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公开(公告)号：US20080128000A1
公开(公告)日：2008-06-05
申请号：US11896642
申请日：2007-09-04
申请人： Shimotera Kennichi , Sang Soo Choi
发明人： Shimotera Kennichi , Sang Soo Choi
IPC分类号： B08B3/02
CPC分类号： A47L15/0021 , A47L15/4297 , A47L2401/10 , A47L2501/30
摘要： A washing control apparatus and method of a dish washing machine capable of detecting the turbidity of wash water during washing to determine a next washing operation. The washing control method includes detecting a turbidity of wash water while performing washing using the wash water, and determining a washing operation to be performed based on the detected turbidity of the wash water.
摘要翻译： 一种洗碗机的清洗控制装置和洗碗机的方法，其能够检测洗涤时的洗涤水的浊度，以确定下次的洗涤操作。 洗涤控制方法包括在使用洗涤水进行洗涤的同时检测洗涤水的浊度，并且基于检测到的洗涤水的浊度来确定要进行的洗涤操作。
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公开(公告)号：US07377984B2
公开(公告)日：2008-05-27
申请号：US11624275
申请日：2007-01-18
申请人： Yong Dae Kim , Jong Min Kim , Han Byul Kang , Hyun Joon Cho , Sang Soo Choi
发明人： Yong Dae Kim , Jong Min Kim , Han Byul Kang , Hyun Joon Cho , Sang Soo Choi
IPC分类号： B08B3/04
CPC分类号： G03F1/82
摘要： Disclosed herein is a method of cleaning a photomask, which prevents haze from being generated on a surface of the photomask during a photolithography process. The photomask is heat treated to remove residual ions on a surface thereof and to induce curing and oxidation of Cr and MoSiON layers, thereby preventing diffusion of the ions. Etching of Cr and MoSiON layers due to a cleaning process is suppressed in order to significantly reduce a change in phase and transmissivity of optical properties of Cr and MoSiON.
摘要翻译： 本文公开了一种清洁光掩模的方法，其防止在光刻工艺期间在光掩模的表面上产生雾度。 光掩模被热处理以除去其表面上的残余离子并引起Cr和MoSiON层的固化和氧化，从而防止离子的扩散。 抑制由于清洗过程而导致的Cr和MoSiON层的蚀刻，以显着地减少Cr和MoSiON的光学性质的相位变化和透射率。
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公开(公告)号：US20070215188A1
公开(公告)日：2007-09-20
申请号：US11624266
申请日：2007-01-18
申请人： Yong Dae KIM , Jong Min KIM , Han Byul KANG , Hyun Joon CHO , Sang Soo CHOI
发明人： Yong Dae KIM , Jong Min KIM , Han Byul KANG , Hyun Joon CHO , Sang Soo CHOI
IPC分类号： B08B3/00
CPC分类号： G03F1/82
摘要： Disclosed herein is a device for cleaning a photomask, which prevents haze from being generated on a surface of the photomask during a photolithography process. The photomask is heat treated to remove residual ions on a surface thereof and to induce curing and oxidation of Cr and MoSiON layers, thereby preventing diffusion of the ions. Etching of Cr and MoSiON layers due to a cleaning process is suppressed in order to significantly reduce a change in phase and transmissivity of optical properties of Cr and MoSiON.
摘要翻译： 本文公开了一种用于清洁光掩模的装置，其防止在光刻工艺期间在光掩模的表面上产生雾度。 光掩模被热处理以除去其表面上的残余离子并引起Cr和MoSiON层的固化和氧化，从而防止离子的扩散。 抑制由于清洗过程而导致的Cr和MoSiON层的蚀刻，以显着地减少Cr和MoSiON的光学性质的相位变化和透射率。
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公开(公告)号：US5796804A
公开(公告)日：1998-08-18
申请号：US794906
申请日：1997-02-04
申请人： Young Jin Jeon , Sang Soo Choi , Hai Bin Chung , Jong Hyun Lee , Hyung Joun Yoo
发明人： Young Jin Jeon , Sang Soo Choi , Hai Bin Chung , Jong Hyun Lee , Hyung Joun Yoo
CPC分类号： G03F7/70691 , G21K1/10
摘要： A X-ray mask structure which reduces the distortion of the membrane, the X-ray mask structure including, a mask substrate having an opening in the central part thereof, a membrane formed on the mask substrate, the membrane having the chip site on which absorbers are arranged according to a desired pattern of a semiconductor device, and a support ring for supporting the mask substrate, which is defined by a plurality of fragments.
