

申请号：US09307427

申请日：1999-05-10

Applicant: Klara Vinokur ,  Nahum Gorbatov ,  Erik Hendell

Inventor： Klara Vinokur ,  Nahum Gorbatov ,  Erik Hendell

IPC: G02F103

CPC classification number: G02F1/1339 ,  G02F1/1333 ,  G02F2001/13355 ,  G02F2203/023

Abstract: A light-modulating cell for providing a desired propagation of light impinging thereon is presented. The cell comprises at least two substrates, made a material substantially optically transparent with respect to incident radiation of a desired wavelength range, and at least one reservoir attached to at least one of the substrates. These at least two substrates define a plurality of spaced-apart outer surfaces and a sealed therebetween, respectively. The space is filled with a first, substantially liquid light-modulating medium, while the reservoir contains predetermined amount of a second, substantially liquid light-modulating medium. The inside of the reservoir is connected to the inside of the sealed space for providing a continuous flow of the first and second media into and out of the space.

Abstract translation: 提出了一种用于提供入射到其上的光的期望传播的光调制单元。 该电池包括至少两个基板，制成相对于期望波长范围的入射辐射基本上光学透明的材料，以及至少一个连接到至少一个基板的储存器。 这些至少两个基板分别限定多个间隔开的外表面和密封的外表面。 该空间填充有第一基本上液体的光调制介质，同时储存器包含预定量的第二基本上液体的光调制介质。 储存器的内部连接到密封空间的内部，用于提供第一和第二介质连续流入和流出该空间。

公开(公告)号：US07595896B2

公开(公告)日：2009-09-29

申请号：US12068062

申请日：2008-02-01

Applicant: Yoel Cohen ,  Moshe Finarov ,  Klara Vinokur

Inventor： Yoel Cohen ,  Moshe Finarov ,  Klara Vinokur

IPC: G01B11/28

CPC classification number: G01B11/0625 ,  G01B11/0683 ,  H01L22/12

Abstract: A method and system are presented for use in controlling the processing of a structure. First measured data is provided being indicative of at least one of the following: a thickness (d2) of at least one layer (L2) of the structure W in at least selected sites of the structure prior to the processing of the structure, and a surface profile of the structure prior to said processing. An optical measurement is applied to at least the selected sites of the structure after said processing and second measured data is generated being indicative of at least one of the following: a thickness of the processed structure (d′) and a surface profile of the processed structure, The second measured data is analyzed by interpreting it using the first measured data to thereby determine a thickness (d′1 or d′2) of at least one layer of the processed structure. This determined thickness is thus indicative of the quality of said processing.

Abstract translation: 提出了一种用于控制结构处理的方法和系统。 第一测量数据被提供指示以下中的至少一个：在结构处理之前的结构的至少一些选定位置中的结构W的至少一个层（L2）的厚度（d2），以及 所述处理之前的结构的表面轮廓。 在所述处理之后，对至少所述结构的所选位置进行光学测量，并且生成第二测量数据，以指示以下至少之一：处理结构（d'）的厚度和所处理的结构的表面轮廓 结构，通过使用第一测量数据解释第二测量数据，从而确定至少一层处理结构的厚度（d'1或d'2）。 因此，所确定的厚度表示所述处理的质量。

公开(公告)号：US20080204721A1

公开(公告)日：2008-08-28

申请号：US12068062

申请日：2008-02-01

Applicant: Yoel Cohen ,  Moshe Finarov ,  Klara Vinokur

Inventor： Yoel Cohen ,  Moshe Finarov ,  Klara Vinokur

IPC: G01N21/00 ,  G01J3/00

CPC classification number: G01B11/0625 ,  G01B11/0683 ,  H01L22/12

Abstract: A method and system are presented for use in controlling the processing of a structure. First measured data is provided being indicative of at least one of the following: a thickness (d2) of at least one layer (L2) of the structure W in at least selected sites of the structure prior to the processing of the structure, and a surface profile of the structure prior to said processing. An optical measurement is applied to at least the selected sites of the structure after said processing and second measured data is generated being indicative of at least one of the following: a thickness of the processed structure (d′) and a surface profile of the processed structure, The second measured data is analyzed by interpreting it using the first measured data to thereby determine a thickness (d′1 or d′2) of at least one layer of the processed structure. This determined thickness is thus indicative of the quality of said processing.

公开(公告)号：US20120044506A1

公开(公告)日：2012-02-23

申请号：US13270647

申请日：2011-10-11

Applicant: Yoel COHEN ,  Moshe FINAROV ,  Klara VINOKUR

Inventor： Yoel COHEN ,  Moshe FINAROV ,  Klara VINOKUR

IPC: G01B11/28

CPC classification number: G01B11/0625 ,  G01B11/0683 ,  H01L22/12

Abstract: A method and system are provided for controlling processing of a structure. First measured data is provided being indicative of at least one of: a thickness (d2) of at least one layer (L2) of the structure W in at least selected sites of the structure prior to processing of the structure, and a surface profile of the structure prior to processing. An optical measurement is applied to at least the selected sites of the structure after processing and second measured data is generated being indicative of at least one of: a thickness of the processed structure (d′) and a surface profile of the processed structure. The second measured data is analyzed by interpreting it using the first measured data to determine a thickness (d′1 or d′2) of at least one layer of the processed structure. This determined thickness is indicative of the quality of processing.

