公开(公告)号：US5812259A

公开(公告)日：1998-09-22

申请号：US748898

申请日：1996-11-15

申请人： Hisakazu Yoshino ,  Akihiko Sekine ,  Toru Tojo ,  Mitsuo Tabata

发明人： Hisakazu Yoshino ,  Akihiko Sekine ,  Toru Tojo ,  Mitsuo Tabata

IPC分类号： G01N21/956 ,  G03F1/26 ,  G03F1/32 ,  G03F1/84 ,  G01N2/00

CPC分类号： G03F1/26 ,  G01N21/956 ,  G03F1/84 ,  G03F1/32

摘要： A photomask defect inspection method is provided by which defects of pin holes with the diameter equal to or less than 0.35 .mu.m can be detected with certainty. According to the inspection method, a pattern whose image is projected onto an imaging position by the use of illumination light (P1) for exposure consists of light transmitting portions (41) formed on a glass base (2) and light intercepting portions (42) which transmit part of the illumination light (P1) in such a way that a phase of the part of the illumination light (P1) passing through the light intercepting portions (42) is delayed with respect to a phase of the illumination light (P1) passing through the light transmitting portions (41). Slight defects in the photomask pattern are detected on the basis of a signal obtained by illuminating the pattern with inspection light having an inspection wavelength in which the transmittance (T) of the light intercepting portions (42) is defined in the following formula on the basis of a signal detection limit (Thr). When the signal detection limit (Thr) of an inspection circuit is calculated on the supposition that a signal level of the inspection light passing through the light transmitting portions (41) is equal to 1, the relational expression is T.gtoreq.(Thr-0.01).sup.1/1,8.

摘要翻译： 提供一种光掩模缺陷检查方法，可以确定地检测直径等于或小于0.35μm的销孔的缺陷。 根据检查方法，通过使用用于曝光的照明光（P1）将图像投影到成像位置的图案由形成在玻璃基座（2）和遮光部分（42）上的透光部分（41）组成， 其以照明光（P1）的相位延迟照明光（P1）的通过遮光部（42）的一部分的相位的方式透射部分照明光（P1） 穿过透光部分（41）。 基于通过用具有检测波长的检查光照射图案获得的信号来检测光掩模图案中的轻微缺陷，其中遮光部分（42）的透射率（T）在下列公式中被定义： 的信号检测限（Thr）。 当考虑通过透光部（41）的检查光的信号电平等于1来计算检查电路的信号检测限（Thr）时，关系式为T> / =（Thr- 0.01）1 / 1.8。

公开(公告)号：US5404410A

公开(公告)日：1995-04-04

申请号：US180813

申请日：1994-01-10

申请人： Toru Tojo ,  Hideo Tsuchiya ,  Kyoji Yamashita ,  Mitsuo Tabata ,  Ryoichi Yoshikawa

发明人： Toru Tojo ,  Hideo Tsuchiya ,  Kyoji Yamashita ,  Mitsuo Tabata ,  Ryoichi Yoshikawa

IPC分类号： G01N21/88 ,  G01N21/93 ,  G01N21/956 ,  G03F1/84 ,  G06T1/00 ,  G06T7/00 ,  H01L21/66 ,  G06K9/38

CPC分类号： G06T7/001 ,  G06T2207/30148

摘要： A pattern defect inspection apparatus according to this invention comprises an irradiation circuit for irradiating a substrate on which a given pattern is drawn, a detector circuit for detecting said irradiated pattern on said substrate, a bit pattern generating circuit for quantizing and generating previously given design data by processing said design data based on specified figure information to obtain bit pattern data composed of a finite number of pixels, and a comparator circuit for detecting defects on said substrate by comparing the detected data from said detecting means with the data from said bit pattern generating means, wherein the bit pattern generating circuit has an additional parameter conditioner for setting the dimension of each pixel to be quantized into said bit pattern data to the desired value.

