Device monitor for RF and DC measurement
    2.
    发明授权
    Device monitor for RF and DC measurement 有权
    用于RF和DC测量的设备监视器

    公开(公告)号:US07126359B2

    公开(公告)日:2006-10-24

    申请号:US11008458

    申请日:2004-12-09

    IPC分类号: G01R31/02

    摘要: A device monitor for RF and DC measurement. The device monitor comprises a plurality of test cells arranged substantially in line. The test cell comprises a device under test, an input pad, an output pad and at least two reference pads. The input pad is electrically connected to an input of the DUT. The output pad is electrically connected to an output of the DUT. At least one of the reference pads is electrically connected to the DUT to provide a reference level. The input pad, the output pad and the reference pads are arranged substantially in line and at least one of the reference pads is located between the input pad and the output pad.

    摘要翻译: 用于RF和DC测量的器件监视器。 设备监视器包括基本上一致排列的多个测试单元。 测试单元包括被测器件,输入焊盘,输出焊盘和至少两个参考焊盘。 输入焊盘电连接到DUT的输入端。 输出焊盘电连接到DUT的输出。 参考焊盘中的至少一个电连接到DUT以提供参考电平。 输入焊盘,输出焊盘和参考焊盘基本上排成一列,并且至少一个参考焊盘位于输入焊盘和输出焊盘之间。

    COCRPT-BASED ALLOY SPUTTERING TARGETS WITH COBALT OXIDE AND NON-MAGNETIC OXIDE AND MANUFACTURING METHODS THEREOF
    3.
    发明申请
    COCRPT-BASED ALLOY SPUTTERING TARGETS WITH COBALT OXIDE AND NON-MAGNETIC OXIDE AND MANUFACTURING METHODS THEREOF 审中-公开
    基于COCRPT的合金喷涂目标与氧化钴和非磁性氧化物的制备方法及其制备方法

    公开(公告)号:US20130008784A1

    公开(公告)日:2013-01-10

    申请号:US13178594

    申请日:2011-07-08

    IPC分类号: C23C14/08 B22F3/12 C23C14/34

    摘要: Provided is a CoCrPt-based alloy sputtering target containing cobalt (Co), chromium (Cr), platinum (Pt), cobalt oxide and non-magnetic oxide composition, wherein the lengths of ceramic phases of Cr2O3 and Co(Cr)—X—O formed in the sputtering targets are respectively less than 3 μm (“X” represents the metal element of the non-magnetic oxide). The sputtering target is obtained via controlling suitable composition proportion of the prealloy powder with Cr and the sintering factor to decrease the size of ceramic phases of Cr2O3 and Co(Cr)—X—O. Sputtering targets made by the methods of the present invention decrease the arcing effects and unnecessary formation of particles upon sputtering in addition to making the components of the sputtering targets distribute more uniformly therein.

    摘要翻译: 提供了含有钴(Co),铬(Cr),铂(Pt),氧化钴和非磁性氧化物组合物的CoCrPt基合金溅射靶,其中Cr 2 O 3和Co(Cr)-X- O形成的溅射靶分别小于3μm(X表示非磁性氧化物的金属元素)。 通过控制合金粉末与Cr的合适组成比例和烧结因子来获得溅射靶,以减小Cr2O3和Co(Cr)-X-O的陶瓷相的尺寸。 通过本发明的方法制造的溅射靶除了使溅射靶的成分更均匀地分布之外,还能降低溅射时的电弧效应和不必要的溅射形成。

    DEVICE PERFORMANCE PARMETER TUNING METHOD AND SYSTEM
    4.
    发明申请
    DEVICE PERFORMANCE PARMETER TUNING METHOD AND SYSTEM 有权
    装置性能参数调节方法和系统

