公开(公告)号：US20050139790A1

公开(公告)日：2005-06-30

申请号：US10747617

申请日：2003-12-30

申请人： Martinus Boogaarts ,  Hans Butler ,  Henrikus Cox ,  Martinus Cuijpers ,  Jan Kuit

发明人： Martinus Boogaarts ,  Hans Butler ,  Henrikus Cox ,  Martinus Cuijpers ,  Jan Kuit

IPC分类号： G03F9/00 ,  G01N21/88 ,  G03F7/20 ,  H01L21/027 ,  G01N21/86

CPC分类号： G03F7/70808 ,  G01N21/8851 ,  G03F7/709

摘要： The present invention relates to a lithographic projection apparatus comprising a housing, which comprises therein a first exposure system that has at least one movable part, e.g. a movable first substrate holder, or a movable second substrate holder in a twin stage apparatus. The system is further provided with position disturbance correction system for correcting a position of the first substrate holder with respect to the patterned projection beam due to the influence of gas pressure differences or gas movements, caused by movements of the movable part. The invention also generally relates to a device manufacturing method comprising providing a lithographic projection apparatus according to the invention with a first substrate, and exposing said first substrate, wherein during said exposing of the first substrate a position thereof is corrected by means of position disturbance correction system.

摘要翻译： 本发明涉及一种包括壳体的光刻投影设备，其中包括第一曝光系统，该曝光系统具有至少一个可移动部分，例如， 可移动的第一衬底保持器或可移动的第二衬底保持器。 该系统还设置有位置扰动校正系统，用于由于可移动部件的运动引起的气体压力差或气体运动的影响，校正第一衬底保持器相对于图案化的投影梁的位置。 本发明还通常涉及一种器件制造方法，其包括：提供具有第一衬底的根据本发明的光刻投影设备，并且暴露所述第一衬底，其中在所述第一衬底的暴露期间，其位置通过位置干扰校正被校正 系统。

公开(公告)号：US20070164697A1

公开(公告)日：2007-07-19

申请号：US11331337

申请日：2006-01-13

申请人： Henrikus Cox ,  Hans Butler ,  Sven Hol

发明人： Henrikus Cox ,  Hans Butler ,  Sven Hol

IPC分类号： H02P1/46

CPC分类号： H02P25/06

摘要： A lithographic apparatus includes an illumination system to condition a radiation beam. A patterning support holds a patterning device that imparts the radiation beam with a pattern to form a patterned radiation beam. A substrate support holds a substrate. A projection system projects the patterned radiation beam onto the substrate. A positioning system positions the patterning support and the substrate support. The positioning system has a motor with a stator and a mover coupled to a support, and an associated motor control system with a controller providing an output for controlling currents applied to the motor. The motor control system determines a controller output required to compensate for a weight of mover and associated support, determines a deviation of this output from an output required to compensate the gravity force acting on the mover and associated support, and corrects the currents applied to the motor based on the deviation.

摘要翻译： 光刻设备包括用于调节辐射束的照明系统。 图案形成支撑件保持图案形成装置，其使得辐射束具有图案以形成图案化的辐射束。 衬底支撑件保持衬底。 投影系统将图案化的辐射束投射到衬底上。 定位系统定位图形支撑件和基板支撑件。 定位系统具有带有定子的电动机和耦合到支撑件的动子，以及具有控制器的相关联的电动机控制系统，该控制器提供用于控制施加到电动机的电流的输出。 电动机控制系统确定需要补偿动力和相关支撑的重量的控制器输出，确定该输出与补偿作用在动子和相关支撑上的重力所需的输出的偏差，并校正施加到 电机基于偏差。

公开(公告)号：US20060215131A1

公开(公告)日：2006-09-28

申请号：US11090699

申请日：2005-03-28

申请人： Jan-Gerard Van Der Toorn ,  Hans Butler ,  Henrikus Cox ,  Evert Draaijer ,  Nicolaas Ten Kate ,  Frits Van Der Meulen ,  Mark Johannes Frencken ,  Martijn Houkes ,  Antonius Arends ,  Minne Cuperus

