公开(公告)号：US06762424B2

公开(公告)日：2004-07-13

申请号：US10202422

申请日：2002-07-23

申请人： Neil Wester

发明人： Neil Wester

IPC分类号： H05H134

CPC分类号： H05G2/003 ,  B82Y10/00 ,  G03F7/70033

摘要： A photolithography tool includes an anode and a cathode composed of a first material and a second material. The second material has a lower work function than the first material. Electrons emitted from the cathode ionize a gas into a plasma that generates EUV light. The EUV light is focused on a mask to produce an image of a circuit pattern. The image is projected on a semiconductor wafer to produce a circuit.

摘要翻译： 光刻工具包括由第一材料和第二材料组成的阳极和阴极。 第二种材料具有比第一种材料更低的功能。 从阴极发射的电子将气体电离成产生EUV光的等离子体。 EUV光聚焦在掩模上以产生电路图案的图像。 将图像投影在半导体晶片上以产生电路。

公开(公告)号：US06507439B1

公开(公告)日：2003-01-14

申请号：US09561314

申请日：2000-04-28

申请人： Neil Wester

发明人： Neil Wester

IPC分类号： G02B2710

CPC分类号： B29D11/00365 ,  G02B3/0012 ,  G02B3/0056

摘要： An improved method and apparatus for forming microlenses is described. The method involves defocusing light from a mask during semiconductor processing to control the curvature of microlenses being formed.

摘要翻译： 描述了用于形成微透镜的改进的方法和装置。 该方法包括在半导体处理期间使来自掩模的光散焦以控制正在形成的微透镜的曲率。

公开(公告)号：US20050159016A1

公开(公告)日：2005-07-21

申请号：US11078575

申请日：2005-03-11

申请人： Neil Wester

发明人： Neil Wester

IPC分类号： G03C5/00 ,  G03F7/26 ,  G03F7/40 ,  H01L21/31 ,  H01L21/336 ,  H01L21/469

CPC分类号： G03F7/40 ,  Y10S430/143

摘要： The present invention describes a method including providing a substrate; forming a photoresist on the substrate; performing a post-apply bake on the photoresist; exposing the photoresist to actinic radiation; performing a post-exposure bake on the photoresist; developing the photoresist; and performing electron exposure on the photoresist to reduce line edge roughness.

公开(公告)号：US06885015B2

公开(公告)日：2005-04-26

申请号：US10334680

申请日：2002-12-30

申请人： Neil Wester

发明人： Neil Wester

IPC分类号： G03F7/20 ,  H01J1/15 ,  H01J65/04 ,  H05G2/00

CPC分类号： B82Y10/00 ,  G03F7/70033 ,  H05G2/003

摘要： A source of soft x-rays in an Extreme Ultraviolet (EUV) lithography system may include a pre-ionization unit to pre-ionize a source material, e.g., a Xenon plasma. The pre-ionization unit may be integrated with a discharge unit, and may use Lanthanum Hexaboride (LaB6) as a thermionic emitter material.

摘要翻译： 极紫外（EUV）光刻系统中的软X射线源可以包括用于预先电离源材料例如氙等离子体的预电离单元。 预电离单元可以与放电单元集成，并且可以使用六硼化镧（LaB 6 N 6）作为热离子发射极材料。

公开(公告)号：US6083429A

公开(公告)日：2000-07-04

申请号：US52103

申请日：1998-03-31

申请人： Neil Wester

发明人： Neil Wester

IPC分类号： B29D11/00 ,  G02B3/00

CPC分类号： B29D11/00365 ,  G02B3/0012 ,  G02B3/0056

摘要： An improved method and apparatus for forming microlenses is described. The method involves defocusing light from a mask during semiconductor processing to control the curvature of microlenses being formed.

公开(公告)号：US06603510B1

公开(公告)日：2003-08-05

申请号：US08986361

申请日：1997-12-08

申请人： Neil Wester

发明人： Neil Wester

IPC分类号： H04N5335

CPC分类号： H01L31/02162

摘要： A structure and method for producing color filters with a protective silation layer is described. In one embodiment, each filter is coated with a silation layer to prevent bleeding of material between closely spaced filters during the fabrication process. In a second embodiment, the silation layer is used to protect an array of filters from physical damage during detaping operations. In a third embodiment, the silation layer is used before fabrication later filters in a color filter array to prevent damage to previous filter layers.

公开(公告)号：US07384665B2

公开(公告)日：2008-06-10

申请号：US10448507

申请日：2003-05-29

申请人： Neil Wester

发明人： Neil Wester

IPC分类号： B05D5/06

CPC分类号： H01L31/02162

摘要： A structure and method for producing color filters with a protective silation layer is described. In one embodiment, each filter is coated with a silation layer to prevent bleeding of material between closely spaced filters during the fabrication process. In a second embodiment, the silation layer is used to protect an array of filters from physical damage during detaping operations. In a third embodiment, the silation layer is used before fabrication later filters in a color filter array to prevent damage to previous filter layers.

摘要翻译： 描述了一种用于生产具有保护性硅酸盐层的滤色器的结构和方法。 在一个实施例中，每个过滤器涂覆有沉积层，以防止在制造过程期间在紧密间隔的过滤器之间渗出材料。 在第二实施例中，沉积层用于保护过滤器阵列免于拆卸操作期间的物理损坏。 在第三实施例中，在制造彩色滤光片阵列之后的过滤器之前使用沉淀层以防止对先前的过滤层的损坏。

公开(公告)号：US06207947B1

公开(公告)日：2001-03-27

申请号：US09040626

申请日：1998-03-18

申请人： Neil Wester

发明人： Neil Wester

IPC分类号： G01J350

CPC分类号： H01L27/14685 ,  G02B1/105 ,  G02B1/111 ,  G02B1/14

摘要： A structure and method for producing color filters with a protective highly cross-linked and densified polymer layer is described. In one embodiment, each filter is coated with a highly cross-linked and densified polymer layer to prevent bleeding of material between closely spaced filters during the fabrication process. In a second embodiment, the highly cross-linked and densified polymer layer is used to protect an array of filters from physical damage during detaping operations. In a third embodiment, the highly cross-linked and densified polymer layer is used before fabrication later filters in a color filter array to prevent damage to previous filter layers.

摘要翻译： 描述了一种用于制备具有保护性高度交联和致密聚合物层的滤色器的结构和方法。 在一个实施方案中，每个过滤器涂覆有高度交联和致密化的聚合物层，以防止在制造过程期间间隔过滤器之间的材料渗出。 在第二个实施方案中，高度交联和致密化的聚合物层用于保护过滤器阵列免于脱屑操作期间的物理损伤。 在第三个实施方案中，高度交联和致密的聚合物层在制造滤色器之前的滤色器中被使用，以防止对先前滤膜的损坏。