METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE
    1.
    发明申请
    METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE 审中-公开
    制造半导体器件的方法

    公开(公告)号:US20100323505A1

    公开(公告)日:2010-12-23

    申请号:US12818005

    申请日:2010-06-17

    IPC分类号: H01L21/28

    摘要: In one embodiment, a method is disclosed for manufacturing a semiconductor device. The method can include forming a resist on a subject layer containing silicon. The method can etch the subject layer using the resist as a mask and with a gas containing a halogen element, which is introduced into a processing chamber. After the etching of the subject layer, the method can slim a planner size of the resist with oxygen gas and a gas containing a halogen element, which are introduced into the same processing chamber.

    摘要翻译: 在一个实施例中,公开了一种用于制造半导体器件的方法。 该方法可以包括在包含硅的对象层上形成抗蚀剂。 该方法可以使用抗蚀剂作为掩模和包含被引入处理室中的含有卤素元素的气体来蚀刻被摄体层。 在对被摄体层进行蚀刻之后,该方法可以用氧气和包含被引入同一处理室的卤素元素的气体来减小光刻胶的尺寸。

    Method for automatically processing silver halide photographic
light-sensitive materials using solid processing agent and circulating
processing solution between a processing portion and a solid processing
agent receiving portion
    2.
    发明授权
    Method for automatically processing silver halide photographic light-sensitive materials using solid processing agent and circulating processing solution between a processing portion and a solid processing agent receiving portion 失效
    使用固体处理剂和处理部分和固体处理剂接收部分之间的循环处理溶液自动处理卤化银照相感光材料的方法

    公开(公告)号:US5460926A

    公开(公告)日:1995-10-24

    申请号:US274312

    申请日:1994-07-13

    摘要: A method for developing light-sensitive silver halide photographic materials, in a compact automatic developing machine, comprising transporting the light-sensitive silver halide photographic materials to a processing tank which contains a processing solution for processing an exposed light-sensitive silver halide photographic material. The processing tank includes a processing portion, and a receiving portion for receiving a solid processing agent. A solid processing agent is supplied to the receiving portion of the processing tank based on information on the amount of processing of the light-sensitive silver halide photographic materials. The solid processing agent is preferably in the form of tablets which contain all components necessary to process the light-sensitive silver halide photographic material. The processing solution is circulated between the processing portion and the receiving portion at a flow rate of not less than 0.5 times the processing tank volume per minute.

    摘要翻译: 一种用于在紧凑型自动显影机中显影感光卤化银照相材料的方法,包括将感光卤化银照相材料输送到包含处理曝光的感光卤化银照相材料的处理溶液的处理槽中。 处理罐包括处理部分和用于接收固体处理剂的接收部分。 基于关于感光卤化银照相材料的处理量的信息,将固体处理剂提供给处理槽的接收部分。 固体处理剂优选为含有处理感光卤化银照相材料所需的所有组分的片剂形式。 处理液以不小于每分钟处理槽体积的0.5倍的流量在处理部分和接收部分之间循环。

    Sliding plate for securing camera
    3.
    发明授权
    Sliding plate for securing camera 失效
    用于固定相机的滑板

    公开(公告)号:US5429332A

    公开(公告)日:1995-07-04

    申请号:US133287

    申请日:1993-10-08

    申请人: Masao Ishikawa

    发明人: Masao Ishikawa

    IPC分类号: F16M11/04 F16M11/12 G03B17/56

    摘要: A sliding plate for securing a camera to a camera stand having a tapered surface at both inner sides, a sliding plate having a tapered surface at both outer sides thereof and being mounted on and released from the camera stand and being slidable along the tapered surface of the camera stand and a set spring having a spring at a bottom thereof, the set spring having at a portion adjacent to at least one of the tapered surfaces of the camera stand and being lifted by the elastic force of the spring to linearly sink and float the set spring along the tapered surface of the camera stand.

