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1.发明授权Method and lithographic apparatus for measuring and acquiring height data relating to a substrate surface 失效用于测量和获取与衬底表面有关的高度数据的方法和光刻设备公开(公告)号：US08582082B2
公开(公告)日：2013-11-12
申请号：US12399737
申请日：2009-03-06
CPC分类号： G03F7/70758 , G03F7/70725
摘要： A lithographic apparatus includes a level sensor for use in positioning a target portion of the substrate with respect to a focal plane of the projection system, a pair of actuators, configured to move a substrate table of the lithographic apparatus, and a controller for moving the substrate relative to the level sensor by controlling the actuators. The controller combines motions of the first and second actuators to produce a combined movement having a speed higher than a maximum speed of at least one of the actuators individually.
摘要翻译： 平版印刷设备包括用于相对于投影系统的焦平面定位基板的目标部分的液位传感器，配置成移动光刻设备的基板台的一对致动器，以及用于移动 通过控制致动器相对于液位传感器的基板。 控制器组合第一和第二致动器的运动，以产生具有高于致动器中的至少一个致动器的最大速度的组合运动。
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2.发明申请Method and Lithographic Apparatus for Acquiring Height Data Relating to a Substrate Surface 审中-公开用于获取与基板表面相关的高度数据的方法和平版印刷设备公开(公告)号：US20090262320A1
公开(公告)日：2009-10-22
申请号：US12399711
申请日：2009-03-06
IPC分类号： G03B27/52
CPC分类号： G03F9/7003 , G03F9/7034
摘要： A method of positioning a target portion of a substrate with respect to a focal plane of a projection system uses a level sensor to perform height measurements of at least part of the substrate to generate height data. Specified and/or predetermined correction heights are used to compute corrected height data. The predetermined correction heights may be at least partially based on process stack data. The position of a substrate table is controlled using the correction heights which are partially based on the process stack data, in particular the process stack layer of the target area.
摘要翻译： 相对于投影系统的焦平面定位基板的目标部分的方法使用水平传感器来执行至少部分基板的高度测量以产生高度数据。 使用指定的和/或预定的校正高度来计算校正的高度数据。 预定的校正高度可以至少部分地基于过程堆栈数据。 使用部分基于处理堆栈数据，特别是目标区域的处理堆栈层的校正高度来控制衬底台的位置。
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3.发明申请Method and Lithographic Apparatus for Measuring and Acquiring Height Data Relating to a Substrate Surface 失效用于测量和获取与基板表面相关的高度数据的方法和平版印刷设备公开(公告)号：US20090231563A1
公开(公告)日：2009-09-17
申请号：US12399737
申请日：2009-03-06
IPC分类号： G03B27/42
CPC分类号： G03F7/70758 , G03F7/70725
摘要： A lithographic apparatus includes a level sensor for use in positioning a target portion of the substrate with respect to a focal plane of the projection system, a pair of actuators, configured to move a substrate table of the lithographic apparatus, and a controller for moving the substrate relative to the level sensor by controlling the actuators. The controller combines motions of the first and second actuators to produce a combined movement having a speed higher than a maximum speed of at least one of the actuators individually.
摘要翻译： 平版印刷设备包括用于相对于投影系统的焦平面定位基板的目标部分的液位传感器，配置成移动光刻设备的基板台的一对致动器，以及用于移动 通过控制致动器相对于液位传感器的基板。 控制器组合第一和第二致动器的运动，以产生具有高于致动器中的至少一个致动器的最大速度的组合运动。
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公开(公告)号：US07265364B2
公开(公告)日：2007-09-04
申请号：US10864800
申请日：2004-06-10
申请人： Paulus Antonius Andreas Teunissen , Rene Marinus Gerardus Johan Queens , Petra Albertina Margaretha Dekkers-Rog , Alexander Charles Franciscus Anna Van Well
发明人： Paulus Antonius Andreas Teunissen , Rene Marinus Gerardus Johan Queens , Petra Albertina Margaretha Dekkers-Rog , Alexander Charles Franciscus Anna Van Well
CPC分类号： G03F7/70566 , G03F9/7034
摘要： A level sensor for a lithographic projection apparatus includes a light source configured to direct light onto a substrate to be measured, a detector configured to detect light reflected from the substrate, and a processor configured to calculate a difference between measurements made with the filter in the first configuration and in the second configuration. The sensor is adjustable between a first configuration, in which the light is given a first property, and a second configuration, in which the light is given a second property. The sensor may include a polarizing filter, such that the first and second properties are different polarization states.
摘要翻译： 用于光刻投影装置的液位传感器包括被配置为将光引导到要测量的基板上的光源，被配置为检测从基板反射的光的检测器，以及被配置为计算与所述滤光器在 第一配置和第二配置。 传感器可以在其中给予第一属性的第一配置和第二配置之间进行调节，其中光被赋予第二属性。 传感器可以包括偏振滤光器，使得第一和第二特性是不同的偏振状态。
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5.发明授权Lithographic apparatus, level sensor, method of inspection, device manufacturing method, and device manufactured thereby 有权平版印刷装置，液位传感器，检查方法，装置制造方法以及由此制造的装置公开(公告)号：US07248337B2
公开(公告)日：2007-07-24
申请号：US10756841
申请日：2004-01-14
申请人： Paulus Antonius Andreas Teunissen , Petrus Johannes Maria Broodbakker , Rene Marinus Gerardus Johan Queens
发明人： Paulus Antonius Andreas Teunissen , Petrus Johannes Maria Broodbakker , Rene Marinus Gerardus Johan Queens
CPC分类号： G03F9/7034
摘要： A level sensor for a lithographic projection apparatus according to one embodiment of the invention includes a light source, a first reflector, a second reflector and a detector. The first reflector is positioned to direct light from the light source towards a wafer surface, and the second reflector is positioned to direct light reflected from the wafer surface to the detector. The first and second reflectors are selected to incur a minimal process dependent apparent surface depression.
