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公开(公告)号：US20090244712A2
公开(公告)日：2009-10-01
申请号：US12097937
申请日：2008-08-18
IPC分类号： G02B27/09
CPC分类号： G02B27/0927 , B23K26/032 , B23K26/064 , B23K26/0652 , G02B27/0972 , G02B27/0977
摘要： An optical system for shaping an incoming beam having a divergence with an angular distribution at least in a first direction comprises at least one angle selective optical element (26,28) for clipping the angular distribution in the at least first direction. The approach according to the present invention bases on using an angle-selective device (25,32) operated by the principle of total internal reflection to reduce divergence of the incoming beam, in contrast to a spatially-selective device as for example a field-stop or slit. The method according to the present invention has the advantage that no physical sharp edges have to be exposed at high energy densities. Thus, thermal impact and demands on the optical elements to withstand a high power laser beam are significantly reduced.
摘要翻译： 用于使具有至少在第一方向上具有角度分布的发散的进入光束成形的光学系统包括用于限制至少第一方向上的角度分布的至少一个角度选择光学元件（26,28）。 根据本发明的方法基于使用由全内反射原理操作的角度选择装置（25,32），以减少入射光束的发散，与空间选择装置相反，例如场 - 停止或切开 根据本发明的方法的优点在于，不能以高的能量密度暴露出物理的锋利边缘。 因此，热冲击和对承受高功率激光束的光学元件的要求显着降低。
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公开(公告)号：US20090002833A1
公开(公告)日：2009-01-01
申请号：US12097937
申请日：2006-12-20
IPC分类号： G02B27/09
CPC分类号： G02B27/0927 , B23K26/032 , B23K26/064 , B23K26/0652 , G02B27/0972 , G02B27/0977
摘要： An optical system for shaping an incoming beam having a divergence with an angular distribution at least in a first direction comprises at least one angle selective optical element for clipping the angular distribution in the at least first direction. The approach according to the present invention bases on using an angle-selective device operated by the principle of total internal reflection to reduce divergence of the incoming beam, in contrast to a spatially-selective device as for example a field-stop or slit. The method according to the present invention has the advantage that no physical sharp edges have to be exposed at high energy densities. Thus, thermal impact and demands on the optical elements to withstand a high power laser beam are significantly reduced.
摘要翻译： 用于使具有至少在第一方向上具有角度分布的发散的入射光束成形的光学系统包括用于限制至少第一方向上的角分布的至少一个角度选择光学元件。 根据本发明的方法基于使用通过全内反射原理操作的角度选择装置，以减少入射光束的发散，与空间选择装置（例如场停止或狭缝）相反。 根据本发明的方法的优点在于，不能以高的能量密度暴露出物理的锋利边缘。 因此，热冲击和对承受高功率激光束的光学元件的要求显着降低。
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公开(公告)号：US20080272275A1
公开(公告)日：2008-11-06
申请号：US11418872
申请日：2006-05-05
IPC分类号： G01J1/32
CPC分类号： G02B27/0988 , G02B1/115 , G02B5/22 , G02B13/08 , G02B27/0966 , G03F7/70591 , G03F7/70958 , G03F7/70975
摘要： The disclosure relates to a light beam intensity non-uniformity correction device that includes an optical element having a light entrance face with an antireflective property. According to the invention the antireflective property is locally amended in order to enhance light beam intensity uniformity. The disclosure further relates to a method for amending intensity distribution of a light beam in an optical system having one or more optical elements, where the method includes: a) assembling the optical system with the one or more optical elements arranged in predetermined positions, b) measuring intensity distribution, c) calculating locally required increase or decrease in absorption and/or reflection of one of the optical elements to amend measured intensity distribution into a predetermined intensity distribution, d) removing the optical element from the optical system, e) locally amending absorption and/or reflection of the one of the optical elements according to the calculation, f) installing the optical element in the predetermined position in the optical system.
