公开(公告)号：US06174417B1

公开(公告)日：2001-01-16

申请号：US09143045

申请日：1998-08-28

申请人： Paul Henington ,  Kwok Wah Li ,  Kwok Wing Ng ,  Chi Chung Lee ,  Pin Chun Huang ,  Fang Hao Lee ,  Marlin Vance Marsh ,  Carl John Colangelo

发明人： Paul Henington ,  Kwok Wah Li ,  Kwok Wing Ng ,  Chi Chung Lee ,  Pin Chun Huang ,  Fang Hao Lee ,  Marlin Vance Marsh ,  Carl John Colangelo

IPC分类号： C25D1700

CPC分类号： B01F5/0068 ,  B01F15/0272 ,  C25D5/08 ,  C25D17/00 ,  C25D17/12 ,  C25D17/28 ,  C25D21/14 ,  H05K3/241

摘要： An electroplating machine is disclosed as including an electrode positioning apparatus, an electrolyte delivery apparatus, an apparatus for covering a roller, an apparatus for dissolving copper oxide powder in an electrolyte passing through the apparatus, and an apparatus allowing the variation of the distance between two rollers. The electrode positioning apparatus has a first open end and a second end joined by two sets of connecting members, in which the connecting members in each set are parallel to one another and equally spaced from the adjacent member. The electrolyte delivery apparatus includes a pipe connected to a source of electrolyte and a nozzle through which the electrolyte is deliverable to an electrode mounted on the electrode positioning apparatus. The nozzle includes an elongate gap and the electrolyte exits the nozzle continuously along the entire length of the elongate gap. The electrode positioning and the electrolyte delivery apparatus are slidably engageable with each other. The covering apparatus is elongate in shape and includes a cavity for accommodating a majority part of the outside surface of a roller. The apparatus for dissolving copper oxide powder in an electrolyte includes an upper chamber and a lower chamber, in which electrolyte low in copper ion concentration enters the upper chamber through its lower part, and exits the upper chamber through its upper part. A vortex is formed in a porous pot in the upper chamber to facilitate dissolution of copper oxide powder in the electrolyte. As to the apparatus allowing the variation of the distance between an upper roller and a lower roller, such includes a primary part attachable to a wall of the electroplating machine, and a second part movable relative to the primary part. In response to entry of a PCB into the area between the two rollers, the upper roller is caused to move vertically upward, which also causes the secondary part to move vertically upward.

摘要翻译： 公开了一种电镀机，其包括电极定位装置，电解质输送装置，用于覆盖辊的装置，用于将氧化铜粉末溶解在通过该装置的电解质中的装置，以及允许两者之间的距离变化的装置 滚筒。 电极定位装置具有通过两组连接构件连接的第一开口端和第二端，其中每组中的连接构件彼此平行并与相邻构件等间隔开。 电解质输送装置包括连接到电解质源的管和喷嘴，电解质可通过该喷嘴输送到安装在电极定位装置上的电极。 喷嘴包括细长间隙，并且电解质沿着细长间隙的整个长度连续地离开喷嘴。 电极定位和电解质输送装置可滑动地彼此接合。 覆盖装置的形状是细长的并且包括用于容纳辊的外表面的大部分的空腔。 用于将氧化铜粉末溶解在电解质中的装置包括上室和下室，其中铜离子浓度低的电解质通过其下部进入上室，并通过其上部离开上室。 在上部室中的多孔罐中形成涡流以促进氧化铜粉末溶解在电解质中。 对于允许上辊和下辊之间的距离变化的装置，包括可附接到电镀机的壁的主要部件和可相对于主要部件移动的第二部件。 响应于PCB进入两个辊之间的区域，使上辊垂直向上移动，这也使得二次部件垂直向上移动。

公开(公告)号：US06632011B1

公开(公告)日：2003-10-14

申请号：US09599536

申请日：2000-06-23

申请人： Paul Henington ,  Kwok Wai Wen

发明人： Paul Henington ,  Kwok Wai Wen

IPC分类号： G05D1113

CPC分类号： B01F15/0272 ,  B01F1/0016 ,  B01F1/0022 ,  B01F1/0038 ,  C25D17/00

摘要： A mixing apparatus 1 comprising a chamber 12 with at least one inlet 16 allowing entry of a solute and a liquid solvent, at least one outlet 52 allowing exit of a solution of said solute and solution, and at least a separator 22 having at least one generally upwardly facing surface 40 and one generally downwardly facing surface 38a, wherein said surfaces define a passageway 50 allowing the solution of the solute and the solvent to pass through and out of the chamber 12, and wherein undissolved solute is descendable along the generally upwardly facing surface 40a.