    公开(公告)号:US20120239178A1

    公开(公告)日:2012-09-20

    申请号:US13048282

    申请日:2011-03-15

    IPC分类号: G06F19/00

    摘要: A method comprises computing respective regression models for each of a plurality of failure bins based on a plurality of failures identified during wafer electrical tests. Each regression model outputs a wafer yield measure as a function of a plurality of device performance variables. For each failure bin, sensitivity of the wafer yield measure to each of the plurality of device performance variables is determined, and the device performance variables are ranked with respect to sensitivity of the wafer yield measure. A subset of the device performance variables which have highest rankings and which have less than a threshold correlation with each other are selected. The wafer yield measures for each failure bin corresponding to one of the selected subset of device performance variables are combined, to provide a combined wafer yield measure. At least one new process parameter value is selected to effect a change in the one device performance variable, based on the combined wafer yield measure. The at least one new process parameter value is to be used to process at least one additional wafer.

    摘要翻译: 一种方法包括基于在晶片电测试期间识别的多个故障来计算多个故障仓中的每一个的相应回归模型。 每个回归模型输出作为多个设备性能变量的函数的晶片产量测量。 对于每个故障仓,确定晶片产量测量对多个器件性能变量中的每一个的灵敏度,并且相对于晶片产量测量的灵敏度对器件性能变量进行排序。 选择具有最高排名并且彼此具有小于阈值相关性的设备性能变量的子集。 组合对应于所选择的设备性能变量子集之一的每个故障仓的晶片产量测量,以提供组合晶片产量测量。 选择至少一个新的过程参数值,以基于组合的晶片产量测量来实现一个器件性能变量的变化。 至少一个新的过程参数值将用于处理至少一个附加晶片。

    Zoom lens assembly
    5.
    发明授权
    Zoom lens assembly 有权
    变焦镜头组合

    公开(公告)号:US07218459B2

    公开(公告)日:2007-05-15

    申请号:US11106552

    申请日:2005-04-15

    申请人: Kun-Ming Chen

    发明人: Kun-Ming Chen

    IPC分类号: G02B15/14

    CPC分类号: G02B7/10

    摘要: The present invention discloses a zoom lens assembly with capability of assuring concentricity of at least a lens group even during activity. The zoom lens assembly includes a plurality of optical lenses, at least two internal barrels, a lens holder and an alignment element wherein the lenses can be divided into at least two lens groups. The two internal barrels are used to respectively retain corresponding lens group therein to define a first and second lens sets. The lens holder is utilized to accommodate the first and second lens set therein. After twice alignment procedures in an assembled method, an internal barrel retained with one lens group is accommodated within the other internal barrel retained with another lens group to be precisely coupled. The two lens sets with mating structures are coupled to a guiding groove defined on the lens holder thereby the lens sets can slide inside the lens holder.

    摘要翻译: 本发明公开了一种即使在活动期间也能确保至少透镜组的同心度的变焦透镜组件。 变焦透镜组件包括多个光学透镜,至少两个内筒,透镜保持器和对准元件,其中透镜可被分成至少两个透镜组。 两个内筒用于分别保持对应的透镜组以限定第一和第二透镜组。 透镜支架用于容纳其中的第一和第二透镜组。 在组装方法中的两次对准程序之后,保持有一个透镜组的内筒被容纳在与另一个透镜组保持以准确耦合的另一内筒中。 具有配合结构的两个透镜组联接到限定在透镜保持器上的引导槽,从而透镜组可以在透镜保持器内滑动。

    Zoom lens assembly
    6.
    发明申请
    Zoom lens assembly 有权
    变焦镜头组合

    公开(公告)号:US20050286143A1

    公开(公告)日:2005-12-29

    申请号:US11106552

    申请日:2005-04-15

    申请人: Kun-Ming Chen

    发明人: Kun-Ming Chen

    IPC分类号: G02B7/10 G02B15/14

    CPC分类号: G02B7/10

    摘要: The present invention discloses a zoom lens assembly with capability of assuring concentricity of at least a lens group even during activity. The zoom lens assembly includes a plurality of optical lenses, at least two internal barrels, a lens holder and an alignment element wherein the lenses can be divided into at least two lens groups. The two internal barrels are used to respectively retain corresponding lens group therein to define a first and second lens sets. The lens holder is utilized to accommodate the first and second lens set therein. After twice alignment procedures in an assembled method, an internal barrel retained with one lens group is accommodated within the other internal barrel retained with another lens group to be precisely coupled. The two lens sets with mating structures are coupled to a guiding groove defined on the lens holder thereby the lens sets can slide inside the lens holder.

