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    Optical substrate inspection apparatus
    2.
    发明授权
    Optical substrate inspection apparatus 失效
    光学基板检查装置

    公开(公告)号：US6084716A

    公开(公告)日：2000-07-04

    申请号：US112641

    申请日：1998-07-09

    申请人： Yasushi Sanada ,  Toru Tojo ,  Mitsuo Tabata ,  Kyoji Yamashita ,  Hideo Nagai ,  Noboru Kobayashi ,  Hisakazu Yoshino ,  Makoto Taya ,  Akemi Miwa

    发明人： Yasushi Sanada ,  Toru Tojo ,  Mitsuo Tabata ,  Kyoji Yamashita ,  Hideo Nagai ,  Noboru Kobayashi ,  Hisakazu Yoshino ,  Makoto Taya ,  Akemi Miwa

    IPC分类号： G01B11/30 ,  G01N21/84 ,  G01N21/88 ,  G01N21/94 ,  G01N21/956 ,  G03F1/84 ,  G03F7/20 ,  H01L21/027 ,  H01L21/66 ,  G02B27/10 ,  G02B27/14

    CPC分类号： G03F1/84 ,  G01N21/95607 ,  G03F7/70616

    摘要： A single light emitted from a laser source is split into multiple beams. The multiple beams are illuminated by a multi-beam scanner to scan a substrate of interest. An optical system is provided for focusing the multiple beams independently on the substrate and directing a reflected light or a transmitted light of the multiple beams on the substrate. Aperture regulating members are disposed at equal intervals corresponding to the interval between the multiple beams for controlling the multiple beams directed from the substrate by the optical system. The multiple beams passed through their respective aperture regulating members are received by an optical detector assembly which detect a change in the amount of the multiple beams. The substrate is continuously moved by a movable table on a plane substantially vertical to the multiple beams and in a direction arranged at substantially a right angle to the scanning direction of the multiple beams. Then, a scanned image is produced by an image processor from a signal output of the detector assembly and data of the coordinate location of the movable table and compared by a comparator with a corresponding reference image.

    摘要翻译： 从激光源发射的单个光被分成多个光束。 多光束被多光束扫描仪照射以扫描感兴趣的衬底。 提供了一种光学系统，用于将多个光束独立地聚焦在衬底上并且将多个光束的反射光或透射光引导到衬底上。 光圈调节构件以与多个光束之间的间隔相等的间隔设置，用于通过光学系统控制从衬底引导的多个光束。 通过其各自的孔径调节构件的多个光束被检测多个光束的量的变化的光学检测器组件接收。 基板在与多个光束大致垂直的平面上并且在与多个光束的扫描方向大致成直角的方向上由可移动台连续移动。 然后，扫描图像由图像处理器从检测器组件的信号输出和可移动表的坐标位置的数据产生，并由具有相应参考图像的比较器进行比较。

    Pattern evaluation apparatus and a method of pattern evaluation
    3.
    发明授权
    Pattern evaluation apparatus and a method of pattern evaluation 失效
    模式评估装置和模式评估方法

    公开(公告)号：US5602645A

    公开(公告)日：1997-02-11

    申请号：US527633

    申请日：1995-09-13

    申请人： Mitsuo Tabata ,  Toru Tojo ,  Kiminobu Akeno ,  Toshiyuki Watanabe ,  Tomohide Watanabe ,  Eiji Yamanaka ,  Chikara Itoh ,  Makoto Taya

    发明人： Mitsuo Tabata ,  Toru Tojo ,  Kiminobu Akeno ,  Toshiyuki Watanabe ,  Tomohide Watanabe ,  Eiji Yamanaka ,  Chikara Itoh ,  Makoto Taya

    IPC分类号： G01N21/956 ,  G03F1/84 ,  H01L21/027 ,  G01B11/00

    CPC分类号： G03F1/84 ,  G01N21/95607 ,  G03F1/62

    摘要： The present invention provides a pattern evaluating device including light irradiating means for irradiating the rays of light from a light source upon an object, an objective lens through which the light having penetrated through the object passes, an aperture member stopping the diameter of a light beam which has passed the objective lens, a photo receiving element receiving the light beam which has had the diameter stopped by the aperture member, and judging means for evaluating the pattern, following the information of the light received by the photo receiving element and which corresponds to the pattern, wherein the aperture member is capable of changing the numerical aperture, depending whether or not the sample is provided with a pericle.

    摘要翻译： 本发明提供了一种图案评估装置，其包括用于将来自光源的光线照射到物体上的光照射装置，穿过物体的光穿过的物镜通过阻止光束直径的孔径构件 已经通过物镜的光接收元件，接收由孔部件阻挡直径的光束的光接收元件，以及用于评估图案的判断装置，遵循由光接收元件接收的光的信息，并且对应于 所述图案，其中所述孔径构件能够根据样品是否设置有微孔而能够改变数值孔径。