摘要翻译： 包括具有至少一个入口 16 的腔室 12 的混合设备< 允许溶质和液体溶剂的进入，至少一个出口 允许所述溶质和溶液的溶液的出口，以及至少一个分离器 具有至少一个通常面向上的表面 40 和一个大致向下的表面 38 a， 其中所述表面限定通道 ，允许溶质和溶剂的溶液通过并流出 腔室 12， ，其中未溶解的溶质可沿着一般向上的表面 40 下降。

公开(公告)号：US06274010B1

公开(公告)日：2001-08-14

申请号：US09114122

申请日：1998-07-13

申请人： Paul Henington ,  Chun Pan Fung ,  Kwok Wah Li ,  Chi Chung Lee

发明人： Paul Henington ,  Chun Pan Fung ,  Kwok Wah Li ,  Chi Chung Lee

IPC分类号： C25B1500

CPC分类号： H05K3/241 ,  C25D7/123 ,  C25D17/001 ,  C25D17/002 ,  C25D17/06 ,  Y10S204/07

摘要： An apparatus for electroplating at least one substrate is disclosed as including a trough, two anodes, at least one bath and two poly-tetrafluoroethylene sheets or a number of substantially rigid polypropylene plates, in which the trough supports the substrate and is in an electrically conductive relationship therewith, and the bath contains the anodes, the trough and an electrolyte, in which, in operation, an electric field exists in the electrolyte between the trough and the anodes, and in which the poly-tetrafluoroethylene sheets or the polypropylene plates are movable to vary the amount of electric current passing between the trough and the anodes.

摘要翻译： 公开了一种用于电镀至少一个基底的设备，包括槽，两个阳极，至少一个浴和两个聚四氟乙烯片或多个基本上刚性的聚丙烯板，其中槽支撑基底并处于导电 并且浴中含有阳极，槽和电解质，其中在操作中电解槽存在于槽和阳极之间的电场中，并且其中聚四氟乙烯片或聚丙烯板是可移动的 以改变在槽和阳极之间通过的电流量。

公开(公告)号：US5589051A

公开(公告)日：1996-12-31

申请号：US353197

申请日：1994-12-09

申请人： Paul Henington

发明人： Paul Henington

IPC分类号： C25D17/06 ,  C25D5/00 ,  C25D17/08

CPC分类号： C25D17/06 ,  Y10S204/07

摘要： A clamp for use in an electrolytic plating bath is disclosed. The clamp comprises two levers pivotally attached to each other at a fulcrum wherein the clamp, when floating on top of a liquid, is in an open position but when submerged is caused, by virtue of its buoyancy, to move to a closed position. Each lever comprises a first part integrally attached to a second part. The first part and the second part are situated on opposite sides of the fulcrum from each other such that rotational movement about the fulcrum between the open position and the closed position causes the second parts of each lever to move from an upper position to a lower position. In operation, at least one substrate is supported in a substantially vertical plane for submersion into an electrolyte bath. The substrate is positioned over the electrolyte bath and then is submersed into it. The clamp clamps the substrate at its lower edge as the substrate enters the electrolyte bath.

