公开(公告)号：US06770886B1

公开(公告)日：2004-08-03

申请号：US09969561

申请日：2001-10-02

申请人： Louis N. Koppel ,  Charles Schmelz

发明人： Louis N. Koppel ,  Charles Schmelz

IPC分类号： H01L3102

CPC分类号： G01N23/20

摘要： A detector assembly is introduced that provides shielding of irradiation vulnerable regions of an X-ray detector against directly impinging and scattered X-rays. A shielding unit has a primary aperture to shape an X-ray beam reflected from a test area of a work piece such that the shaped beam directly impinges an X-ray sensing area of the detector. A secondary aperture shields off X-rays scattering off along the edges of the primary aperture. In the preferred embodiment, the shielding unit is a monolithic structure. An area between primary and secondary aperture is laterally recessed to prevent a portion of scattered X-rays from being deflected onto the sensing area.

摘要翻译： 引入检测器组件，其提供对X射线检测器的照射脆弱区域的屏蔽，以防止直接撞击和散射的X射线。 屏蔽单元具有主孔以对从工件的测试区域反射的X射线束成形，使得成形光束直接撞击检测器的X射线感测区域。 次级光圈屏蔽沿主孔边缘散射的X射线。 在优选实施例中，屏蔽单元是单片结构。 主孔和次孔之间的区域被横向凹入以防止一部分散射的X射线偏转到感测区域上。

公开(公告)号：US06453006B1

公开(公告)日：2002-09-17

申请号：US09527389

申请日：2000-03-16

申请人： Louis N. Koppel ,  Craig E. Uhrich ,  Jon Opsal

发明人： Louis N. Koppel ,  Craig E. Uhrich ,  Jon Opsal

IPC分类号： G01N23201

CPC分类号： G01N23/20

摘要： The present invention relates to the calibration and alignment of an X-ray reflectometry (“XRR”) system for measuring thin films. An aspect of the present invention describes a method for accurately determining C0 for each sample placement and for finding the incident X-ray intensity corresponding to each pixel of a detector array and thus permitting an amplitude calibration of the reflectometer system. Another aspect of the present invention relates to a method for aligning an angle-resolved X-ray reflectometer that uses a focusing optic, which may preferably be a Johansson crystal. Another aspect of the present invention is to validate the focusing optic. Another aspect of the present invention relates to the alignment of the focusing optic with the X-ray source. Another aspect of the present invention concerns the correction of measurements errors caused by the tilt or slope of the sample. Yet another aspect of the present invention concerns the calibration of the vertical position of the sample.

摘要翻译： 本发明涉及用于测量薄膜的X射线反射测量（“XRR”）系统的校准和对准。 本发明的一个方面描述了一种用于准确地确定每个样本放置的C0并且用于找到对应于检测器阵列的每个像素的入射X射线强度并因此允许反射计系统的幅度校准的方法。 本发明的另一方面涉及一种用于对准使用聚焦光学元件的角度分辨X射线反射计的方法，其可以优选地是约翰逊晶体。 本发明的另一方面是验证聚焦光学元件。 本发明的另一方面涉及聚焦光学元件与X射线源的对准。 本发明的另一方面涉及由样品的倾斜或斜率引起的测量误差的校正。 本发明的另一方面涉及到样品的垂直位置的校准。

公开(公告)号：US06744850B2

公开(公告)日：2004-06-01

申请号：US10053373

申请日：2001-10-24

申请人： Jeffrey T. Fanton ,  Craig Uhrich ,  Louis N. Koppel

发明人： Jeffrey T. Fanton ,  Craig Uhrich ,  Louis N. Koppel

IPC分类号： G01T136

CPC分类号： G01N23/20

摘要： An x-ray reflectometry system for measuring thin film samples. The system includes an adjustable x-ray source, such that characteristics of an x-ray probe beam output by the x-ray source can be adjusted to improve the resolution of the measurement system. The x-ray probe beam can also be modified to increase the speed of evaluating the thin film sample, for situations where some degree of resolution can be sacrificed. In addition, or alternatively, the system can also provide an adjustable detector position device which allows the position of the detector to be adjusted to increase the resolution of the system, or to reduce the time it takes to evaluate the thin film material.

