公开(公告)号：US20050139790A1

公开(公告)日：2005-06-30

申请号：US10747617

申请日：2003-12-30

申请人： Martinus Boogaarts ,  Hans Butler ,  Henrikus Cox ,  Martinus Cuijpers ,  Jan Kuit

发明人： Martinus Boogaarts ,  Hans Butler ,  Henrikus Cox ,  Martinus Cuijpers ,  Jan Kuit

IPC分类号： G03F9/00 ,  G01N21/88 ,  G03F7/20 ,  H01L21/027 ,  G01N21/86

CPC分类号： G03F7/70808 ,  G01N21/8851 ,  G03F7/709

摘要： The present invention relates to a lithographic projection apparatus comprising a housing, which comprises therein a first exposure system that has at least one movable part, e.g. a movable first substrate holder, or a movable second substrate holder in a twin stage apparatus. The system is further provided with position disturbance correction system for correcting a position of the first substrate holder with respect to the patterned projection beam due to the influence of gas pressure differences or gas movements, caused by movements of the movable part. The invention also generally relates to a device manufacturing method comprising providing a lithographic projection apparatus according to the invention with a first substrate, and exposing said first substrate, wherein during said exposing of the first substrate a position thereof is corrected by means of position disturbance correction system.

摘要翻译： 本发明涉及一种包括壳体的光刻投影设备，其中包括第一曝光系统，该曝光系统具有至少一个可移动部分，例如， 可移动的第一衬底保持器或可移动的第二衬底保持器。 该系统还设置有位置扰动校正系统，用于由于可移动部件的运动引起的气体压力差或气体运动的影响，校正第一衬底保持器相对于图案化的投影梁的位置。 本发明还通常涉及一种器件制造方法，其包括：提供具有第一衬底的根据本发明的光刻投影设备，并且暴露所述第一衬底，其中在所述第一衬底的暴露期间，其位置通过位置干扰校正被校正 系统。