摘要翻译： 根据本发明的图案缺陷检查装置包括用于照射给定图案的基板的照射电路，用于检测所述基板上的所述照射图案的检测器电路，用于量化和生成先前给定的设计数据的位图生成电路 通过基于指定的图形信息处理所述设计数据以获得由有限数量的像素组成的位模式数据;以及比较器电路，用于通过将来自所述检测装置的检测数据与来自所述位图形生成的数据进行比较来检测所述衬底上的缺陷 装置，其中位模式产生电路具有附加参数调节器，用于将要量化的每个像素的尺寸设置为所述位模式数据为期望值。

公开(公告)号：US4572956A

公开(公告)日：1986-02-25

申请号：US525419

申请日：1983-08-22

申请人： Toru Tojo ,  Ichiro Mori ,  Toshiaki Shinozaki ,  Kazuyoshi Sugihara ,  Mitsuo Tabata ,  Chikara Itoh

发明人： Toru Tojo ,  Ichiro Mori ,  Toshiaki Shinozaki ,  Kazuyoshi Sugihara ,  Mitsuo Tabata ,  Chikara Itoh

IPC分类号： G03F7/207 ,  H01J37/21 ,  H01J37/304 ,  H01J37/317 ,  H01J37/30

CPC分类号： B82Y10/00 ,  B82Y40/00 ,  H01J37/21 ,  H01J37/304 ,  H01J37/3175 ,  H01J2237/216 ,  H01J2237/30455 ,  H01J2237/31779 ,  Y10S505/879

摘要： An electron beam pattern transfer system is disclosed which includes a photoelectric transducing mask disposed within a vacuum container and adapted to transfer a photoelectron beam pattern corresponding to a pattern of the mask onto a sample according to an amount of an incident light, a DC voltage generator connected to vary a voltage applied between the mask and the sample, and a focusing coil of a superconductive magnet for creating a magnetic field of a predetermined intensity between the mask and the sample. When a mask-to-sample distance and/or magnetic field intensity varies undesirably, the variation is electrically detected by detectors. In order to compensate for the defocusing of the photoelectron beam pattern on the sample due to the above-mentioned variation, a microprocessor automatically calculates an amount of correction with respect to the intensity of the electric field between the mask and the sample, on a real-time basis and supplies its control signal to the DC voltage generator.

摘要翻译： 公开了一种电子束图案转印系统，其包括设置在真空容器内并适于根据入射光量将对应于掩模图案的光电子束图案转移到样品上的光电转换掩模，直流电压发生器 连接以改变施加在掩模和样品之间的电压，以及用于在掩模和样品之间产生预定强度的磁场的超导磁体的聚焦线圈。 当掩模到采样距离和/或磁场强度变化不期望时，变化由检测器电检测。 为了补偿由于上述变化而导致的样品上的光电子束图案的散焦，微处理器自动地计算相对于掩模和样品之间的电场强度的校正量，实际上 并将其控制信号提供给直流电压发生器。

公开(公告)号：US4811062A

公开(公告)日：1989-03-07

申请号：US214821

申请日：1988-07-01

申请人： Mitsuo Tabata ,  Toru Tojo ,  Hiroaki Shimozono

发明人： Mitsuo Tabata ,  Toru Tojo ,  Hiroaki Shimozono

IPC分类号： H01L21/00 ,  G03F9/00 ,  H01L21/027 ,  H01L21/30 ,  H01L21/67 ,  H01L21/68 ,  G01B11/26

CPC分类号： G03F9/7049

摘要： In a method for aligning first and second objects relative to each other, according to this invention, the first and second objects are arranged opposite to each other, and are aligned in a direction perpendicular to their opposing direction. A grating pattern is formed, as an alignment mark, on the first object, and a checkerboard-like grating pattern is formed, also as an alignment mark, on the second object. A light beam emitted from an alignment light source is radiated onto the checkerboard-like grating pattern of the second object. The light beam diffracted by the checkerboard-like grating pattern is guided onto the grating pattern of the first object. The light beam diffracted by the grating pattern of the first object is detected by a detector. Since the light beam emitted from the light source is diffracted by the checkerboard-like grating pattern, a relative position of the first and second objects can be detected, irrespective of the distance therebetween. The first and second objects are accurately aligned, based on the detection result. This invention can be applied to a method for aligning a mask and a wafer when a circuit pattern pre-formed on the mask is to be transferred onto the wafer.

摘要翻译： 在第一和第二物体相对于彼此对准的方法中，根据本发明，第一和第二物体彼此相对布置，并且在垂直于它们的相反方向的方向上对齐。 在第一物体上形成作为对准标记的光栅图案，并且在第二物体上形成棋盘状光栅图案，也作为对准标记。 从对准光源发射的光束被辐射到第二物体的棋盘状光栅图案上。 由棋盘状光栅图案衍射的光束被引导到第一物体的光栅图案上。 由第一物体的光栅图案衍射的光束由检测器检测。 由于从光源发射的光束被棋盘状光栅图案衍射，所以可以检测第一和第二物体的相对位置，而与它们之间的距离无关。 基于检测结果，第一和第二物体被精确对准。 当将掩模上预先形成的电路图案转印到晶片上时，本发明可以应用于将掩模和晶片对准的方法。