Abstract translation: 提供了一种用于控制结构的处理的方法和系统。 提供了首先测量的数据，其指示以下至少一个：在结构处理之前的结构的至少一些选定的位置中的结构W的至少一层（L2）的厚度（d2）和表面轮廓 处理前的结构。 在处理之后至少对结构的选定部位进行光学测量，并且生成第二测量数据，指示处理结构（d'）的厚度和处理结构的表面轮廓中的至少一个。 通过使用第一测量数据解释第二测量数据来分析第二测量数据，以确定至少一层处理结构的厚度（d'1或d'2）。 该确定的厚度表示处理的质量。

公开(公告)号：US08564793B2

公开(公告)日：2013-10-22

申请号：US13270647

申请日：2011-10-11

Applicant: Yoel Cohen ,  Moshe Finarov ,  Klara Vinokur

Inventor： Yoel Cohen ,  Moshe Finarov ,  Klara Vinokur

IPC: G01B11/28

CPC classification number: G01B11/0625 ,  G01B11/0683 ,  H01L22/12

Abstract: A method and system are provided for controlling processing of a structure. First measured data is provided being indicative of at least one of: a thickness (d2) of at least one layer (L2) of the structure W in at least selected sites of the structure prior to processing of the structure, and a surface profile of the structure prior to processing. An optical measurement is applied to at least the selected sites of the structure after processing and second measured data is generated being indicative of at least one of: a thickness of the processed structure (d′) and a surface profile of the processed structure. The second measured data is analyzed by interpreting it using the first measured data to determine a thickness (d′1 or d′2) of at least one layer of the processed structure. This determined thickness is indicative of the quality of processing.

Abstract translation: 提供了一种用于控制结构的处理的方法和系统。 提供了首先测量的数据，其指示以下至少一个：在结构处理之前的结构的至少一些选定的位置中的结构W的至少一层（L2）的厚度（d2）和表面轮廓 处理前的结构。 在处理之后至少对结构的选定部位进行光学测量，并且生成第二测量数据，指示处理结构（d'）的厚度和处理结构的表面轮廓中的至少一个。 通过使用第一测量数据解释第二测量数据来分析第二测量数据，以确定至少一层处理结构的厚度（d'1或d'2）。 该确定的厚度表示处理的质量。

公开(公告)号：US07327476B2

公开(公告)日：2008-02-05

申请号：US10606199

申请日：2003-06-26

Applicant: Yoel Cohen ,  Moshe Finarov ,  Klara Vinokur

Inventor： Yoel Cohen ,  Moshe Finarov ,  Klara Vinokur

IPC: G01B11/28

CPC classification number: G01B11/0625 ,  G01B11/0683 ,  H01L22/12

Abstract: A method and system are presented for use in controlling the processing of a structure. First measured data is provided being indicative of at least one of the following: a thickness (d2) of at least one layer (L2) of the structure W in at least selected sites of the structure prior to the processing of the structure, and a surface profile of the structure prior to said processing. An optical measurement is applied to at least the selected sites of the structure after said processing and second measured data is generated being indicative of at least one of the following: a thickness of the processed structure (d′) and a surface profile of the processed structure, The second measured data is analyzed by interpreting it using the first measured data to thereby determine a thickness (d′1 or d′2) of at least one layer of the processed structure. This determined thickness is thus indicative of the quality of said processing.

Abstract translation: 提出了一种用于控制结构处理的方法和系统。 提供了首先测量的数据，其指示以下至少之一：结构W的至少一层（L 2 2 N）的厚度（L 2 2 N） 在结构处理之前的结构的最少选择的位置，以及在所述处理之前的结构的表面轮廓。 在所述处理之后，对至少所述结构的所选位置进行光学测量，并且生成第二测量数据，以指示以下至少之一：处理结构（d'）的厚度和所处理的结构的表面轮廓 结构，通过使用第一测量数据解释第二测量数据来分析第二测量数据，从而确定至少一层的厚度（d'1或更大或更小） 处理结构。 因此，所确定的厚度表示所述处理的质量。

公开(公告)号：US06351296B1

公开(公告)日：2002-02-26

申请号：US09014355

申请日：1998-01-27

Applicant: Nissim Pilossof ,  Klara Vinokur ,  Isaac Shariv

Inventor： Nissim Pilossof ,  Klara Vinokur ,  Isaac Shariv

IPC: G02F11335

CPC classification number: G02F1/31 ,  G02B5/3016 ,  G02F1/1393 ,  G02F2001/133738 ,  G02F2203/023 ,  G02F2203/07

Abstract: A beam polarizer device for splitting an unpolarized beam of incident radiation into first and second beams of different polarizations. The beam polarizer comprises a birefringent cell interposed between a pair of parallel sides of first and second prisms made of an optically transparent material. The birefringent cell is formed of an oriented organic material having a desired orientation of its optical axis relative to the sides of the prisms enclosing the birefringent cell therebetween. The organic material has substantially different refraction indices n1 and n2 for light components of, respectively, two different orientations of electric fields relative to the direction of propagation of a beam impinging onto the birefringent cell while propagating inside the first prism. The optically transparent material has a refraction index n3 which is substantially equal to the greatest one between the refraction indices n1 and n2.

Abstract translation: 一种用于将入射辐射的非偏振束分解成不同偏振的第一和第二光束的光束偏振器装置。 光束偏振器包括插入由光学透明材料制成的第一和第二棱镜的一对平行侧之间的双折射单元。 双折射单元由相对于其间包围双折射单元的棱镜的侧面具有其光轴的期望取向的取向有机材料形成。 有机材料对于在第一棱镜内部传播时相对于入射到双折射单元上的光束的传播方向的两个不同的电场取向的光分量具有基本不同的折射率n1和n2。 光学透明材料具有基本上等于折射率n1和n2之间的最大折射率的折射率n3。