摘要翻译： 本发明涉及一种光束强度不均匀性校正装置，其包括具有防反射性的光入射面的光学元件。 根据本发明，为了增强光束强度的均匀性，局部地修改了防反射特性。 本发明还涉及一种用于修正具有一个或多个光学元件的光学系统中的光束的强度分布的方法，其中所述方法包括：a）将光学系统与布置在预定位置的一个或多个光学元件组合，b ）测量强度分布，c）计算局部所需的光学元件之一的吸收和/或反射的增加或减少以将测量的强度分布修改为预定的强度分布，d）从光学系统中去除光学元件，e）局部地 根据计算修正光学元件之一的吸收和/或反射，f）将光学元件安装在光学系统中的预定位置。
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4.发明授权Method for measuring a spectrum of a narrowband light source, and spectrometer arrangement 有权用于测量窄带光源的光谱的方法和光谱仪布置公开(公告)号：US08289520B2
公开(公告)日：2012-10-16
申请号：US12558874
申请日：2009-09-14
IPC分类号： G01J3/45
摘要： A spectrometer arrangement for measuring a spectrum of a light beam emitted by a narrowband light source, such as a bandwidth-narrowed laser, includes at least one etalon, a beam splitter for splitting the light beam into a first partial beam and a second partial beam, one or more optical directing elements for directing the first partial beam n times and the second partial beam (n+k) times through the at least one etalon, wherein n and k are integers ≧1. The spectrometer arrangement further has at least one light-sensitive detector and an evaluation device for evaluating the spectra—recorded by the at least one detector—of the first partial beam that has passed through the at least one etalon n times and of the second partial beam that has passed through the at least one etalon (n+k) times in order to determine the light spectrum corrected for the apparatus function of the at least one etalon.
摘要翻译： 用于测量由窄带光源（例如带宽变窄的激光器）发射的光束的光谱的光谱仪装置包括至少一个标准具，用于将光束分成第一部分光束的分束器和第二部分光束 一个或多个用于通过至少一个标准具指导第一部分光束n次和第二部分光束（n + k）的光学引导元件，其中n和k是整数≥1。 光谱仪布置还具有至少一个光敏检测器和评估装置，用于评估已经通过至少一个标准具的第一部分光束的至少一个检测器记录的光谱n次和第二部分光束 已经通过至少一个标准具（n + k）次的光束，以便确定校正了至少一个标准具的装置功能的光谱。
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公开(公告)号：US07629572B2
公开(公告)日：2009-12-08
申请号：US11418872
申请日：2006-05-05
CPC分类号： G02B27/0988 , G02B1/115 , G02B5/22 , G02B13/08 , G02B27/0966 , G03F7/70591 , G03F7/70958 , G03F7/70975
摘要： The disclosure relates to a light beam intensity non-uniformity correction device that includes an optical element having a light entrance face with an antireflective property. According to the invention the antireflective property is locally amended in order to enhance light beam intensity uniformity. The disclosure further relates to a method for amending intensity distribution of a light beam in an optical system having one or more optical elements, where the method includes: a) assembling the optical system with the one or more optical elements arranged in predetermined positions, b) measuring intensity distribution, c) calculating locally required increase or decrease in absorption and/or reflection of one of the optical elements to amend measured intensity distribution into a predetermined intensity distribution, d) removing the optical element from the optical system, e) locally amending absorption and/or reflection of the one of the optical elements according to the calculation, f) installing the optical element in the predetermined position in the optical system.
摘要翻译： 本发明涉及一种光束强度不均匀性校正装置，其包括具有防反射性的光入射面的光学元件。 根据本发明，为了增强光束强度的均匀性，局部地修改了防反射特性。 本发明还涉及一种用于修正具有一个或多个光学元件的光学系统中的光束的强度分布的方法，其中所述方法包括：a）将光学系统与布置在预定位置的一个或多个光学元件组合，b ）测量强度分布，c）计算局部所需的光学元件之一的吸收和/或反射的增加或减少以将测量的强度分布修改为预定的强度分布，d）从光学系统中去除光学元件，e）局部地 根据计算修正光学元件之一的吸收和/或反射，f）将光学元件安装在光学系统中的预定位置。
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公开(公告)号：US08342701B2
公开(公告)日：2013-01-01
申请号：US12851187
申请日：2010-08-05
申请人： Holger Kierey , Michel Le Maire , Willi Anderl , Hubert Holderer , Anton Lengel
发明人： Holger Kierey , Michel Le Maire , Willi Anderl , Hubert Holderer , Anton Lengel
IPC分类号： G02B5/08
CPC分类号： G02B5/0891 , G02B7/181 , G02B7/1815
摘要： A reflective optical element for use in an EUV system is disclosed. The reflective optical element includes a base body, which is produced at least partly from a substrate material. At least one cooling channel through which a cooling medium can flow is arranged in the base body. A material having a thermal conductivity of greater than 50 W/mK is provided as substrate material. The reflective optical element also includes a polishing layer, which is applied on the substrate material. The polishing layer includes an amorphous material which can be processed via polishing.
