摘要:
A device monitor for RF and DC measurement. The device monitor comprises a plurality of test cells arranged substantially in line. The test cell comprises a device under test, an input pad, an output pad and at least two reference pads. The input pad is electrically connected to an input of the DUT. The output pad is electrically connected to an output of the DUT. At least one of the reference pads is electrically connected to the DUT to provide a reference level. The input pad, the output pad and the reference pads are arranged substantially in line and at least one of the reference pads is located between the input pad and the output pad.
摘要:
A device monitor for RF and DC measurement. The device monitor comprises a plurality of test cells arranged substantially in line. The test cell comprises a device under test, an input pad, an output pad and at least two reference pads. The input pad is electrically connected to an input of the DUT. The output pad is electrically connected to an output of the DUT. At least one of the reference pads is electrically connected to the DUT to provide a reference level. The input pad, the output pad and the reference pads are arranged substantially in line and at least one of the reference pads is located between the input pad and the output pad.
摘要:
Provided is a CoCrPt-based alloy sputtering target containing cobalt (Co), chromium (Cr), platinum (Pt), cobalt oxide and non-magnetic oxide composition, wherein the lengths of ceramic phases of Cr2O3 and Co(Cr)—X—O formed in the sputtering targets are respectively less than 3 μm (“X” represents the metal element of the non-magnetic oxide). The sputtering target is obtained via controlling suitable composition proportion of the prealloy powder with Cr and the sintering factor to decrease the size of ceramic phases of Cr2O3 and Co(Cr)—X—O. Sputtering targets made by the methods of the present invention decrease the arcing effects and unnecessary formation of particles upon sputtering in addition to making the components of the sputtering targets distribute more uniformly therein.
摘要翻译:提供了含有钴(Co),铬(Cr),铂(Pt),氧化钴和非磁性氧化物组合物的CoCrPt基合金溅射靶,其中Cr 2 O 3和Co(Cr)-X- O形成的溅射靶分别小于3μm(X表示非磁性氧化物的金属元素)。 通过控制合金粉末与Cr的合适组成比例和烧结因子来获得溅射靶,以减小Cr2O3和Co(Cr)-X-O的陶瓷相的尺寸。 通过本发明的方法制造的溅射靶除了使溅射靶的成分更均匀地分布之外,还能降低溅射时的电弧效应和不必要的溅射形成。
摘要:
A method comprises computing respective regression models for each of a plurality of failure bins based on a plurality of failures identified during wafer electrical tests. Each regression model outputs a wafer yield measure as a function of a plurality of device performance variables. For each failure bin, sensitivity of the wafer yield measure to each of the plurality of device performance variables is determined, and the device performance variables are ranked with respect to sensitivity of the wafer yield measure. A subset of the device performance variables which have highest rankings and which have less than a threshold correlation with each other are selected. The wafer yield measures for each failure bin corresponding to one of the selected subset of device performance variables are combined, to provide a combined wafer yield measure. At least one new process parameter value is selected to effect a change in the one device performance variable, based on the combined wafer yield measure. The at least one new process parameter value is to be used to process at least one additional wafer.
摘要:
The present invention discloses a zoom lens assembly with capability of assuring concentricity of at least a lens group even during activity. The zoom lens assembly includes a plurality of optical lenses, at least two internal barrels, a lens holder and an alignment element wherein the lenses can be divided into at least two lens groups. The two internal barrels are used to respectively retain corresponding lens group therein to define a first and second lens sets. The lens holder is utilized to accommodate the first and second lens set therein. After twice alignment procedures in an assembled method, an internal barrel retained with one lens group is accommodated within the other internal barrel retained with another lens group to be precisely coupled. The two lens sets with mating structures are coupled to a guiding groove defined on the lens holder thereby the lens sets can slide inside the lens holder.
摘要:
The present invention discloses a zoom lens assembly with capability of assuring concentricity of at least a lens group even during activity. The zoom lens assembly includes a plurality of optical lenses, at least two internal barrels, a lens holder and an alignment element wherein the lenses can be divided into at least two lens groups. The two internal barrels are used to respectively retain corresponding lens group therein to define a first and second lens sets. The lens holder is utilized to accommodate the first and second lens set therein. After twice alignment procedures in an assembled method, an internal barrel retained with one lens group is accommodated within the other internal barrel retained with another lens group to be precisely coupled. The two lens sets with mating structures are coupled to a guiding groove defined on the lens holder thereby the lens sets can slide inside the lens holder.
摘要:
A method comprises computing respective regression models for each of a plurality of failure bins based on a plurality of failures identified during wafer electrical tests. Each regression model outputs a wafer yield measure as a function of a plurality of device performance variables. For each failure bin, sensitivity of the wafer yield measure to each of the plurality of device performance variables is determined, and the device performance variables are ranked with respect to sensitivity of the wafer yield measure. A subset of the device performance variables which have highest rankings and which have less than a threshold correlation with each other are selected. The wafer yield measures for each failure bin corresponding to one of the selected subset of device performance variables are combined, to provide a combined wafer yield measure. At least one new process parameter value is selected to effect a change in the one device performance variable, based on the combined wafer yield measure. The at least one new process parameter value is to be used to process at least one additional wafer.
摘要:
A portable electronic device includes a body and a signal transmitter/receiver. The body has a display having a first display mode and a second display mode. The signal transmitter/receiver is pivotally connected to the body through the first pivot and the second pivot. The transmitter/receiver may be rotated to a first signal receiving position or a second signal receiving position corresponding to the first display mode or the second display mode. Therefore, signals can be better transmitted or received when the display is in a given display mode.