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    Lithographic apparatus and device manufacturing method
    1.
    发明申请
    Lithographic apparatus and device manufacturing method 有权
    平版印刷设备和器件制造方法

    公开(公告)号：US20050139790A1

    公开(公告)日：2005-06-30

    申请号：US10747617

    申请日：2003-12-30

    申请人： Martinus Boogaarts ,  Hans Butler ,  Henrikus Cox ,  Martinus Cuijpers ,  Jan Kuit

    发明人： Martinus Boogaarts ,  Hans Butler ,  Henrikus Cox ,  Martinus Cuijpers ,  Jan Kuit

    IPC分类号： G03F9/00 ,  G01N21/88 ,  G03F7/20 ,  H01L21/027 ,  G01N21/86

    CPC分类号： G03F7/70808 ,  G01N21/8851 ,  G03F7/709

    摘要： The present invention relates to a lithographic projection apparatus comprising a housing, which comprises therein a first exposure system that has at least one movable part, e.g. a movable first substrate holder, or a movable second substrate holder in a twin stage apparatus. The system is further provided with position disturbance correction system for correcting a position of the first substrate holder with respect to the patterned projection beam due to the influence of gas pressure differences or gas movements, caused by movements of the movable part. The invention also generally relates to a device manufacturing method comprising providing a lithographic projection apparatus according to the invention with a first substrate, and exposing said first substrate, wherein during said exposing of the first substrate a position thereof is corrected by means of position disturbance correction system.

    摘要翻译： 本发明涉及一种包括壳体的光刻投影设备，其中包括第一曝光系统，该曝光系统具有至少一个可移动部分，例如， 可移动的第一衬底保持器或可移动的第二衬底保持器。 该系统还设置有位置扰动校正系统，用于由于可移动部件的运动引起的气体压力差或气体运动的影响，校正第一衬底保持器相对于图案化的投影梁的位置。 本发明还通常涉及一种器件制造方法，其包括：提供具有第一衬底的根据本发明的光刻投影设备，并且暴露所述第一衬底，其中在所述第一衬底的暴露期间，其位置通过位置干扰校正被校正 系统。

    Lithographic apparatus and device manufacturing method
    2.
    发明申请
    Lithographic apparatus and device manufacturing method 有权
    平版印刷设备和器件制造方法

    公开(公告)号：US20060139613A1

    公开(公告)日：2006-06-29

    申请号：US11022950

    申请日：2004-12-28

    申请人： Martijn Houkes ,  Hans Butler ,  Henrikus Cox

    发明人： Martijn Houkes ,  Hans Butler ,  Henrikus Cox

    IPC分类号： G03B27/58

    CPC分类号： G03F7/70341 ,  G03F7/70725

    摘要： A lithographic apparatus includes a first movable element (such as an immersion liquid supply system), which is in operation in contact with a surface of a second movable element (such as a substrate table). Further, the lithographic apparatus includes a second element controller (such as a substrate table controller) to control a position quantity of the second movable element. Disturbance forces caused by, e.g., movements of the first and second movable elements with respect to each other, due to capillary forces disturb a position of the first and second movable elements. To at least partly correct a position of the second movable element due to such disturbance forces, the lithographic apparatus includes a feedforward control path to provide a disturbance force feedforward signal to the second element controller, the feedforward control path including a disturbance force estimator to estimate a disturbance force from a position quantity of the first movable element.

    摘要翻译： 光刻设备包括与第二可移动元件（例如基板台）的表面接触的第一可移动元件（例如浸没液体供应系统）。 此外，光刻设备包括用于控制第二可移动元件的位置量的第二元件控制器（诸如基板台控制器）。 由于毛细作用力引起的第一和第二可移动元件相对于彼此的运动引起的干扰力会扰乱第一和第二可移动元件的位置。 为了由于这种干扰力至少部分地校正第二可移动元件的位置，光刻设备包括前馈控制路径以向第二元件控制器提供干扰力前馈信号，前馈控制路径包括扰动力估计器以估计 来自第一可移动元件的位置量的扰动力。