摘要翻译： 公开了一种用于EUV系统的反射光学元件。 反射型光学元件包括至少部分地由基底材料制成的基体。 冷却介质可以流过的至少一个冷却通道布置在基体中。 提供具有大于50W / mK的热导率的材料作为基材。 反射光学元件还包括施加在基板材料上的抛光层。 抛光层包括可通过研磨加工的非晶材料。
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公开(公告)号：US07944615B2
公开(公告)日：2011-05-17
申请号：US12097937
申请日：2006-12-20
IPC分类号： G02B27/14
CPC分类号： G02B27/0927 , B23K26/032 , B23K26/064 , B23K26/0652 , G02B27/0972 , G02B27/0977
摘要： An optical system for shaping an incoming beam having a divergence with an angular distribution at least in a first direction comprises at least one angle selective optical element for clipping the angular distribution in the at least first direction. The approach according to the present invention bases on using an angle-selective device operated by the principle of total internal reflection to reduce divergence of the incoming beam, in contrast to a spatially-selective device as for example a field-stop or slit. The method according to the present invention has the advantage that no physical sharp edges have to be exposed at high energy densities. Thus, thermal impact and demands on the optical elements to withstand a high power laser beam are significantly reduced.
摘要翻译： 用于使具有至少在第一方向上具有角度分布的发散的入射光束成形的光学系统包括用于限制至少第一方向上的角分布的至少一个角度选择光学元件。 根据本发明的方法基于使用通过全内反射原理操作的角度选择装置，以减少入射光束的发散，与空间选择装置（例如场停止或狭缝）相反。 根据本发明的方法的优点在于，不能以高的能量密度暴露出物理的锋利边缘。 因此，热冲击和对承受高功率激光束的光学元件的要求显着降低。
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公开(公告)号：US20110051267A1
公开(公告)日：2011-03-03
申请号：US12851187
申请日：2010-08-05
申请人： Holger Kierey , Michel Le Maire , Willi Anderl , Hubert Holderer , Anton Lengel
发明人： Holger Kierey , Michel Le Maire , Willi Anderl , Hubert Holderer , Anton Lengel
IPC分类号： G02B5/08
CPC分类号： G02B5/0891 , G02B7/181 , G02B7/1815
摘要： A reflective optical element (10) for use in an EUV system is disclosed. The reflective optical element includes a base body, which is produced at least partly from a substrate material. At least one cooling channel through which a cooling medium can flow is arranged in the base body. A material having a thermal conductivity of greater than 50 W/mK is provided as substrate material. The reflective optical element also includes a polishing layer, which is applied on the substrate material. The polishing layer includes an amorphous material which can be processed via polishing.
摘要翻译： 公开了一种用于EUV系统的反射光学元件（10）。 反射型光学元件包括至少部分地由基底材料制成的基体。 冷却介质可以流过的至少一个冷却通道布置在基体中。 提供具有大于50W / mK的热导率的材料作为基材。 反射光学元件还包括施加在基板材料上的抛光层。 抛光层包括可通过研磨加工的非晶材料。
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9.发明申请METHOD FOR MEASURING A SPECTRUM OF A NARROWBAND LIGHT SOURCE, AND SPECTROMETER ARRANGEMENT 有权用于测量窄带光源的光谱的方法和光谱仪布置公开(公告)号：US20100079765A1
公开(公告)日：2010-04-01
申请号：US12558874
申请日：2009-09-14
IPC分类号： G01J3/45
摘要： A spectrometer arrangement for measuring a spectrum of a light beam emitted by a narrowband light source, such as a bandwidth-narrowed laser, includes at least one etalon, a beam splitter for splitting the light beam into a first partial beam and a second partial beam, one or more optical directing elements for directing the first partial beam n times and the second partial beam (n+k) times through the at least one etalon, wherein n and k are integers ≧1. The spectrometer arrangement further has at least one light-sensitive detector and an evaluation device for evaluating the spectra—recorded by the at least one detector—of the first partial beam that has passed through the at least one etalon n times and of the second partial beam that has passed through the at least one etalon (n+k) times in order to determine the light spectrum corrected for the apparatus function of the at least one etalon.
摘要翻译： 用于测量由窄带光源（例如带宽变窄的激光器）发射的光束的光谱的光谱仪装置包括至少一个标准具，用于将光束分成第一部分光束的分束器和第二部分光束 一个或多个用于通过至少一个标准具指导第一部分光束n次和第二部分光束（n + k）的光学引导元件，其中n和k是整数≥1。 光谱仪布置还具有至少一个光敏检测器和评估装置，用于评估已经通过至少一个标准具的第一部分光束的至少一个检测器记录的光谱n次和第二部分光束 已经通过至少一个标准具（n + k）次的光束，以便确定校正了至少一个标准具的装置功能的光谱。
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