摘要翻译： 一种减少膜变形的X射线掩模结构，所述X射线掩模结构包括在其中心部分具有开口的掩模基板，形成在掩模基板上的膜，其上具有芯片位置的膜 吸收体根据半导体器件的期望图案和用于支撑由多个片段限定的掩模衬底的支撑环布置。
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5.发明申请公开(公告)号：US20090229337A1
公开(公告)日：2009-09-17
申请号：US12045882
申请日：2008-03-11
摘要： An apparatus and method for forming at least one end turn and one slot segment of a coil for a stator of a dynamoelectric machine includes the utilization of a plurality of forming dies. Each forming die includes two lateral surfaces extending from a base and an end turn surface disposed substantially between and connecting the two lateral surfaces. Each forming die is disposed and pivotable into an arrangement where at least one lateral surface of a first forming die is substantially adjacent and parallel to at least one lateral surface of a second forming die, a slot segment thereby formable between lateral surfaces of adjacent forming dies and an end turn is at least partially formable between an end turn surface and a base of adjacent forming dies.
摘要翻译： 用于形成电动机的定子的线圈的至少一个端部匝和一个槽段的装置和方法包括利用多个成形模具。 每个成形模具包括从基部延伸的两个侧表面和基本上设置在两个侧表面之间并连接两个侧表面的端部转向表面。 每个成形模具被设置并可枢转到布置中，其中第一成形模具的至少一个侧表面基本上相邻并平行于第二成形模具的至少一个侧表面，从而可以在相邻成形模具的侧表面之间形成槽段 并且端匝在相邻的成型模具的端匝表面和基部之间至少部分地形成。
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公开(公告)号：US20080128001A1
公开(公告)日：2008-06-05
申请号：US11898208
申请日：2007-09-10
IPC分类号： B08B7/04
CPC分类号： A47L15/0021 , A47L15/4297 , A47L2301/04 , A47L2401/10 , A47L2501/26 , A47L2501/30
摘要： A washing control apparatus and method of a dish washing machine capable of determining a course selection in each operation through the detection of the turbidity of wash water at a preceding operation. The washing control method includes determining whether an automatic washing course has been selected according to a command of a user, when the automatic washing course has been selected, detecting a turbidity of wash water during washing, and selecting a course of a next operation based on the detected turbidity of the wash water.
摘要翻译： 一种洗碗机的洗涤控制装置和方法，其能够通过检测前一操作中的洗涤水的浊度来确定每个操作中的路线选择。 洗涤控制方法包括根据用户的命令，当选择了自动洗涤进程时，是否已经选择了自动洗涤进程，检测洗涤时的洗涤水的浊度，以及基于以下步骤选择下一个操作的过程 检测洗涤水的浊度。
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公开(公告)号：US07186301B2
公开(公告)日：2007-03-06
申请号：US11276974
申请日：2006-03-20
申请人： Yong Dae Kim , Jong Min Kim , Han Byul Kang , Hyun Joon Cho , Sang Soo Choi
发明人： Yong Dae Kim , Jong Min Kim , Han Byul Kang , Hyun Joon Cho , Sang Soo Choi
IPC分类号： B08B3/00
CPC分类号： H01L21/67207 , G03F1/32 , G03F1/82
摘要： Disclosed herein is a device and a method of cleaning a photomask, which prevents haze from being generated on a surface of the photomask during a photolithography process. The photomask is heat treated to remove residual ions on a surface thereof and to induce curing and oxidation of Cr and MoSiON layers, thereby preventing diffusion of the ions. Etching of Cr and MoSiON layers due to a cleaning process is suppressed in order to significantly reduce a change in phase and transmissivity of optical properties of Cr and MoSiON.