摘要翻译： 公开了一种用于电解镀浴的夹具。 夹具包括两个杠杆，两个杠杆以支点枢转地彼此连接，其中当浮子在液体上方时，夹具处于打开位置，但是当浸没由于其浮力而移动到关闭位置时。 每个杠杆包括整体连接到第二部分的第一部分。 第一部分和第二部分位于支点的相对侧上，使得围绕支点在打开位置和关闭位置之间的旋转运动导致每个杆的第二部分从上部位置移动到下部位置 。 在操作中，至少一个基板被支撑在基本垂直的平面中，以便浸入电解液浴中。 将基底定位在电解质浴上，然后浸入其中。 当基板进入电解液槽时，夹具将基板夹在其下边缘。

公开(公告)号：US06439758B1

公开(公告)日：2002-08-27

申请号：US09599537

申请日：2000-06-23

申请人： Paul Henington ,  Kwok Wai Wen

发明人： Paul Henington ,  Kwok Wai Wen

IPC分类号： B01F1500

CPC分类号： B01F15/0022 ,  B01F1/0016 ,  B01F1/0022 ,  B01F1/0038 ,  B01F15/00428 ,  B01F15/0272 ,  B01F2001/0094 ,  C25D5/08 ,  C25D17/002 ,  C25D17/02 ,  C25D21/06

摘要： An apparatus 20 for mixing a solute with a solvent is described. The apparatus 20 includes a mixing chamber 12 for a solute and solvent and in which the solute and solvent are moved via a pump 18 and tubes (68a, 68b, 68c and 70). The chamber 12 also contains a divider 80 which, when occupying a first position (“U”), substantially divides the chamber 12 into at least two portions.

摘要翻译： 描述了用于将溶质与溶剂混合的装置20。 装置20包括用于溶质和溶剂的混合室12，其中溶质和溶剂经由泵18和管（68a，68b，68c和70）移动。 腔室12还包含分隔件80，当分配器80占据第一位置（“U”）时，基本将腔室12分成至少两个部分。

公开(公告)号：US06251234B1

公开(公告)日：2001-06-26

申请号：US09436061

申请日：1999-11-08

申请人： Paul Henington ,  Kwok Wah Li ,  Kwok Wing Ng ,  Chi Chung Lee ,  Pin Chun Huang ,  Fang Hao Lee ,  Marlin Vance Marsh ,  Carl John Colangelo

发明人： Paul Henington ,  Kwok Wah Li ,  Kwok Wing Ng ,  Chi Chung Lee ,  Pin Chun Huang ,  Fang Hao Lee ,  Marlin Vance Marsh ,  Carl John Colangelo

IPC分类号： C25D1400

CPC分类号： B01F5/0068 ,  B01F15/0272 ,  C25D5/08 ,  C25D17/00 ,  C25D17/12 ,  C25D17/28 ,  C25D21/14 ,  H05K3/241

摘要： An electroplating machine is disclosed as including an electrode positioning apparatus, an electrolyte delivery apparatus, an apparatus for covering a roller, an apparatus for dissolving copper oxide powder in an electrolyte passing through the apparatus, and an apparatus allowing the variation of the distance between two rollers. The electrode positioning apparatus has a first open end and a second end joined by two sets of connecting members, in which the connecting members in each set are parallel to one another and equally spaced from the adjacent member. The electrolyte delivery apparatus includes a pipe connected to a source of electrolyte and a nozzle through which the electrolyte is deliverable to an electrode mounted on the electrode positioning apparatus. The covering apparatus is elongate in shape and includes a cavity for accommodating a majority part of the outside surface of a roller. The apparatus for dissolving copper oxide powder in an electrolyte includes an upper chamber and a lower chamber.

摘要翻译： 公开了一种电镀机，其包括电极定位装置，电解质输送装置，用于覆盖辊的装置，用于将氧化铜粉末溶解在通过该装置的电解质中的装置，以及允许两者之间的距离变化的装置 滚筒。 电极定位装置具有通过两组连接构件连接的第一开口端和第二端，其中每组中的连接构件彼此平行并与相邻构件等间隔开。 电解质输送装置包括连接到电解质源的管和喷嘴，电解质可通过该喷嘴输送到安装在电极定位装置上的电极。 覆盖装置的形状是细长的并且包括用于容纳辊的外表面的大部分的空腔。 用于将氧化铜粉末溶解在电解质中的装置包括上室和下室。