公开(公告)号：US20110269309A1

公开(公告)日：2011-11-03

申请号：US12981304

申请日：2010-12-29

Applicant: Pil-Soon HONG ,  Gwui-Hyun PARK ,  Jin-Ho JU ,  Jean-Ho SONG ,  Sang-Tae KIM ,  Seong-Hyeon KIM ,  Won-Young CHANG ,  Jong-Heum YOON ,  Eun-Sang LEE ,  Min-Ju IM

Inventor： Pil-Soon HONG ,  Gwui-Hyun PARK ,  Jin-Ho JU ,  Jean-Ho SONG ,  Sang-Tae KIM ,  Seong-Hyeon KIM ,  Won-Young CHANG ,  Jong-Heum YOON ,  Eun-Sang LEE ,  Min-Ju IM

IPC: H01L21/3213 ,  G03F7/20 ,  G03F7/004

CPC classification number: H01L27/1288 ,  G03F7/0226 ,  G03F7/0236 ,  G03F7/085 ,  G03F7/40 ,  H01L21/32139 ,  H01L27/1214

Abstract: Provided are a photoresist composition having superior adhesion to an etch target film, a method of forming a pattern by using the photoresist composition, and a method of manufacturing a thin-film transistor (TFT) substrate. The photoresist composition includes an alkali-soluble resin; a photosensitive compound; a solvent; and 0.01 to 0.1 parts by weight of a compound represented by Formula 1: wherein R is one of hydrogen, an alkyl having 1 to 10 carbon atoms, a cycloalkyl having 4 to 8 carbon atoms, and a phenyl group.

Abstract translation: 提供了具有优异的与蚀刻目标膜的粘附性的光致抗蚀剂组合物，通过使用光致抗蚀剂组合物形成图案的方法，以及制造薄膜晶体管（TFT）基板的方法。 光致抗蚀剂组合物包括碱溶性树脂; 光敏化合物; 溶剂; 和0.01〜0.1重量份的由式1表示的化合物：其中R是氢，具有1至10个碳原子的烷基，具有4至8个碳原子的环烷基和苯基之一。