发明人： Jan-Gerard Van Der Toorn ,  Hans Butler ,  Henrikus Cox ,  Evert Draaijer ,  Nicolaas Ten Kate ,  Frits Van Der Meulen ,  Mark Johannes Frencken ,  Martijn Houkes ,  Antonius Arends ,  Minne Cuperus

IPC分类号： G03B27/52

CPC分类号： G03F7/70341

摘要： A lithographic apparatus comprises a substrate table to hold a substrate and a projection system to project a patterned radiation beam onto a target portion of the substrate. The lithographic apparatus further comprises a fluid supply system to supply a fluid between the substrate and a final lens element of the projection system as well as a position controller to control a position of the fluid supply system. The position controller is configured to, being provided with a position quantity of the substrate, determine a desired position of the liquid supply system by adding a position offset to the position quantity of the substrate, and position the liquid supply system according to the desired position. The position quantity may comprise a position and/or rotational position of the substrate table and/or a height function of a substrate height.

摘要翻译： 光刻设备包括用于保持基板的基板台和将图案化的辐射束投影到基板的目标部分上的投影系统。 光刻设备还包括一个流体供应系统，用于在基板和投影系统的最终透镜元件之间提供流体，以及位置控制器，用于控制流体供应系统的位置。 位置控制器被配置为具有基板的位置量，通过向基板的位置量添加位置偏移来确定液体供应系统的期望位置，并且根据期望位置定位液体供应系统 。 位置量可以包括衬底台的位置和/或旋转位置和/或衬底高度的高度函数。

公开(公告)号：US20060139613A1

公开(公告)日：2006-06-29

申请号：US11022950

申请日：2004-12-28

申请人： Martijn Houkes ,  Hans Butler ,  Henrikus Cox

发明人： Martijn Houkes ,  Hans Butler ,  Henrikus Cox

IPC分类号： G03B27/58

CPC分类号： G03F7/70341 ,  G03F7/70725

摘要： A lithographic apparatus includes a first movable element (such as an immersion liquid supply system), which is in operation in contact with a surface of a second movable element (such as a substrate table). Further, the lithographic apparatus includes a second element controller (such as a substrate table controller) to control a position quantity of the second movable element. Disturbance forces caused by, e.g., movements of the first and second movable elements with respect to each other, due to capillary forces disturb a position of the first and second movable elements. To at least partly correct a position of the second movable element due to such disturbance forces, the lithographic apparatus includes a feedforward control path to provide a disturbance force feedforward signal to the second element controller, the feedforward control path including a disturbance force estimator to estimate a disturbance force from a position quantity of the first movable element.

摘要翻译： 光刻设备包括与第二可移动元件（例如基板台）的表面接触的第一可移动元件（例如浸没液体供应系统）。 此外，光刻设备包括用于控制第二可移动元件的位置量的第二元件控制器（诸如基板台控制器）。 由于毛细作用力引起的第一和第二可移动元件相对于彼此的运动引起的干扰力会扰乱第一和第二可移动元件的位置。 为了由于这种干扰力至少部分地校正第二可移动元件的位置，光刻设备包括前馈控制路径以向第二元件控制器提供干扰力前馈信号，前馈控制路径包括扰动力估计器以估计 来自第一可移动元件的位置量的扰动力。

公开(公告)号：US20060049698A1

公开(公告)日：2006-03-09

申请号：US10936712

申请日：2004-09-09

申请人： Koen Maria Zaal ,  Edwin Buis ,  Henrikus Cox ,  Noud Gilissen ,  Harmen Schoot

发明人： Koen Maria Zaal ,  Edwin Buis ,  Henrikus Cox ,  Noud Gilissen ,  Harmen Schoot

IPC分类号： H02K41/00 ,  H02N1/00

CPC分类号： G03F7/70716 ,  G03F7/709

摘要： A substrate or a patterning device used in a lithographic apparatus and a lithographic device manufacturing method are presented. The substrate and patterning device are aligned with respect to a patterning beam and are movably supported by a support. Resonances in said support, however, may render the manufactured device unusable and/ or may render the control system complex. Therefore an actuator assembly frame with flexible coupling devices coupled to the support is provided with a number of actuators configured to move the support in a number of degrees of freedom. Thus, the resonances are damped by the flexible coupling devices resulting in a larger bandwidth for the control system and thus enabling a better position accuracy of the support.