公开(公告)号：US4590382A

公开(公告)日：1986-05-20

申请号：US613732

申请日：1984-05-24

申请人： Mitsuo Tabata

发明人： Mitsuo Tabata

IPC分类号： G03F9/00 ,  H01J37/304 ,  H01L21/027 ,  H01L21/30 ,  H01L23/544 ,  G01N21/00 ,  G01N23/00

CPC分类号： G03F9/7076 ,  G03F9/7049 ,  H01J37/3045 ,  H01L21/30 ,  H01L23/544 ,  H01L2223/54453 ,  H01L2924/0002 ,  Y10S505/88

摘要： Alignment marks are formed on the opposite surfaces of a photoelectric mask and a wafer. Each mark has a plurality of lines provided at a predetermined pitch. Widths of the lines of the photoelectric mask are progressively increased. On the while, widths of the lines of the wafer are progressively decreased. The marks of the wafer and the mask are opposite to each other such that lines of the maximum and minimum widths are opposite to each other. The overlapping area of the marks changes quadratically as a function of positional deviation between the mask and the wafer. When the mask is irradiated with ultraviolet light, X-rays are emitted from the mark on the wafer at an intensity corresponding to the overlapping area and are detected by an X-ray detector. The intensity of X-rays emitted changes quadratically as a function of deviation. The electron beam is scanned, and a detection signal is synchronously detected. The obtained PSD signal does not have a nonsensitive region and changes linearly as a function of deviation even if the beam scan width is narrow.

摘要翻译： 对准标记形成在光电掩模和晶片的相对表面上。 每个标记具有以预定间距设置的多条线。 光电掩模的线的宽度逐渐增加。 同时，晶片的线的宽度逐渐降低。 晶片和掩模的标记彼此相反，使得最大宽度和最小宽度的线彼此相反。 标记的重叠区域作为掩模和晶片之间的位置偏差的函数而二次变化。 当用紫外线照射掩模时，以对应于重叠区域的强度从晶片上的标记发射X射线，并且由X射线检测器检测。 发射的X射线的强度作为偏差的函数二次变化。 扫描电子束，同步检测检测信号。 获得的PSD信号不具有非敏感区域，并且即使光束扫描宽度窄，也作为偏差的函数线性地改变。

公开(公告)号：US6100970A

公开(公告)日：2000-08-08

申请号：US12034

申请日：1998-01-22

申请人： Hisakazu Yoshino ,  Akihiko Sekine ,  Toru Tojo ,  Mitsuo Tabata

发明人： Hisakazu Yoshino ,  Akihiko Sekine ,  Toru Tojo ,  Mitsuo Tabata

IPC分类号： G01N21/956 ,  G03F1/26 ,  G03F1/32 ,  G03F1/84 ,  G01N21/00

CPC分类号： G03F1/26 ,  G01N21/956 ,  G03F1/84 ,  G03F1/32

摘要： A photomask defect inspection method is provided by which defects of pin holes with the diameter equal to or less than 0.35 .mu.m can be detected with certainty. According to the inspection method, a pattern whose image is projected onto an imaging position by the use of illumination light (P1) for exposure consists of light transmitting portions (41) formed on a glass base (2) and light intercepting portions (42) which transmit part of the illumination light (P1) in such a way that a phase of the part of the illumination light (P1) passing through the light intercepting portions (42) is delayed with respect to a phase of the illumination light (P1) passing through the light transmitting portions (41). Slight detects in the photomask pattern are detected on the basis of a signal obtained by illuminating the pattern with inspection light having an inspection wavelength in which the transmittance (T) of the light intercepting portions (42) is defined in the following formula on the basis of a signal detection limit (Thr). When the signal detection limit (Thr) of an inspection circuit is calculated on the supposition that a signal level of the inspection light passing through the light transmitting portions (41) is equal to 1, the relational expression is T.gtoreq.(Thr-0.01).sup.1/1.8.

