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公开(公告)号:US20130205651A1
公开(公告)日:2013-08-15
申请号:US13807208
申请日:2011-07-22
申请人: Neil Wang , Liang Chen , Peter Loezos
发明人: Neil Wang , Liang Chen , Peter Loezos
CPC分类号: C10G11/00 , C10B49/22 , C10B53/02 , C10C5/00 , C10G1/02 , C10G11/18 , C10G2300/1011 , C10G2300/202 , C10L1/02 , Y02E50/14 , Y02P30/20
摘要: A multi-stage process and system for converting solid particulate biomass in a riser reactor having at least two different reaction zones. A lower reaction zone is configured to optimize pyrolysis of the biomass into pyrolysis products, while an upper reaction zone is configured to efficiently crack the pyrolysis products. The relative residence times and/or temperatures of the upper and lower reaction zones can be controlled to optimize product quality and yield.
摘要翻译: 用于在具有至少两个不同反应区的提升管反应器中转化固体颗粒生物质的多阶段方法和系统。 较低的反应区构造成使生物质的热解最优化为热解产物,而上部反应区构造成有效地裂解热解产物。 可以控制上下反应区的相对停留时间和/或温度,以优化产品质量和产率。
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公开(公告)号:US08830486B2
公开(公告)日:2014-09-09
申请号:US13536410
申请日:2012-06-28
申请人: Hidong Kwak , Ward Dixon , Torsten Kaack , Ning-Yi Neil Wang , Jagjit Sandhu
发明人: Hidong Kwak , Ward Dixon , Torsten Kaack , Ning-Yi Neil Wang , Jagjit Sandhu
CPC分类号: G01N21/55 , B08B5/02 , G01B11/06 , G01B11/0641 , G01B2210/56 , G01N21/21 , H01L21/67017 , H01L22/12 , H01L2924/0002 , H01L2924/00
摘要: A local purging tool for purging a portion of a surface of a wafer with purging gas is disclosed. The purging tool includes a purging chamber configured to contain purging gas within a cavity of the purging chamber, a permeable portion of a surface of the purging chamber configured to diffuse purging gas from the cavity of the chamber to a portion of a surface of a wafer, and an aperture configured to transmit illumination received from an illumination source to a measurement location of the portion of the surface of the wafer and further configured to transmit illumination reflected from the measurement location to a detector.
摘要翻译: 公开了一种用清洗气体清洗晶片表面的一部分的局部清洗工具。 清洗工具包括净化室,其构造成在清洗室的空腔内容纳清洗气体,清洗室的表面的可渗透部分构造成将清洗气体从腔的腔扩散到晶片表面的一部分 以及被配置为将从照明源接收的照明传送到晶片表面的该部分的测量位置并且还被配置为将从测量位置反射的照射传输到检测器的孔。
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公开(公告)号:US09394487B2
公开(公告)日:2016-07-19
申请号:US13807208
申请日:2011-07-22
申请人: Neil Wang , Liang Chen , Peter Loezos
发明人: Neil Wang , Liang Chen , Peter Loezos
CPC分类号: C10G11/00 , C10B49/22 , C10B53/02 , C10C5/00 , C10G1/02 , C10G11/18 , C10G2300/1011 , C10G2300/202 , C10L1/02 , Y02E50/14 , Y02P30/20
摘要: A multi-stage process and system for converting solid particulate biomass in a riser reactor having at least two different reaction zones. A lower reaction zone is configured to optimize pyrolysis of the biomass into pyrolysis products, while an upper reaction zone is configured to efficiently crack the pyrolysis products. The relative residence times and/or temperatures of the upper and lower reaction zones can be controlled to optimize product quality and yield.
摘要翻译: 用于在具有至少两个不同反应区的提升管反应器中转化固体颗粒生物质的多阶段方法和系统。 较低的反应区构造成使生物质的热解最优化为热解产物,而上部反应区构造成有效地裂解热解产物。 可以控制上下反应区的相对停留时间和/或温度,以优化产品质量和产率。
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公开(公告)号:US20130010311A1
公开(公告)日:2013-01-10
申请号:US13536410
申请日:2012-06-28
申请人: Hidong Kwak , Ward Dixon , Torsten Kaack , Ning-Yi Neil Wang , Jagjit Sandhu
发明人: Hidong Kwak , Ward Dixon , Torsten Kaack , Ning-Yi Neil Wang , Jagjit Sandhu
CPC分类号: G01N21/55 , B08B5/02 , G01B11/06 , G01B11/0641 , G01B2210/56 , G01N21/21 , H01L21/67017 , H01L22/12 , H01L2924/0002 , H01L2924/00
摘要: A local purging tool for purging a portion of a surface of a wafer with purging gas is disclosed. The purging tool includes a purging chamber configured to contain purging gas within a cavity of the purging chamber, a permeable portion of a surface of the purging chamber configured to diffuse purging gas from the cavity of the chamber to a portion of a surface of a wafer, and an aperture configured to transmit illumination received from an illumination source to a measurement location of the portion of the surface of the wafer and further configured to transmit illumination reflected from the measurement location to a detector.
摘要翻译: 公开了一种用清洗气体清洗晶片表面的一部分的局部清洗工具。 清洗工具包括净化室,其构造成在清洗室的空腔内容纳清洗气体,清洗室的表面的可渗透部分构造成将清洗气体从腔的腔扩散到晶片表面的一部分 以及被配置为将从照明源接收的照明传送到晶片表面的该部分的测量位置并且还被配置为将从测量位置反射的照射传输到检测器的孔。
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