    Lithographic apparatus having a controlled motor, and motor control system and method
    3.
    发明申请
    Lithographic apparatus having a controlled motor, and motor control system and method 失效
    具有受控电机的光刻设备，以及电机控制系统和方法

    公开(公告)号：US20070164697A1

    公开(公告)日：2007-07-19

    申请号：US11331337

    申请日：2006-01-13

    申请人： Henrikus Cox ,  Hans Butler ,  Sven Hol

    发明人： Henrikus Cox ,  Hans Butler ,  Sven Hol

    IPC分类号： H02P1/46

    CPC分类号： H02P25/06

    摘要： A lithographic apparatus includes an illumination system to condition a radiation beam. A patterning support holds a patterning device that imparts the radiation beam with a pattern to form a patterned radiation beam. A substrate support holds a substrate. A projection system projects the patterned radiation beam onto the substrate. A positioning system positions the patterning support and the substrate support. The positioning system has a motor with a stator and a mover coupled to a support, and an associated motor control system with a controller providing an output for controlling currents applied to the motor. The motor control system determines a controller output required to compensate for a weight of mover and associated support, determines a deviation of this output from an output required to compensate the gravity force acting on the mover and associated support, and corrects the currents applied to the motor based on the deviation.

    摘要翻译： 光刻设备包括用于调节辐射束的照明系统。 图案形成支撑件保持图案形成装置，其使得辐射束具有图案以形成图案化的辐射束。 衬底支撑件保持衬底。 投影系统将图案化的辐射束投射到衬底上。 定位系统定位图形支撑件和基板支撑件。 定位系统具有带有定子的电动机和耦合到支撑件的动子，以及具有控制器的相关联的电动机控制系统，该控制器提供用于控制施加到电动机的电流的输出。 电动机控制系统确定需要补偿动力和相关支撑的重量的控制器输出，确定该输出与补偿作用在动子和相关支撑上的重力所需的输出的偏差，并校正施加到 电机基于偏差。

    Lithographic apparatus comprising a substrate table and a surface substrate actuator
    7.
    发明授权
    Lithographic apparatus comprising a substrate table and a surface substrate actuator 有权
    光刻设备包括基片台和表面基片致动器

    公开(公告)号：US09110387B2

    公开(公告)日：2015-08-18

    申请号：US13477748

    申请日：2012-05-22

    申请人： Hans Butler ,  Jan Van Eijk ,  Sven Antoin Johan Hol ,  Johannes Petrus Martinus Bernardus Vermeulen ,  Yang-Shan Huang

    发明人： Hans Butler ,  Jan Van Eijk ,  Sven Antoin Johan Hol ,  Johannes Petrus Martinus Bernardus Vermeulen ,  Yang-Shan Huang

    IPC分类号： G03F7/20

    CPC分类号： G03F7/70783 ,  G03F7/70758

    摘要： A lithographic apparatus includes an illumination system configured to condition a radiation beam and a support constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam. The lithographic apparatus further includes a substrate table constructed to hold a substrate; a positioner constructed to position the substrate table; a projection system configured to project the patterned radiation beam onto a target portion of the substrate; a substrate surface actuator arranged to engage a part of a surface of the substrate facing the projection system, and a position controller configured to control a position of the substrate table, the position controller being arranged to drive the positioner and the substrate surface actuator.

    摘要翻译： 光刻设备包括被配置为调节辐射束和构造成支撑图案形成装置的支撑件的照明系统，所述图案形成装置能够在其横截面中赋予辐射束图案以形成图案化的辐射束。 所述光刻设备还包括构造成保持基板的基板台; 定位器，其被构造成定位所述衬底台; 投影系统，被配置为将所述图案化的辐射束投影到所述基板的目标部分上; 衬底表面致动器，布置成接合面向投影系统的衬底的表面的一部分;以及位置控制器，其被配置为控制衬底台的位置，位置控制器布置成驱动定位器和衬底表面致动器。