摘要翻译： 提供一种光掩模缺陷检查方法，可以确定地检测直径等于或小于0.35μm的销孔的缺陷。 根据检查方法，通过使用用于曝光的照明光（P1）将图像投影到成像位置的图案由形成在玻璃基座（2）和遮光部分（42）上的透光部分（41）组成， 其以照明光（P1）的相位延迟照明光（P1）的通过遮光部（42）的一部分的相位的方式透射部分照明光（P1） 穿过透光部分（41）。 基于通过用具有以下公式定义遮光部分（42）的透射率（T）的检查波长的检查光照射图案而获得的信号来检测光掩模图案中的轻微检测， 的信号检测限（Thr）。 当考虑通过透光部（41）的检查光的信号电平等于1来计算检查电路的信号检测限（Thr）时，关系式为T> / =（Thr- 0.01）+ E，fra 1 / 1.8 + EE。

公开(公告)号：US5960106A

公开(公告)日：1999-09-28

申请号：US413704

申请日：1995-03-30

申请人： Hideo Tsuchiya ,  Toru Tojo ,  Mitsuo Tabata ,  Toshiyuki Watanabe ,  Eiichi Kobayashi

发明人： Hideo Tsuchiya ,  Toru Tojo ,  Mitsuo Tabata ,  Toshiyuki Watanabe ,  Eiichi Kobayashi

IPC分类号： G01N21/88 ,  G01N21/93 ,  G01N21/956 ,  G03F1/84 ,  G06T1/00 ,  G06T7/00 ,  H01L21/027 ,  G06K9/00

CPC分类号： G06T7/0006 ,  G06T2207/30148

摘要： In a method of inspecting a sample on which a pattern relating to fabrication of a semiconductor device is formed, there are provided a light radiation unit, an acquiring unit, a storage unit, a template, a calculation unit, a correction unit, a defect detection unit and an output unit. Pinhole shape data to be detected of the pattern is stored in the template. The calculation unit calculates the degree of coincidence between the pinhole shape data stored in the template and the measured image data stored in the storage unit in units of a predetermined amount of data. The correction unit corrects a portion of the measured image data corresponding to a value of the degree of coincidence exceeding a second predetermined value in units of the predetermined amount of data, when the degree of coincidence obtained by the calculation unit has exceeded a first predetermined value, thereby correcting the portion of the measured image data including the detected pinhole. The defect detection unit detects a defect in the pattern on the basis of the corrected measured image data portion including the pinhole, which is obtained by the correcting unit, and the measured image data.

摘要翻译： 在形成有与半导体器件的制造有关的图案的样品的检查方法中，设置有光照单元，获取单元，存储单元，模板，计算单元，校正单元，缺陷 检测单元和输出单元。 要检测的图案的针孔形状数据存储在模板中。 计算单元以预定量的数据为单位计算存储在模板中的针孔形状数据与存储在存储单元中的测量图像数据之间的一致度。 当由计算单元获得的一致度已经超过第一预定值时，校正单元以与预定数据量为单位对应的符合度超过第二预定值的值的部分测量图像数据进行校正 从而校正包括检测到的针孔的测量图像数据的部分。 缺陷检测单元基于由校正单元获得的包括针孔的校正的测量图像数据部分和测量的图像数据来检测图案中的缺陷。

公开(公告)号：US5744381A

公开(公告)日：1998-04-28

申请号：US614063

申请日：1996-03-12

申请人： Mitsuo Tabata ,  Toru Tojo ,  Toshiyuki Watanabe ,  Hideo Tsuchiya

发明人： Mitsuo Tabata ,  Toru Tojo ,  Toshiyuki Watanabe ,  Hideo Tsuchiya

IPC分类号： G01N21/956 ,  G03F1/84 ,  H01L21/66 ,  G01R31/26 ,  G01N21/00 ,  G03F9/00

CPC分类号： G03F1/84 ,  G01N21/95607 ,  H01L22/12

摘要： A pattern defect inspection apparatus comprises a light irradiating portion, a light receive element, a light receive element amplifier, a preparation portion for preparing multi-valued design pattern image data, an offset adjusting portion, a gain adjusting portion, and an inspecting portion. The offset adjusting portion adjusts the offset of the light receive element amplifier such that measurement data of a translucent portion of a pattern on a sample surface corresponds to design pattern image data corresponding to the translucent portion, regarding the translucent portion as a non-transparent portion. The gain adjusting portion adjusts the gain of the light receive element amplifier such that measurement data of a transparent portion of the pattern on the sample surface corresponds to design pattern image data corresponding to the transparent portion.

