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公开(公告)号：US20120314722A1
公开(公告)日：2012-12-13
申请号：US13440919
申请日：2012-04-05
申请人： Don F. Heller , Marc Klosner , Brian A. Pryor , Thangavel Thevar , Bruce Boczar
发明人： Don F. Heller , Marc Klosner , Brian A. Pryor , Thangavel Thevar , Bruce Boczar
IPC分类号： H01S3/30
CPC分类号： H01S3/305 , H01S3/0064 , H01S3/0078 , H01S3/094038 , H01S3/094084 , H01S3/1633 , H01S3/2325
摘要： In one embodiment, the instant invention provides a method that includes: outputting a first laser beam having: a beam quality factor (M2) between 1 and 5, and a spectral width of less than 0.15 nm, where the outputting is performed by a laser generating component that includes a alexandrite laser oscillator; converting the first laser beam through a first Raman cell to produce a second laser beam, where the first Raman cell is filled with a first gas; and converting the second laser beam through a second Raman cell to produce a final laser beam, where the second Raman cell is filled with a second gas and is operationally positioned after the first Raman cell, where the first gas and the second gas are different gasses, and where the final laser beam having: a second energy of at least 1 mJ, and at least one wavelength longer than 2.5 micron.
摘要翻译： 在一个实施例中，本发明提供了一种方法，其包括：输出第一激光束，其具有：光束品质因子（M2）在1和5之间，光谱宽度小于0.15nm，其中输出由激光 包括亚历山大激光振荡器的发电元件; 通过第一拉曼单元转换第一激光束以产生第二激光束，其中第一拉曼单元被第一气体填充; 以及通过第二拉曼单元转换所述第二激光束以产生最终的激光束，其中所述第二拉曼单元被第二气体填充并且在第一拉曼单元之后被操作地定位，其中所述第一气体和所述第二气体是不同的气体 并且其中最终激光束具有至少1mJ的第二能量和至少一个长于2.5微米的波长的激光束。
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公开(公告)号：US20060012766A1
公开(公告)日：2006-01-19
申请号：US10890498
申请日：2004-07-13
申请人： Marc Klosner , Kanti Jain
发明人： Marc Klosner , Kanti Jain
IPC分类号： G03B27/54
CPC分类号： G03F7/70275 , G03F7/70291
摘要： A versatile maskless patterning system with capability for selecting rapidly among a plurality of projection lenses mounted on a turret. This provides the ability to rapidly select multiple choices for resolution and enables optimization of the combination of the imaging resolution and exposure throughput, making possible cost-effective fabrication of microelectronics packaging products. A preferred embodiment uses a digital micromirror device array spatial light modulator as a virtual mask. Another preferred embodiment use multiple closely spaced digital micromirror device array spatial light modulators to enhance throughput.
摘要翻译： 一种多用途无掩模图案化系统，具有在安装在转台上的多个投影透镜之间快速选择的能力。 这提供了快速选择多个选择以进行分辨率的能力，并且能够优化成像分辨率和曝光量的组合，从而使得可能具有成本效益的微电子封装产品的制造。 优选实施例使用数字微镜器件阵列空间光调制器作为虚拟掩模。 另一个优选实施例使用多个紧密间隔的数字微镜器件阵列空间光调制器来增加吞吐量。
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公开(公告)号：US08494012B2
公开(公告)日：2013-07-23
申请号：US13440919
申请日：2012-04-05
IPC分类号： H01S3/30
CPC分类号： H01S3/305 , H01S3/0064 , H01S3/0078 , H01S3/094038 , H01S3/094084 , H01S3/1633 , H01S3/2325
摘要： In one embodiment, the instant invention provides a method that includes: outputting a first laser beam having: a beam quality factor (M2) between 1 and 5, and a spectral width of less than 0.15 nm, where the outputting is performed by a laser generating component that includes a alexandrite laser oscillator; converting the first laser beam through a first Raman cell to produce a second laser beam, where the first Raman cell is filled with a first gas; and converting the second laser beam through a second Raman cell to produce a final laser beam, where the second Raman cell is filled with a second gas and is operationally positioned after the first Raman cell, where the first gas and the second gas are different gasses, and where the final laser beam having: a second energy of at least 1 mJ, and at least one wavelength longer than 2.5 micron.
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公开(公告)号：US20070139791A1
公开(公告)日：2007-06-21
申请号：US11640590
申请日：2006-12-18
IPC分类号： G02B9/00
CPC分类号： G03F7/70075 , G02B27/0927 , G02B27/0994
摘要： An optimized illumination system that efficiently produces uniform illumination for exposure, photoablation, and laser crystallization systems. The illumination system includes a homogenizer that uniformizes and shapes a light beam, which is directed onto a mask by condenser optics. The illumination system recycles radiation by directing light reflected by the mask back into the illumination system, where an apertured mirror situated at the input end re-directs it back toward the mask. The relative mirror and aperture sizes affect recycling efficiency and system throughput, so the system features a wide recycling segment enabling greater mirror-to-aperture area ratios. An added segment at the output end of the homogenizer matches the homogenizer diameter to the projection imaging system object field size. This standardizes the homogenizer and condenser lens construction system, reducing the need for customized parts and thus reducing manufacturing time and expense.