摘要翻译： 用于测量薄膜样品的x射线反射系统。 该系统包括可调节的x射线源，使得可以调整由x射线源输出的x射线探针束的特性，以提高测量系统的分辨率。 对于可以牺牲某种程度的分辨率的情况，也可以修改x射线探针光束以增加评估薄膜样品的速度。 另外或者替代地，系统还可以提供可调节的检测器位置装置，其允许调整检测器的位置以增加系统的分辨率，或减少评估薄膜材料所需的时间。

公开(公告)号：US06987832B2

公开(公告)日：2006-01-17

申请号：US10861120

申请日：2004-06-04

申请人： Louis N. Koppel ,  Craig E. Uhrich ,  Jon Opsal

发明人： Louis N. Koppel ,  Craig E. Uhrich ,  Jon Opsal

IPC分类号： G01N23/20

CPC分类号： G01N23/20

摘要： In the calibration and alignment of an X-ray reflectometry (“XRR”) system for measuring thin films, an approach is presented for accurately determining C0 for each sample placement and for finding the incident X-ray intensity corresponding to each pixel of a detector array and thus permitting an amplitude calibration of the reflectometer system. Another approach involves aligning an angle-resolved X-ray reflectometer using a focusing optic, such as a Johansson crystal. Another approach relates to validating the focusing optic. Another approach relates to the alignment of the focusing optic with the X-ray source. Another approach concerns the correction of measurements errors caused by the tilt or slope of the sample. Yet another approach concerns the calibration of the vertical position of the sample.

摘要翻译： 在用于测量薄膜的X射线反射测量（“XRR”）系统的校准和对准中，提出了用于准确地确定每个样品放置的C 和用于发现入射X射线 强度对应于检测器阵列的每个像素，从而允许反射计系统的振幅校准。 另一种方法包括使用聚焦光学元件（例如约翰逊晶体）对准角度分辨的X射线反射计。 另一种方法涉及验证聚焦光学元件。 另一种方法涉及聚焦光学元件与X射线源的对准。 另一种方法涉及由样品的倾斜或斜率引起的测量误差的校正。 另一种方法涉及样品的垂直位置的校准。

公开(公告)号：US5619548A

公开(公告)日：1997-04-08

申请号：US514303

申请日：1995-08-11

申请人： Louis N. Koppel

发明人： Louis N. Koppel

IPC分类号： G01B15/00 ,  G01B15/02 ,  G21K1/06

CPC分类号： G01B15/02

摘要： A monochromator positioned in the path of a plurality of X-rays to simultaneously impinge the plurality of X-rays onto a thin-film at various angles of incidence, typically greater than a critical angle .psi..sub.c. The monochromator may be cylindrically or toroidally shaped, defining two focal areas with a source of X-rays positioned at the first focal point and a sample containing the thin-film layer positioned at the second focal point. A position sensitive detector is positioned to sense monochromatic X-rays reflected from the thin-film and produce a signal corresponding to both intensity and an angle of reflection of the monochromatic X-rays sensed. A processor is connected to receive signals produced by the detector to determine, as a function of intensity and angle of reflection of the monochromatic X-rays impinging on the detector, various properties of the structure of the thin-film layer, including the thickness, density and smoothness.

摘要翻译： 定位在多个X射线的路径中的单色仪，以同时以多种入射角度（通常大于临界角度psi c）将多个X射线同时撞击到薄膜上。 单色器可以是圆柱形或环形形状，限定两个聚焦区域，其中X射线源位于第一焦点处，而样品包含位于第二焦点处的薄膜层。 位置敏感检测器被定位成感测从薄膜反射的单色X射线，并产生对应于感测的单色X射线的强度和反射角的信号。 连接处理器以接收由检测器产生的信号，以确定作为照射在检测器上的单色X射线的反射强度和角度的函数，包括厚度的薄膜层的结构的各种性质， 密度和平滑度。

