Disposable Corn and Callus Remover Tool
    1.
    发明申请
    Disposable Corn and Callus Remover Tool 审中-公开
    一次性玉米和愈伤组织去除工具

    公开(公告)号:US20080295855A1

    公开(公告)日:2008-12-04

    申请号:US11756394

    申请日:2007-05-31

    IPC分类号: A45D29/00

    CPC分类号: A61B17/54 A61B2017/320004

    摘要: A disposable corn and callus remover tool with a holder for receiving an abrasive block. The holder forms a handle for comfortably holding the tool and includes a receptacle to removably receive an abrasive block. The abrasive block may be formed of pumice or a buffing block comprising one or more abrasive layers attached to a compressible layer. The compressible layer is made of foam or hard sponge. The abrasive block is secured to the holder in such a way that both top and bottom abrasive layers are exposed for efficient use.

    摘要翻译: 一次性玉米和愈伤组织去除剂工具,其具有用于接收研磨块的保持器。 保持器形成用于舒适地保持工具的手柄,并且包括用于可移除地容纳磨料块的容器。 研磨块可以由浮石或抛光块形成,该抛光块包括连接到可压缩层的一个或多个研磨层。 可压缩层由泡沫或硬质海绵制成。 研磨块以这样的方式固定到保持器上,使得顶部和底部磨料层都被暴露以有效地使用。

    Disposable Nail Buffing Tool
    2.
    发明申请
    Disposable Nail Buffing Tool 审中-公开
    一次性指甲漂白工具

    公开(公告)号:US20080276952A1

    公开(公告)日:2008-11-13

    申请号:US11747165

    申请日:2007-05-10

    IPC分类号: A45D29/00

    CPC分类号: A45D29/04 A45D29/12

    摘要: A disposable nail buffing tool with a holder for receiving a buffing block. The holder may be made of plastic, metal, graphite, or some other light weight and rigid material. The holder has a receptacle for receiving a buffing block. In one embodiment the sides of the receptacle are angled inwards, to grasp and hold the buffing block. The holder also has handles to facilitate holding and using the nail buffing tool. The buffing block is removably received in the receptacle of the holder. The buffing block is made of a compressible layer and one or more abrasive layers attached to the compressible layer. The compressible layer is made of foam or hard sponge. The abrasive layer may be sand paper glued to the compressible layer or as in one embodiment, directly sprayed onto the compressible layer.

    摘要翻译: 一次性指甲抛光工具,具有用于接收抛光块的支架。 保持器可以由塑料,金属,石墨或其他一些重量轻的刚性材料制成。 支架具有用于接收抛光块的插座。 在一个实施例中,插座的侧面向内倾斜,以抓握并保持抛光块。 支架还具有手柄以便于保持和使用指甲抛光工具。 抛光块可移除地容纳在支架的插座中。 抛光块由可压缩层和连接到可压缩层的一个或多个研磨层制成。 可压缩层由泡沫或硬质海绵制成。 研磨层可以是胶合到可压缩层的砂纸,或者在一个实施例中,直接喷涂到可压缩层上。

    Aircraft approach to landing analysis method
    4.
    发明授权
    Aircraft approach to landing analysis method 有权
    飞机降落方法分析方法

    公开(公告)号:US08204637B1

    公开(公告)日:2012-06-19

    申请号:US12497875

    申请日:2009-07-06

    IPC分类号: G06F17/18 G06T7/20

    CPC分类号: G06Q30/0201 G06Q30/0202

    摘要: A method has been found for assessing an aircraft approach to landing on a shipboard landing surface. The method includes a comparison of an identified aircraft performance with the mean or median of a baseline data set. The baseline data set is assembled from a multiplicity of actual approaches to landing data that are selected for relevance and then statistically evaluated. A high data recording rate captures the pilot's control inputs and allows evaluation of the pilot's manual efficiency of input to controls. The method is particularly useful to evaluate performance under conditions in which evaluation by human observation is limited or evaluation against guidelines produces less meaningful results.

    摘要翻译: 已经发现一种评估飞机降落在船上着陆表面上的方法。 该方法包括将所识别的飞机性能与基线数据集的平均值或中值进行比较。 基线数据集从多个实际方法组合到着陆数据,登陆数据被选择用于相关性,然后进行统计学评估。 高数据记录速率捕获飞行员的控制输入,并允许评估飞行员手动输入控制效率。 该方法对于在人类观察评估有限的条件下评估表现特别有用,或者对指南进行评估产生较少有意义的结果。

    Method of forming a dual damascene structure using an amorphous silicon hard mask
    5.
    发明授权
    Method of forming a dual damascene structure using an amorphous silicon hard mask 失效
    使用非晶硅硬掩模形成双镶嵌结构的方法

    公开(公告)号:US06806203B2

    公开(公告)日:2004-10-19

    申请号:US10101540

    申请日:2002-03-18

    IPC分类号: H01L21302

    摘要: A method of forming a dual damascene structure on a substrate having a dielectric layer already formed thereon. In one embodiment the method includes depositing a first hard mask layer over the dielectric layer and depositing a second hard mask layer on the first hard mask layer, where the second hard mask layer is an amorphous silicon layer. Afterwards, formation of the dual damascene structure is completed by etching a metal wiring pattern and a via pattern in the dielectric layer and filling the etched metal wiring pattern and via pattern with a conductive material.

    摘要翻译: 在其上已经形成有电介质层的基板上形成双镶嵌结构的方法。 在一个实施例中,该方法包括在电介质层上沉积第一硬掩模层并在第一硬掩模层上沉积第二硬掩模层,其中第二硬掩模层是非晶硅层。 然后,通过在电介质层中蚀刻金属布线图案和通孔图案并用导电材料填充蚀刻的金属布线图案和通孔图案来完成双镶嵌结构的形成。