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公开(公告)号：US20090107546A1
公开(公告)日：2009-04-30
申请号：US11926405
申请日：2007-10-29
IPC分类号： H01L31/0264 , C08L1/08
CPC分类号： H01L31/022425 , C09D11/52 , H05K1/095 , H05K3/105 , H05K3/1241 , H05K2201/0245 , H05K2203/0126 , H05K2203/121 , Y02E10/50 , Y10T428/256
摘要： A material set that can be used for making high aspect ratio lines includes a sacrificial feedstock comprising an organic polymer, a solvent, and one or more optional additives, and a functional material that forms a ribbon with the sacrificial feedstock without the sacrificial feedstock and the functional material substantially intermixing, wherein the sacrificial feedstock has a yield strength of greater than about 100 Pa or a viscosity of greater than about 104 cP at a shear rate of less than about 10 sec−1 to enable the ribbon to maintain structural integrity, and the sacrificial feedstock can be removed from the ribbon, leaving the functional material in place with an aspect ratio of greater than about 0.3.
摘要翻译： 可用于制备高纵横比线的材料组包括包含有机聚合物，溶剂和一种或多种任选的添加剂的牺牲原料以及与不含牺牲原料的牺牲原料形成带的功能材料， 功能材料基本上混合，其中牺牲进料在小于约10秒-1的剪切速率下具有大于约100Pa的屈服强度或大于约104cP的粘度，以使带能够保持结构完整性，以及 牺牲原料可以从带中除去，使功能材料以大于约0.3的纵横比留在原位。
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2.发明授权Methods and apparatus for preparing low net stress multilayer thin film coatings 失效制备低应力多层薄膜涂层的方法和装置
公开(公告)号：US5944964A
公开(公告)日：1999-08-31
申请号：US800919
申请日：1997-02-13
CPC分类号： C23C14/5806 , C03C17/3417 , C23C14/083 , C23C14/10 , G02B1/115
摘要： It has been discovered that control of the intra-layer stress in layers of high refractive index materials, such as zirconia and titania, permits low net stress multilayer thin film stacks comprising alternating layers of the high refractive index material and silica, a low refractive index material, to be sputter-deposited on glass substrates. In particular, a simple, cost-effective and readily reproducible post-deposition annealing process is used, i.e., an annealing process that can be effected within a broad temperature range and for a brief and substantially open-ended time period, to change the post-deposition microstructure of the high refractive index film layers and create a selected intra-layer tensile stress. The intra-layer tensile stress created during such an annealing process is largely dependent on the post-deposition microstructure of the high refractive index thin film layers. It has been further discovered that the deposition conditions and, in particular, ion bombardment energy, can be controlled to provide a selected and reproducible post-deposition microstructure that is partially amorphous and partially crystalline and which transforms during annealing to a very dense crystalline microstructure. This transformation results in film shrinkage and, because the film is constrained by the glass substrate, the film shrinkage produces a selected amount of tensile stress that compensates for the compressive stress of the silica thin film layers.
摘要翻译： 已经发现，高折射率材料（例如氧化锆和二氧化钛）层内的层内应力的控制允许包含高折射率材料和二氧化硅的交替层的低净应力多层薄膜堆叠，低折射率 材料，被溅射沉积在玻璃基板上。 特别地，使用简单的，具有成本效益且易于再现的后沉积退火工艺，即可以在宽的温度范围内进行并且在短暂且基本上开放的时间段内进行退火处理以改变柱 - 高折射率膜层的沉积微结构并产生选定的层内拉伸应力。 在这种退火过程中产生的层内拉伸应力很大程度上取决于高折射率薄膜层的沉积后微结构。 进一步发现，可以控制沉积条件，特别是离子轰击能量，以提供部分无定形和部分结晶的选择和可再现的沉积后微结构，并且在退火期间转变为非常致密的结晶微结构。 这种转变导致膜收缩，并且由于膜受到玻璃基板的约束，膜收缩产生一定量的拉伸应力，补偿二氧化硅薄膜层的压缩应力。
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公开(公告)号：US5930046A
公开(公告)日：1999-07-27
申请号：US940305
申请日：1997-09-30
CPC分类号： C23C14/5806 , C03C17/3417 , C23C14/083 , C23C14/10 , G02B1/115
摘要： It has been discovered that control of the intra-layer stress in layers of high refractive index materials, such as zirconia and titania, permits low net stress multilayer thin film stacks comprising alternating layers of the high refractive index material and silica, a low refractive index material, to be sputter-deposited on glass substrates. In particular, a simple, cost-effective and readily reproducible post-deposition annealing process is used, i.e., an annealing process that can be effected within a broad temperature range and for a brief and substantially open-ended time period, to change the post-deposition microstructure of the high refractive index film layers and create a selected intra-layer tensile stress. The intra-layer tensile stress created during such an annealing process is largely dependent on the post-deposition microstructure of the high refractive index thin film layers. It has been further discovered that the deposition conditions and, in particular, ion bombardment energy, can be controlled to provide a selected and reproducible post-deposition microstructure that is partially amorphous and partially crystalline and which transforms during annealing to a very dense crystalline microstructure. This transformation results in film shrinkage and, because the film is constrained by the glass substrate, the film shrinkage produces a selected amount of tensile stress that compensates for the compressive stress of the silica thin film layers.
摘要翻译： 已经发现，高折射率材料（例如氧化锆和二氧化钛）层内的层内应力的控制允许包含高折射率材料和二氧化硅的交替层的低净应力多层薄膜堆叠，低折射率 材料，被溅射沉积在玻璃基板上。 特别地，使用简单的，具有成本效益且易于再现的后沉积退火工艺，即可以在宽的温度范围内进行并且在短暂且基本上开放的时间段内进行退火处理以改变柱 - 高折射率膜层的沉积微结构并产生选定的层内拉伸应力。 在这种退火过程中产生的层内拉伸应力很大程度上取决于高折射率薄膜层的沉积后微结构。 进一步发现，可以控制沉积条件，特别是离子轰击能量，以提供部分无定形和部分结晶的选择和可再现的沉积后微结构，并且在退火期间转变为非常致密的结晶微结构。 这种转变导致膜收缩，并且由于膜受到玻璃基板的约束，膜收缩产生一定量的拉伸应力，补偿二氧化硅薄膜层的压缩应力。
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公开(公告)号：US5670030A
公开(公告)日：1997-09-23
申请号：US617678
申请日：1996-03-19
CPC分类号： C23C14/225 , C23C14/0078 , C23C14/044 , C23C14/34
摘要： The present invention is directed to a sputtering method for preparing optical coatings having low light scattering characteristics by controlling the angle of incidence of the material being sputtered without significantly reducing the coating efficiency of the sputtering process. The angle of incidence is controlled by reducing the collision scattering of the material being sputtered and by intercepting the sputtered material that would without interception arrive at the surface to be coated at high angles of incidence. The collision scattering is reduced by utilizing a sputtering gas that has a mass less than the mass of the material being sputtered.
摘要翻译： 本发明涉及通过控制溅射材料的入射角度而不显着降低溅射工艺的涂布效率来制备具有低光散射特性的光学涂层的溅射方法。 入射角通过减少被溅射的材料的碰撞散射和通过截取不会截获的溅射材料以高角度到达待涂覆的表面来控制。 通过利用质量小于被溅射的材料的质量的溅射气体来减少碰撞散射。
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