公开(公告)号：US06768785B2

公开(公告)日：2004-07-27

申请号：US10643348

申请日：2003-08-19

申请人： Louis N. Koppel ,  Craig E. Uhrich ,  Jon Opsal

发明人： Louis N. Koppel ,  Craig E. Uhrich ,  Jon Opsal

IPC分类号： G01N2320

CPC分类号： G01N23/20

摘要： The present invention relates to the calibration and alignment of an X-ray reflectometry (“XRR”) system for measuring thin films. An aspect of the present invention describes a method for accurately determining C0 for each sample placement and for finding the incident X-ray intensity corresponding to each pixel of a detector array and thus permitting an amplitude calibration of the reflectometer system. Another aspect of the present invention relates to a method for aligning an angle-resolved X-ray reflectometer that uses a focusing optic, which may preferably be a Johansson crystal. Another aspect of the present invention is to validate the focusing optic. Another aspect of the present invention relates to the alignment of the focusing optic with the X-ray source. Another aspect of the present invention concerns the correction of measurements errors caused by the tilt or slope of the sample. Yet another aspect of the present invention concerns the calibration of the vertical position of the sample.

摘要翻译： 本发明涉及用于测量薄膜的X射线反射测量（“XRR”）系统的校准和对准。 本发明的一个方面描述了一种用于准确地确定每个样本放置的C0并且用于找到对应于检测器阵列的每个像素的入射X射线强度并因此允许反射计系统的幅度校准的方法。 本发明的另一方面涉及一种用于对准使用聚焦光学元件的角度分辨X射线反射计的方法，其可以优选地是约翰逊晶体。 本发明的另一方面是验证聚焦光学元件。 本发明的另一方面涉及聚焦光学元件与X射线源的对准。 本发明的另一方面涉及由样品的倾斜或斜率引起的测量误差的校正。 本发明的另一方面涉及对样品的垂直位置的校准。

公开(公告)号：US06643354B2

公开(公告)日：2003-11-04

申请号：US10124776

申请日：2002-04-17

申请人： Louis N. Koppel ,  Craig E. Uhrich ,  Jon Opsal

发明人： Louis N. Koppel ,  Craig E. Uhrich ,  Jon Opsal

IPC分类号： G01N23201

CPC分类号： G01N23/20

摘要： The present invention relates to the calibration and alignment of an X-ray reflectometry (“XRR”) system for measuring thin films. An aspect of the present invention describes a method for accurately determining C0 for each sample placement and for finding the incident X-ray intensity corresponding to each pixel of a detector array and thus permitting an amplitude calibration of the reflectometer system. Another aspect of the present invention relates to a method for aligning an angle-resolved X-ray reflectometer that uses a focusing optic, which may preferably be a Johansson crystal. Another aspect of the present invention is to validate the focusing optic. Another aspect of the present invention relates to the alignment of the focusing optic with the X-ray source. Another aspect of the present invention concerns the correction of measurements errors caused by the tilt or slope of the sample. Yet another aspect of the present invention concerns the calibration of the vertical position of the sample.

公开(公告)号：US06507634B1

公开(公告)日：2003-01-14

申请号：US10067604

申请日：2002-02-04

申请人： Louis N. Koppel ,  William Johnson

发明人： Louis N. Koppel ,  William Johnson

IPC分类号： G01N2306

CPC分类号： G01N23/20 ,  G01B15/025

摘要： A metrology system and method for measuring the thickness of thin-films of semiconductor wafer. This system and method analyze x-ray reflectivity data to determine transmission characteristics of thin-film layers. Based on these transmission characteristics the thickness of the thin-layer can be determined. Unlike some prior systems and methods, the system and method herein does not determine the thickness of the thin-film layer based on a fringe pattern in reflectivity for the thin-film layer. The fact that the system and method herein does not rely the fringe pattern is particularly advantageous in situations where the thin-film layer is of thickness which makes it very difficult to resolve the fringe pattern in the reflectivity data.

摘要翻译： 一种用于测量半导体晶片薄膜厚度的计量系统和方法。 该系统和方法分析x射线反射率数据，以确定薄膜层的透射特性。 基于这些传输特性，可以确定薄层的厚度。 与一些现有的系统和方法不同，本文的系统和方法不基于薄膜层的反射率中的条纹图案来确定薄膜层的厚度。 这里的系统和方法不依赖于条纹图案的事实在薄膜层的厚度使得非常难以解决反射率数据中的条纹图案的情况下特别有利。