公开(公告)号：US20060119829A1

公开(公告)日：2006-06-08

申请号：US11005480

申请日：2004-12-07

申请人： Henrikus Cox ,  Koen Johannes Maria Zaal

发明人： Henrikus Cox ,  Koen Johannes Maria Zaal

IPC分类号： G03B27/58

CPC分类号： G03F7/70725 ,  G05B2219/45028

摘要： A lithographic apparatus includes an illumination system configured to condition a radiation beam, a patterning device support constructed to support a patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam, a substrate support constructed to hold a substrate, and a projection system configured to project the patterned radiation beam onto a target portion of the substrate. An actuator assembly is configured to move one of the supports with six degrees of freedom comprising x, y, z, rx, ry and rz directions. A controller controls the actuator assembly, and includes at least one compensator which is designed to dynamically decouple a dynamics of the actuator assembly in the degrees of freedom.

摘要翻译： 光刻设备包括被配置为调节辐射束的照明系统，构造成支撑图案形成装置的图案形成装置支撑件，其能够在其横截面中赋予辐射束图案以形成图案化的辐射束，构造的衬底支架 以保持基板和配置成将图案化的辐射束投影到基板的目标部分上的投影系统。 致动器组件被配置为使包括x，y，z，rx，ry和rz方向的六个自由度中的一个支撑件移动。 控制器控制致动器组件，并且包括至少一个补偿器，其被设计成以自由度动态地解耦致动器组件的动力学。

公开(公告)号：US20060087630A1

公开(公告)日：2006-04-27

申请号：US11212921

申请日：2005-08-29

申请人： Nicolaas Kemper ,  Henrikus Cox ,  Sjoerd Donders ,  Roelof Graaf ,  Christiaan Hoogendam ,  Nicolaas Kate ,  Martinus Hendrikus Leenders ,  Jeroen Mertens ,  Frits Meulen ,  Joost Ottens ,  Franciscus Maria Teunissen ,  Jan-Gerard Toorn ,  Martinus Verhagen ,  Marco Polizzi ,  Edwin Augustinus Van Gompel ,  Johannes Smeulers ,  Stefan Belfroid

发明人： Nicolaas Kemper ,  Henrikus Cox ,  Sjoerd Donders ,  Roelof Graaf ,  Christiaan Hoogendam ,  Nicolaas Kate ,  Martinus Hendrikus Leenders ,  Jeroen Mertens ,  Frits Meulen ,  Joost Ottens ,  Franciscus Maria Teunissen ,  Jan-Gerard Toorn ,  Martinus Verhagen ,  Marco Polizzi ,  Edwin Augustinus Van Gompel ,  Johannes Smeulers ,  Stefan Belfroid

IPC分类号： G03B27/52

CPC分类号： G03F7/70883 ,  G03F7/70341 ,  G03F7/70858 ,  G03F7/70866 ,  G03F7/7095

摘要： A porous member is used in a liquid removal system of an immersion lithographic projection apparatus to smooth uneven flows. A pressure differential across the porous member may be maintained at below the bubble point of the porous member so that a single-phase liquid flow is obtained. Alternatively, the porous member may be used to reduce unevenness in a two-phase flow.

公开(公告)号：US20060082753A1

公开(公告)日：2006-04-20

申请号：US10967306

申请日：2004-10-19

申请人： Henrikus Cox ,  Sven Hol ,  Hernes Jacobs

发明人： Henrikus Cox ,  Sven Hol ,  Hernes Jacobs

IPC分类号： G03B27/58

CPC分类号： G03F7/70758

摘要： An actuator assembly includes a coil moveably positionable in a magnetic field generated by a magnet assembly, each of the coil and the magnet having substantially only one side facing the other. A magnetized field-shaping element is provided for shaping the magnetic field such that the magnetic field is substantially perpendicular to the direction of the electrical current for generating a force in a first degree of freedom. Thus, the coil may easily be mounted, since it does not need to be enclosed by magnet poles.