摘要翻译： 根据本发明的一个实施例的用于光刻投影设备的液位传感器包括光源，第一反射器，第二反射器和检测器。 第一反射器被定位成将来自光源的光朝向晶片表面引导，并且第二反射器被定位成将从晶片表面反射的光引导到检测器。 选择第一和第二反射器以产生最小的过程依赖的表观凹陷。
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6.发明授权Lithographic apparatus, level sensor, method of inspection, device manufacturing method, and device manufactured thereby 有权平版印刷装置，液位传感器，检查方法，装置制造方法以及由此制造的装置公开(公告)号：US07646471B2
公开(公告)日：2010-01-12
申请号：US11812165
申请日：2007-06-15
申请人： Paulus Antonius Andreas Teunissen , Petrus Johannes Maria Broodbakker , Rene Marinus Gerardus Johan Queens
发明人： Paulus Antonius Andreas Teunissen , Petrus Johannes Maria Broodbakker , Rene Marinus Gerardus Johan Queens
CPC分类号： G03F9/7034
摘要： A level sensor for a lithographic projection apparatus according to one embodiment of the invention includes a light source, a first reflector, a second reflector and a detector. The first reflector is positioned to direct light from the light source towards a wafer surface, and the second reflector is positioned to direct light reflected from the wafer surface to the detector. The first and second reflectors are selected to incur a minimal process dependent apparent surface depression.
摘要翻译： 根据本发明的一个实施例的用于光刻投影设备的液位传感器包括光源，第一反射器，第二反射器和检测器。 第一反射器被定位成将来自光源的光朝向晶片表面引导，并且第二反射器被定位成将从晶片表面反射的光引导到检测器。 选择第一和第二反射器以产生最小的过程依赖的表观凹陷。
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7.发明授权Lithographic apparatus, device manufacturing method, and device manufactured thereby 失效平版印刷设备，器件制造方法和由此制造的器件公开(公告)号：US06987555B2
公开(公告)日：2006-01-17
申请号：US10892395
申请日：2004-07-16
申请人： Paulus Antonius Andreas Teunissen , Gerrit Johannes Nijmeijer , Rene Marinus Gerardus Johan Queens , Frank Staals , Robert Jan Van Wijk , Roeland Nicolaas Maria Vanneer
发明人： Paulus Antonius Andreas Teunissen , Gerrit Johannes Nijmeijer , Rene Marinus Gerardus Johan Queens , Frank Staals , Robert Jan Van Wijk , Roeland Nicolaas Maria Vanneer
CPC分类号： G03F9/7019 , G03F9/7034
摘要： According to one embodiment, a method of calibrating level sensors of at least two lithographic projection apparatus to correct machine to machine level sensor process dependency includes using a first lithographic projection apparatus to measure a first set of leveling data for a reference substrate and a second set of leveling data for a substrate processed according to a selected process, and using a second lithographic projection apparatus to measure a third set of leveling data for the reference substrate and a fourth set of leveling data for the processed substrate. The method also includes calculating, based on the first, second, third and fourth sets of leveling data, a set of level sensor parameters corresponding to machine to machine level sensor differences for the selected process, wherein the machine to machine level sensor differences are measured and stored as intrafield values.
摘要翻译： 根据一个实施例，一种校准至少两个光刻投影设备的水平传感器以校正机器与机器水平传感器处理依赖性的方法包括使用第一光刻投影设备来测量参考基板和第二组的第一组调平数据 根据所选择的工艺处理的衬底的调平数据，以及使用第二光刻投影装置测量用于所述参考衬底的第三组校平数据和用于所述经处理衬底的第四组校平数据。 该方法还包括基于第一，第二，第三和第四组平整数据计算一组对于所选择的过程的机器与机器水平传感器差异的水平传感器参数，其中测量机器与机器水平传感器差异 并作为场内值存储。
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8.发明授权Lithographic apparatus, device manufacturing method, and device manufactured thereby 有权平版印刷设备，器件制造方法和由此制造的器件公开(公告)号：US06906785B2
公开(公告)日：2005-06-14
申请号：US10419979
申请日：2003-04-22
IPC分类号： G03F7/20 , G03F7/207 , G03F9/00 , H01L21/027 , G03B27/42 , G01N21/86 , G03B27/32 , G03B27/52
CPC分类号： G03F9/7019 , G03F9/7034
摘要： A method of calibrating level sensors of at least two lithographic projection apparatus to correct machine to machine level sensor process dependency includes measuring a first set of leveling data using a first lithographic projection apparatus for a reference substrate, measuring a second set of leveling data using the first apparatus for a substrate processed according to a selected process, measuring a third set of leveling data using the second apparatus for the reference substrate, measuring a fourth set of leveling data using the second apparatus for the processed substrate, and using the first, second, third and fourth sets of leveling data to calculate the set of level sensor parameters corresponding to machine to machine level sensor differences for the selected process.
摘要翻译： 校准至少两个光刻投影设备的液位传感器以校正机器与机器水平传感器处理依赖性的方法包括使用用于参考基板的第一平版印刷投影设备来测量第一组调平数据，使用第二组调平数据 用于根据所选择的处理处理的基板的第一装置，使用所述参考基板的第二装置测量第三组调平数据，使用所述处理的基板的所述第二装置测量第四组调平数据，并且使用所述第一，第二 ，第三和第四组调平数据来计算对应于所选过程的机器与机器级传感器差异的液位传感器参数的集合。
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