公开(公告)号：US20130280497A1

公开(公告)日：2013-10-24

申请号：US13761918

申请日：2013-02-07

申请人： Carlton Grant Wilson ,  Christopher John Ellison ,  Takehiro Seshimo ,  Julia Cushen ,  Christopher M. Bates ,  Leon Dean ,  Logan J. Santos ,  Erica L. Rausch

发明人： Carlton Grant Wilson ,  Christopher John Ellison ,  Takehiro Seshimo ,  Julia Cushen ,  Christopher M. Bates ,  Leon Dean ,  Logan J. Santos ,  Erica L. Rausch

IPC分类号： C09D137/00

CPC分类号： G03F1/50 ,  B05D1/005 ,  B05D5/00 ,  B05D7/52 ,  B05D7/56 ,  B05D2252/02 ,  B81C1/00031 ,  B81C2201/0149 ,  B82Y10/00 ,  B82Y40/00 ,  C09D137/00 ,  C09D167/00 ,  G03F7/0002 ,  Y10T428/24802 ,  Y10T428/31663 ,  Y10T428/31855

摘要： The present invention involves the use of random copolymer top coats that can be spin coated onto block copolymer thin films and used to control the interfacial energy of the top coat-block copolymer interface. The top coats are soluble in aqueous weak base and can change surface energy once they are deposited onto the block copolymer thin film. The use of self-assembled block copolymers to produce advanced lithographic patterns relies on their orientation control in thin films. Top coats potentially allow for the facile orientation control of block copolymers which would otherwise be quite challenging.

公开(公告)号：US20130209757A1

公开(公告)日：2013-08-15

申请号：US13761324

申请日：2013-02-07

申请人： Carlton Grant Willson ,  William J. Durand ,  Christopher John Ellison ,  Christopher M. Bates ,  Takehiro Seshimo ,  Julia Cushen ,  Logan J. Santos ,  Leon Dean ,  Erica L. Rausch

发明人： Carlton Grant Willson ,  William J. Durand ,  Christopher John Ellison ,  Christopher M. Bates ,  Takehiro Seshimo ,  Julia Cushen ,  Logan J. Santos ,  Leon Dean ,  Erica L. Rausch

IPC分类号： C23C16/44 ,  B29C43/32

CPC分类号： C23C16/44 ,  B29C43/32 ,  B81C1/00031 ,  B81C2201/0149 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002 ,  Y10S977/788 ,  Y10S977/809 ,  Y10S977/811 ,  Y10S977/839 ,  Y10S977/888 ,  Y10S977/89 ,  Y10S977/891 ,  Y10T428/24802 ,  Y10T428/31504

摘要： The present invention uses vacuum deposited thin films of material to create an interface that non-preferentially interacts with different domains of an underlying block copolymer film. The non-preferential interface prevents formation of a wetting layer and influences the orientation of domains in the block copolymer. The purpose of the deposited polymer is to produce nanostructured features in a block copolymer film that can serve as lithographic patterns.

摘要翻译： 本发明使用真空沉积的材料薄膜来产生与下面的嵌段共聚物膜的不同区域非优先相互作用的界面。 非优选界面防止形成润湿层并影响嵌段共聚物中结构域的取向。 沉积的聚合物的目的是在嵌段共聚物膜中产生可用作光刻图案的纳米结构特征。