摘要翻译： 致动器组件包括能够由磁体组件产生的磁场中的可移动地定位的线圈，线圈和磁体中的每一个基本上只有一个面朝向另一侧。 提供磁化场成形元件用于使磁场成形，使得磁场基本上垂直于用于产生第一自由度的电流的方向。 因此，线圈可以容易地安装，因为它不需要被磁极包围。

公开(公告)号：US20050128460A1

公开(公告)日：2005-06-16

申请号：US10735846

申请日：2003-12-16

申请人： Petrus Marinus Van Den Biggelaar ,  Henrikus Cox ,  Yin Tso ,  Sjoerd Donders ,  Theodorus Knoops

发明人： Petrus Marinus Van Den Biggelaar ,  Henrikus Cox ,  Yin Tso ,  Sjoerd Donders ,  Theodorus Knoops

IPC分类号： G03F7/20 ,  H01L21/027 ,  G03B27/58

CPC分类号： G03F7/70508 ,  G03F7/70725

摘要： In a lithographic projection apparatus and a device manufacturing method, a movable part is controlled to produce a motion, an absolute value of at least one of a fourth and a higher derivative to time of the position of the motion being limited to less than a maximal value. Specifying at least one of a fourth and a higher derivative to time of the position may help to improve settling behavior to obtain more accurate positioning. Further, a movable part may be controlled to produce an acceleration of the movable part having a high at least one of a third and a higher derivative to time of the position of the motion at a start portion of the acceleration and a corresponding low at least one of a third and a higher derivative to time of the position of the motion at an end portion of the acceleration, the absolute value of the high at least one of the third and the higher derivative to time of the position of the motion being larger than the absolute value of the corresponding low at least one of the third and the higher derivative to time of the position of the motion.

摘要翻译： 在光刻投影装置和装置制造方法中，可动部被控制以产生运动，将运动位置的第四和更高的导数与时间中的至少一个的绝对值限制为小于最大值 值。 指定位置的时间的第四和更高的派生中的至少一个有助于改善沉降行为以获得更准确的定位。 此外，可以控制可移动部分，以产生具有高于加速度起始部分处的运动位置的第三和更高导数的至少一个的可移动部分的加速度，并且至少一个对应的低 对加速度的端部处的运动位置的时间的三分之一或更高的导数之一，运动位置的第三和更高的导数与时间的高度的绝对值较大 比相应的低的运动的位置的时间的第三和更高的导数中的至少一个的绝对值。

公开(公告)号：US20050083496A1

公开(公告)日：2005-04-21

申请号：US10925148

申请日：2004-08-25

申请人： Michel Dansberg ,  Sebastiaan Cornelissen ,  Henrikus Cox ,  Robert Van Diesen ,  Nicolaas Kemper ,  Robert-Han Munnig-Schmidt ,  Harmen Van Der Schoot ,  Rob Jansen

发明人： Michel Dansberg ,  Sebastiaan Cornelissen ,  Henrikus Cox ,  Robert Van Diesen ,  Nicolaas Kemper ,  Robert-Han Munnig-Schmidt ,  Harmen Van Der Schoot ,  Rob Jansen

IPC分类号： G03F7/20 ,  H01L21/027 ,  G03B27/52

CPC分类号： G03F7/70933 ,  G03F7/70716 ,  G03F7/70775 ,  G03F7/7095

摘要： A lithographic projection apparatus is disclosed. The apparatus includes a radiation system for providing a beam of radiation, a first support structure for supporting a patterning device, a second support structure for supporting a substrate, and a projection system. At least one of the first and second support structures includes a planar base, a movable stage that can be moved over the planar base, and an actuator for moving the stage. The apparatus also includes a contactless position measuring device for measuring a position of the stage, and a first pump for generating a conditioned gas flow in a volume between the measuring device and the stage. The base includes a plurality of gas channels that provide a path for the conditioned gas to flow through the base.

摘要翻译： 公开了一种光刻投影装置。 该装置包括用于提供辐射束的辐射系统，用于支撑图案形成装置的第一支撑结构，用于支撑衬底的第二支撑结构和投影系统。 第一和第二支撑结构中的至少一个包括平面基座，可在平面基座上移动的可移动平台以及用于移动平台的致动器。 该装置还包括用于测量载物台的位置的非接触位置测量装置和用于在测量装置和载物台之间产生体积的调节气流的第一泵。 底座包括多个气体通道，其提供用于经调节的气体流过基座的路径。