摘要翻译： 一种优化的照明系统，可有效地为曝光，光消融和激光结晶系统产生均匀的照明。 照明系统包括均匀化器，其使通过冷凝器光学器件引导到掩模上的光束均匀化并成形。 照明系统通过将由掩模反射的光引导回到照明系统中来回收辐射，其中位于输入端的多孔镜将其重新引向掩模。 相对镜和孔径尺寸影响回收效率和系统吞吐量，因此该系统具有广泛的回收部分，从而实现更大的镜面与孔径面积比。 在均化器的输出端附加的段将均匀器直径与投影成像系统对象场尺寸相匹配。 这使得均化器和聚光透镜构造系统标准化，减少了对定制零件的需求，从而缩短了制造时间和费用。
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公开(公告)号：US20070024830A1
公开(公告)日：2007-02-01
申请号：US11512954
申请日：2006-08-30
申请人： Sivarama Kuchibhotla , Kanti Jain , Marc Klosner
发明人： Sivarama Kuchibhotla , Kanti Jain , Marc Klosner
IPC分类号： G03B27/68
摘要： A zero power identical pair of oppositely-oriented meniscus lens elements mounted in the projection light path, serves as curved mask support while compensating for optical anomalies such as beam shift and beam deviations produced by other transparent supports for the curved mask. The zero-power meniscus lens pair, without affecting the transmission beam characteristics, lets the beam diffract as efficiently as does a regular planar mask, thus preserving the partial coherence effects and resolution concepts of projection lithography. This simple but novel optics device is not only expected to clear several barriers for curved mask projection lithography but also find place in other applications where collimated or converging light beams have to travel extra paths without significant aberration.
摘要翻译： 安装在投影光路中的零功率相同的一对相反方向的弯月透镜元件用作弯曲的掩模支撑，同时补偿光学异常，例如由弯曲掩模的其他透明支撑产生的光束偏移和光束偏移。 零功率弯月透镜对，不影响透射光束特性，使得光束像普通的平面掩模一样有效地衍射，从而保持投影光刻的部分相干效应和分辨率概念。 这种简单但新颖的光学器件不仅预期能够清除弯曲掩模投影光刻的几个障碍，而且还可以发现在其中准直或会聚光束必须行进额外路径而没有显着像差的其他应用场合。
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公开(公告)号：US20060001845A1
公开(公告)日：2006-01-05
申请号：US10879887
申请日：2004-06-29
IPC分类号： G03B27/00
CPC分类号： G03F7/70075 , G02B27/0927 , G02B27/0994
摘要： An optimized illumination system that efficiently produces uniform illumination for exposure, photoablation, and laser crystallization systems. The illumination system includes a homogenizer that uniformizes and shapes a light beam, which is directed onto a mask by condenser optics. The illumination system recycles radiation by directing light reflected by the mask back into the illumination system, where an apertured mirror situated at the input end re-directs it back toward the mask. The relative areas of the mirror and aperture affect recycling efficiency and system throughput, so the system features a larger-diameter recycling segment enabling greater mirror-to-aperture area ratios. An added segment at the output end of the homogenizer matches the homogenizer diameter to the projection imaging system object field size. This standardizes the homogenizer and condenser lens integration, reducing the need for customized parts and thus reducing manufacturing time and expense.
摘要翻译： 一种优化的照明系统，可有效地为曝光，光消融和激光结晶系统产生均匀的照明。 照明系统包括均匀化器，其使通过冷凝器光学器件引导到掩模上的光束均匀化并成形。 照明系统通过将由掩模反射的光引导回到照明系统中来回收辐射，其中位于输入端的多孔镜将其重新引向掩模。 镜面和孔径的相对面积影响回收效率和系统产量，因此该系统具有更大直径的回收部分，从而实现更大的镜面与孔径面积比。 在均化器的输出端附加的段将均匀器直径与投影成像系统对象场尺寸相匹配。 这使得均化器和聚光镜集成的标准化，减少了对定制零件的需求，从而缩短了制造时间和费用。
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公开(公告)号：US20050122494A1
公开(公告)日：2005-06-09
申请号：US10731187
申请日：2003-12-09
申请人： Sivarama Kuchibhotla , Kanti Jain , Marc Klosner
发明人： Sivarama Kuchibhotla , Kanti Jain , Marc Klosner
摘要： A Zerogon, a zero power identical pair of oppositely-oriented meniscus lens elements mounted in the illumination light path, serves as curved mask support while compensating for optical anomalies such as beam shift and beam deviations produced by other transparent supports for the curved mask. The Zerogon, without affecting the transmission beam characteristics, lets the beam diffract as efficiently as does a regular planar mask, thus preserving the partial coherence parameters and resolution capabilities of projection lithography. This novel optical device is not only expected to clear several barriers for curved mask projection lithography but also find place in other applications where collimated or converging light beams have to travel extra paths without significant aberration in any generic optical system.
摘要翻译： 安装在照明光路中的零功率相同的相反方向的弯月透镜元件的Zerogon用作弯曲的掩模支撑，同时补偿光学异常，例如由弯曲掩模的其他透明支撑件产生的光束偏移和光束偏移。 Zerogon在不影响透射光束特性的情况下，使得像普通平面掩模一样有效地衍射光束，从而保留投影光刻的部分相干参数和分辨能力。 这种新颖的光学器件不仅预期能够清除弯曲掩模投影光刻的几个障碍，而且还可以发现其他应用中，其中准直或会聚光束必须在任何通用光学系统中行进额外的路径而没有显着的像差。
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