摘要翻译： 图案缺陷检查装置包括光照射部分，光接收元件，光接收元件放大器，用于制备多值设计图案图像数据的准备部分，偏移调整部分，增益调节部分和检查部分。 偏移调整部分调节光接收元件放大器的偏移，使得样本表面上的图案的透光部分的测量数据对应于与半透明部分对应的设计图案图像数据，关于作为不透明部分的半透明部分 。 增益调整部分调节光接收元件放大器的增益，使得样品表面上的图案的透明部分的测量数据对应于对应于透明部分的设计图案图像数据。

公开(公告)号：US4545068A

公开(公告)日：1985-10-01

申请号：US463599

申请日：1983-02-03

申请人： Mitsuo Tabata ,  Masatsugu Kidode ,  Noboru Yamaguchi

发明人： Mitsuo Tabata ,  Masatsugu Kidode ,  Noboru Yamaguchi

IPC分类号： G09G5/00 ,  G06F3/153 ,  G06F12/00 ,  G06F12/02 ,  G06F12/08 ,  G06T1/20 ,  G09G3/00 ,  G09G3/20 ,  G06K9/36 ,  G06F15/20

CPC分类号： G06T1/20

摘要： An image processing system is disclosed which includes: a control computer which has a CPU and a main memory therein; and an image memory section which is connected to the CPU through an interface and which has an image memory for digitally storing image data, a memory controller and an image processor. A memory area as part of the main memory is independently allocated to store as a register area data transferred through a privately leased data bus which bypasses the interface between the control computer and the image memory section. When random access operation of the image data with respect to the image memory is performed, the data transfer between the CPU and the image memory section can be performed through the memory area (register area) and the special data bus without going through the interface.

摘要翻译： 公开了一种图像处理系统，其包括：控制计算机，其中具有CPU和主存储器; 以及图像存储部，其通过接口连接到CPU，并且具有用于数字存储图像数据的图像存储器，存储器控制器和图像处理器。 作为主存储器的一部分的存储器区域被独立地分配以作为通过私有租赁数据总线传送的寄存器区域数据来存储，该数据总线绕过控制计算机和图像存储器部分之间的接口。 当执行相对于图像存储器的图像数据的随机存取操作时，CPU和图像存储器部分之间的数据传送可以通过存储区域（寄存器区域）和专用数据总线进行，而不经过接口。

公开(公告)号：US6084716A

公开(公告)日：2000-07-04

申请号：US112641

申请日：1998-07-09

申请人： Yasushi Sanada ,  Toru Tojo ,  Mitsuo Tabata ,  Kyoji Yamashita ,  Hideo Nagai ,  Noboru Kobayashi ,  Hisakazu Yoshino ,  Makoto Taya ,  Akemi Miwa

发明人： Yasushi Sanada ,  Toru Tojo ,  Mitsuo Tabata ,  Kyoji Yamashita ,  Hideo Nagai ,  Noboru Kobayashi ,  Hisakazu Yoshino ,  Makoto Taya ,  Akemi Miwa

IPC分类号： G01B11/30 ,  G01N21/84 ,  G01N21/88 ,  G01N21/94 ,  G01N21/956 ,  G03F1/84 ,  G03F7/20 ,  H01L21/027 ,  H01L21/66 ,  G02B27/10 ,  G02B27/14

CPC分类号： G03F1/84 ,  G01N21/95607 ,  G03F7/70616

摘要： A single light emitted from a laser source is split into multiple beams. The multiple beams are illuminated by a multi-beam scanner to scan a substrate of interest. An optical system is provided for focusing the multiple beams independently on the substrate and directing a reflected light or a transmitted light of the multiple beams on the substrate. Aperture regulating members are disposed at equal intervals corresponding to the interval between the multiple beams for controlling the multiple beams directed from the substrate by the optical system. The multiple beams passed through their respective aperture regulating members are received by an optical detector assembly which detect a change in the amount of the multiple beams. The substrate is continuously moved by a movable table on a plane substantially vertical to the multiple beams and in a direction arranged at substantially a right angle to the scanning direction of the multiple beams. Then, a scanned image is produced by an image processor from a signal output of the detector assembly and data of the coordinate location of the movable table and compared by a comparator with a corresponding reference image.

摘要翻译： 从激光源发射的单个光被分成多个光束。 多光束被多光束扫描仪照射以扫描感兴趣的衬底。 提供了一种光学系统，用于将多个光束独立地聚焦在衬底上并且将多个光束的反射光或透射光引导到衬底上。 光圈调节构件以与多个光束之间的间隔相等的间隔设置，用于通过光学系统控制从衬底引导的多个光束。 通过其各自的孔径调节构件的多个光束被检测多个光束的量的变化的光学检测器组件接收。 基板在与多个光束大致垂直的平面上并且在与多个光束的扫描方向大致成直角的方向上由可移动台连续移动。 然后，扫描图像由图像处理器从检测器组件的信号输出和可移动表的坐标位置的数据产生，并由具有相应参考图像的比较器进行比较。