    摘要翻译: 一种用于将相机固定到在两个内侧具有锥形表面的相机支架的滑板,具有在其两侧的锥形表面的滑动板,并且安装在相机支架上并从相机支架上释放,并且可沿着锥形表面滑动 相机支架和在其底部具有弹簧的固定弹簧,该固定弹簧具有与相机支架的至少一个锥形表面相邻的部分并且被弹簧的弹力提升以线性下沉和浮动 固定弹簧沿相机支架的锥形表面。

    Method for processing light-sensitive silver halide color photogrpahic
material
    4.
    发明授权
    Method for processing light-sensitive silver halide color photogrpahic material 失效
    感光卤化银彩色光电材料的处理方法

    公开(公告)号:US4983503A

    公开(公告)日:1991-01-08

    申请号:US488473

    申请日:1990-02-26

    CPC分类号: G03C7/42 G03C7/3225

    摘要: There are disclosed a method for processing a light-sensitive silver halide color photographic material by subjecting a light-sensitive silver halide color photographic material after color developing to bleach-fixing processing, characterized in that the light-sensitive silver halide color photographic material contains at least one cyan coupler represented by the formula (A), (B) or (C) as specified in the specification, or contains at least one magenta coupler represented by the formula (M-1), the bleach-fixing processing step is a step which is a counter-current system uses two or more tanks of continuous bleach-fixing tanks, and the silver concentration in the bleach-fixing solution in a final tank of the bleach-fixing tanks is maintained at 80% or lower of the silver concentration in a bleach-fixing solution in a first tank, and a method for processing a light-sensitive silver halide color photographic material by subjecting a light-sensitive silver halide color photographic material after color developing to bleach-fixing processing and then to stabilizing processing substituted for water washing, characterized in that the light-sensitive silver halide color photographic material has at least one light-sensitive emulsion layer containing a silver halide emulsion containing 0.5 mole % or more of silver iodide, the bleach-fixing processing step is a step which is a counter-current system by use of an organic acid metal complex as the oxidizing agent and uses two or more tanks of continuous bleach-fixing tanks, and the silver concentration in a final tank of the bleach-fixing tanks is maintained at 80% or lower of the silver concentration in the bleach-fixing solution in a first tank.

    摘要翻译: 公开了一种通过在彩色显影之后对感光卤化银彩色照相材料进行漂白定影处理来处理感光卤化银彩色照相材料的方法,其特征在于,感光卤化银彩色照相材料含有 至少一种由说明书中规定的式(A),(B)或(C)表示的青色成色剂,或含有至少一种由式(M-1)表示的品红成色剂,漂白剂固定处理步骤为 使用两个或更多个连续漂白固定槽的逆流系统的步骤,并且漂白定影罐的最终罐中漂白剂固定液中的银浓度保持在银浓度的80%以下 在第一罐中的漂白固定溶液中,以及通过使感光卤化银彩色照相纸经受感光卤化银彩色照相材料的处理方法 在漂白定影处理彩色显影之后,然后进行代替水洗的稳定处理,其特征在于感光卤化银彩色照相材料具有至少一个含有0.5摩尔%或更少的卤化银乳剂的感光乳剂层, 更多的碘化银,漂白定影处理步骤是通过使用有机酸金属络合物作为氧化剂的逆流系统并使用两个或更多个连续漂白固定槽, 漂白剂固定槽的最终罐保持在第一罐中漂白剂固定液中银浓度的80%以下。

    Method for processing a light-sensitive silver halide color photographic
material using at least one silver halide emulsion layer and at least
one of a cyan coupler and magneta coupler
    6.
    发明授权
    Method for processing a light-sensitive silver halide color photographic material using at least one silver halide emulsion layer and at least one of a cyan coupler and magneta coupler 失效
    使用至少一个卤化银乳剂层和青色成色剂和磁性耦合器中的至少一种来处理感光卤化银彩色照相材料的方法