摘要翻译： 本文公开了一种清洁光掩模的装置和方法，其防止在光刻工艺期间在光掩模的表面上产生雾度。 光掩模被热处理以除去其表面上的残余离子并引起Cr和MoSiON层的固化和氧化，从而防止离子的扩散。 抑制由于清洗过程而导致的Cr和MoSiON层的蚀刻，以显着地减少Cr和MoSiON的光学性质的相位变化和透射率。
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公开(公告)号：US20060207633A1
公开(公告)日：2006-09-21
申请号：US11276974
申请日：2006-03-20
申请人： Yong Dae KIM , Jong Min KIM , Han Byul KANG , Hyun Joon CHO , Sang Soo CHOI
发明人： Yong Dae KIM , Jong Min KIM , Han Byul KANG , Hyun Joon CHO , Sang Soo CHOI
CPC分类号： H01L21/67207 , G03F1/32 , G03F1/82
摘要： Disclosed herein is a device and a method of cleaning a photomask, which prevents haze from being generated on a surface of the photomask during a photolithography process. The photomask is heat treated to remove residual ions on a surface thereof and to induce curing and oxidation of Cr and MoSiON layers, thereby preventing diffusion of the ions. Etching of Cr and MoSiON layers due to a cleaning process is suppressed in order to significantly reduce a change in phase and transmissivity of optical properties of Cr and MoSiON.
摘要翻译： 本文公开了一种清洁光掩模的装置和方法，其防止在光刻工艺期间在光掩模的表面上产生雾度。 光掩模被热处理以除去其表面上的残余离子并引起Cr和MoSiON层的固化和氧化，从而防止离子的扩散。 抑制由于清洗过程而导致的Cr和MoSiON层的蚀刻，以显着地减少Cr和MoSiON的光学性质的相位变化和透射率。
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公开(公告)号：US5543253A
公开(公告)日：1996-08-06
申请号：US357017
申请日：1994-12-16
申请人： Byung-Sun Park , Yong-Ho Oh , Sang-Soo Choi , Hyung-Joun Yoo
发明人： Byung-Sun Park , Yong-Ho Oh , Sang-Soo Choi , Hyung-Joun Yoo
IPC分类号： G03F1/70 , G03F1/80 , H01L21/027 , H01L21/338 , H01L29/812 , G03F9/00
CPC分类号： G03F1/50
摘要： The present invention relates to a photomask for forming a T-shaped gate structure on a high speed FET through a photolithography, comprising opaque layer patterns 2 and 2a for defining a head portion of the T-shaped gate structure and half-tone layer patterns 3 and 3a for defining a foot portion thereof.The half-tone film patterns composed of a chrome layer are deposited to a thickness thinner than that of the opaque layer patterns so that the half-tone layer patterns show a relatively lower transmittance to an incident beam.The application of the photomask of the invention to the process for forming a T-shaped gate structure improves process reproducibility and leads to great cost savings.
摘要翻译： 本发明涉及一种用于通过光刻法在高速FET上形成T形栅极结构的光掩模，其包括用于限定T形栅极结构和半色调层图案3的头部的不透明层图案2和2a 和3a用于限定其脚部。 由铬层构成的半色调膜图案被沉积成比不透明层图案的厚度薄的厚度，使得半色调层图案对入射光束显示相对较低的透射率。 将本发明的光掩模应用于形成T形栅极结构的工艺提高了工艺的再现性并且导致了巨大的成本节约。
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公开(公告)号：US08636849B2
公开(公告)日：2014-01-28
申请号：US12007472
申请日：2008-01-10
申请人： Sang Soo Choi , Shimotera Kennichi
发明人： Sang Soo Choi , Shimotera Kennichi
IPC分类号： B08B7/00
CPC分类号： A47L15/0026 , A47L2401/12 , A47L2501/06
摘要： Disclosed herein are a dish washer which is capable of finishing a rinse mode within a predetermined time by changing an operation start time of a heater according to the temperature of washing water at the time of a final rinse mode of the dish washer, and a method of controlling the same. The method of controlling the dish washer including a washing tub for containing dishes to be washed using washing water and a heater for heating the washing water includes sensing a temperature of the washing water, determining an operation start time of the heater on the basis of the sensed temperature of the washing water, and operating the heater according to the determined operation start time of the heater.
摘要翻译： 本文公开了一种洗碗机，其能够在预定时间内完成冲洗模式，其通过根据洗碗机的最终冲洗模式时的洗涤水的温度改变加热器的操作开始时间，以及方法 控制相同。 控制洗碗机的方法包括：洗涤桶，用于容纳要洗涤的洗涤盘和用于加热洗涤水的加热器，包括检测洗涤水的温度，基于该洗涤水确定加热器的操作开始时间 检测洗涤水的温度，并根据确定的加热器的操作开始时间操作加热器。
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