PROCESS FOR THE ELECTROLESS COPPER PLATING OF METALLIC SUBSTRATES
    1.
    发明申请
    PROCESS FOR THE ELECTROLESS COPPER PLATING OF METALLIC SUBSTRATES 审中-公开
    金属基板电镀铜工艺

    公开(公告)号:US20130143071A1

    公开(公告)日:2013-06-06

    申请号:US13817309

    申请日:2011-08-10

    申请人: Michael Kleinle

    发明人: Michael Kleinle

    IPC分类号: C23C18/16 C23C28/02

    摘要: The invention relates to a process for treating a metallic surface of an object with an aqueous copper-plating solution, with which a first copper-plating solution, which is free of cyanide and free of strong reducing agent, is electrolessly applied to clean metallic surfaces of the object, or after pretreatment to cleaned metallic surfaces, to form a first copper layer or copper alloy layer as a barrier layer and/or as a conductive layer, and also to the use of the objects produced by the process according to the invention.

    摘要翻译: 本发明涉及一种用镀铜水溶液处理物体的金属表面的方法,其中无电镀无氰氰化物并且不含强还原剂的第一镀铜溶液,以清洁金属表面 或者在对清洁的金属表面进行预处理之后,形成作为阻挡层和/或作为导电层的第一铜层或铜合金层,以及使用根据本发明的方法生产的物体 。