    公开(公告)号:US4837139A

    公开(公告)日:1989-06-06

    申请号:US77336

    申请日:1987-07-24

    IPC分类号: G03C7/407

    CPC分类号: G03C7/407

    摘要: There are disclosed a processing solution of a light-sensitive silver halide color photographic material, which comprises containing a compound represented by the formula (I) shown below, and a processing method of the same, which comprises subjecting a light-sensitive silver halide color photographic material having at least one layer of silver halide emulsion layer on a support to imagewise exposure and then applying processing including at least a color developing processing, characterized in that the color developing solution to be used in the color developing processing contains a compound represented by the formula (I) shown below: ##STR1## wherein R.sub.1 represents an alkyl group having 1 to 5 carbon atoms substituted with an alkoxy group, and R.sub.2 represents a hydrogen atom, an alkyl group having 1 to 5 carbon atoms or an alkyl group having 1 to 5 carbon atoms substituted with an alkoxy group, and R.sub.1 and R.sub.2 may be bonded with each other to form a ring containing an oxygen atom.

    摘要翻译: 公开了一种感光卤化银彩色照相材料的处理溶液,其包含含有下述式(I)表示的化合物及其加工方法,其包括使感光卤化银颜色 在成像曝光的支持体上具有至少一层卤化银乳剂层的照相材料,然后施加包括至少彩色显影处理的处理,其特征在于,用于彩色显影处理中的显色溶液含有由 下式(I):其中R 1表示碳原子数1〜5的烷基,被烷氧基取代,R 2表示氢原子,碳原子数为1〜5的烷基或 被烷氧基取代的具有1至5个碳原子的烷基,并且R 1和R 2可以彼此键合以形成含有氧原子的环。

    Indicator gauge with illuminated pointer
    9.
    发明授权
    Indicator gauge with illuminated pointer 失效
    带指示灯的指示器

    公开(公告)号:US4218726A

    公开(公告)日:1980-08-19

    申请号:US957761

    申请日:1978-11-06

    CPC分类号: G01D13/22 G01D11/28

    摘要: A first light reflecting surface is formed at either the back side of a hub section of a transparent pointer or an hole formed in a transparent dial board and a second light reflecting surface is formed on a front side of the hub section of the pointer. Light rays transmitting entirely within the dial board in a direction parallel to the longer dimensions of the dial board are reflected toward the second light reflecting surface by the first light reflecting surface and then reflected toward the pointing section of the pointer by the second light reflecting surface to illuminate the pointer.

    摘要翻译: 第一光反射表面形成在透明指针的轮毂部分的后侧或形成在透明拨盘中的孔中,并且第二光反射表面形成在指针的毂部的前侧。 沿着与指盘的较长尺寸平行的方向在整个拨盘内传输的光线被第一光反射表面反射到第二光反射表面,然后通过第二光反射表面朝向指示器的指示部分反射 照亮指针。

    METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE
    10.
    发明申请
    METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE 有权
    制造半导体器件的方法

    公开(公告)号:US20100197129A1

    公开(公告)日:2010-08-05

    申请号:US12630592

    申请日:2009-12-03

    申请人: Masao ISHIKAWA

    发明人: Masao ISHIKAWA

    IPC分类号: H01L21/28

    摘要: A method for manufacturing a semiconductor device includes: forming a stacked body of a dielectric layer including a silicon oxide and a conductive layer including silicon above a substrate; and forming a hole penetrating through the dielectric layer and the conductive layer in the stacked body, the forming the hole including: forming a first mask layer including a silicon oxide above the stacked body; etching the conductive layer while using the first mask layer as a mask; and forming a second mask layer having more silicon content than the dielectric layer above the first mask layer to etch the dielectric layer while using the second mask layer as a mask.

    摘要翻译: 一种制造半导体器件的方法包括:在衬底上形成包括氧化硅和包括硅的导电层的电介质层的堆叠体; 以及形成穿过所述层叠体中的所述电介质层和所述导电层的孔,所述形成所述孔包括:在所述层叠体的上方形成包含氧化硅的第一掩模层; 在使用第一掩模层作为掩模的同时蚀刻导电层; 以及在使用第二掩模层作为掩模的同时形成具有比第一掩模层上方的电介质层更多的硅含量的第二掩模层,以蚀刻电介质层。