    摘要翻译: 本发明公开了一种即使在活动期间也能确保至少透镜组的同心度的变焦透镜组件。 变焦透镜组件包括多个光学透镜,至少两个内筒,透镜保持器和对准元件,其中透镜可被分成至少两个透镜组。 两个内筒用于分别保持对应的透镜组以限定第一和第二透镜组。 透镜支架用于容纳其中的第一和第二透镜组。 在组装方法中的两次对准程序之后,保持有一个透镜组的内筒被容纳在与另一个透镜组保持以准确耦合的另一内部镜筒内。 具有配合结构的两个透镜组联接到限定在透镜保持器上的引导槽,从而透镜组可以在透镜保持器内滑动。

    Device performance parmeter tuning method and system
    7.
    发明授权
    Device performance parmeter tuning method and system 有权
    设备性能参数调节方法和系统

    公开(公告)号:US08452439B2

    公开(公告)日:2013-05-28

    申请号:US13048282

    申请日:2011-03-15

    摘要: A method comprises computing respective regression models for each of a plurality of failure bins based on a plurality of failures identified during wafer electrical tests. Each regression model outputs a wafer yield measure as a function of a plurality of device performance variables. For each failure bin, sensitivity of the wafer yield measure to each of the plurality of device performance variables is determined, and the device performance variables are ranked with respect to sensitivity of the wafer yield measure. A subset of the device performance variables which have highest rankings and which have less than a threshold correlation with each other are selected. The wafer yield measures for each failure bin corresponding to one of the selected subset of device performance variables are combined, to provide a combined wafer yield measure. At least one new process parameter value is selected to effect a change in the one device performance variable, based on the combined wafer yield measure. The at least one new process parameter value is to be used to process at least one additional wafer.

    摘要翻译: 一种方法包括基于在晶片电测试期间识别的多个故障来计算多个故障仓中的每一个的相应回归模型。 每个回归模型输出作为多个设备性能变量的函数的晶片产量测量。 对于每个故障仓,确定晶片产量测量对多个器件性能变量中的每一个的灵敏度,并且相对于晶片产量测量的灵敏度对器件性能变量进行排序。 选择具有最高排名并且彼此具有小于阈值相关性的设备性能变量的子集。 组合对应于所选择的设备性能变量子集之一的每个故障仓的晶片产量测量,以提供组合晶片产量测量。 选择至少一个新的过程参数值,以基于组合的晶片产量测量来实现一个器件性能变量的变化。 至少一个新的过程参数值将用于处理至少一个附加晶片。

    Portable electronic device
    8.
    发明申请
    Portable electronic device 审中-公开
    便携式电子设备

    公开(公告)号:US20070060072A1

    公开(公告)日:2007-03-15

    申请号:US11327442

    申请日:2006-01-09

    IPC分类号: H04B1/38 H04M1/00

    摘要: A portable electronic device includes a body and a signal transmitter/receiver. The body has a display having a first display mode and a second display mode. The signal transmitter/receiver is pivotally connected to the body through the first pivot and the second pivot. The transmitter/receiver may be rotated to a first signal receiving position or a second signal receiving position corresponding to the first display mode or the second display mode. Therefore, signals can be better transmitted or received when the display is in a given display mode.

    摘要翻译: 便携式电子设备包括主体和信号发送器/接收器。 身体具有具有第一显示模式和第二显示模式的显示器。 信号发射器/接收器通过第一枢轴和第二枢轴枢转地连接到主体。 发送器/接收器可以旋转到对应于第一显示模式或第二显示模式的第一信号接收位置或第二信号接收位置。 因此,当显示器处于给定的显示模式时,可以更好地发送或接收信号。