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公开(公告)号：US20090153971A1
公开(公告)日：2009-06-18
申请号：US12330421
申请日：2008-12-08
Applicant: Motoo Takada , Shinya Kikegawa , Toshimasa Nishi , Hiroto Ishikawa
Inventor： Motoo Takada , Shinya Kikegawa , Toshimasa Nishi , Hiroto Ishikawa
CPC classification number: G02B5/285
Abstract: Optical multilayer thin-film filters (OMTFFs) are disclosed. An exemplary filter includes a transparent substrate, a multilayer film (MF) on a surface of the substrate, and a top layer. The MF is of alternatingly laminated layers of a high-refractive-index (HRI) material and a low-refractive-index (LRI) material. The top layer is on an uppermost layer of the MF and is of a material having atoms of lower atomic weight than atoms of either the HRI or LRI materials. The OMTFFs are made in a vacuum environment by alternatingly laminating respective thin films of the HRI and LRI materials on the substrate. The top layer is formed on the MF. Between forming the MF and top layer is a suppression step in which the newly formed MF is exposed to moisture by briefly venting the vacuum to atmosphere. The moisture inhibits migration of the low-molecular-weight atoms into the HRI and LRI materials.
Abstract translation: 公开了多层薄膜滤光片（OMTFF）。 示例性滤光器包括透明基板，在基板的表面上的多层膜（MF）和顶层。 MF是高折射率（HRI）材料和低折射率（LRI）材料的交替叠层的层。 顶层位于MF的最上层，并且具有比HRI或LRI材料的原子低的原子的原子的材料。 OMTFF在真空环境中通过在衬底上交替地层压HRI和LRI材料的各个薄膜来制成。 顶层形成在MF上。 在形成MF和顶层之间是通过将真空短暂地排放到大气中而使新形成的MF暴露于水分的抑制步骤。 水分抑制低分子量原子迁移到HRI和LRI材料中。
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2.发明申请公开(公告)号：US20120263872A1
公开(公告)日：2012-10-18
申请号：US13532028
申请日：2012-06-25
Applicant: Motoo TAKADA , Shinya KIKEGAWA , Toshimasa NISHI , Hiroto ISHIKAWA
Inventor： Motoo TAKADA , Shinya KIKEGAWA , Toshimasa NISHI , Hiroto ISHIKAWA
IPC: B05D5/06
CPC classification number: G02B5/285
Abstract: Optical multilayer thin-film filters (OMTFFs) are disclosed. An exemplary filter includes a transparent substrate, a multilayer film (MF) on a surface of the substrate, and a top layer. The MF is of alternatingly laminated layers of a high-refractive-index (HRI) material and a low-refractive-index (LRI) material. The top layer is on an uppermost layer of the MF and is of a material having atoms of lower atomic weight than atoms of either the HRI or LRI materials. The OMTFFs are made in a vacuum environment by alternatingly laminating respective thin films of the HRI and LRI materials on the substrate. The top layer is formed on the MF. Between forming the MF and top layer is a suppression step in which the newly formed MF is exposed to moisture by briefly venting the vacuum to atmosphere. The moisture inhibits migration of the low-molecular-weight atoms into the HRI and LRI materials.
Abstract translation: 公开了多层薄膜滤光片（OMTFF）。 示例性滤光器包括透明基板，在基板的表面上的多层膜（MF）和顶层。 MF是高折射率（HRI）材料和低折射率（LRI）材料的交替叠层的层。 顶层位于MF的最上层，并且具有比HRI或LRI材料的原子低的原子的原子的材料。 OMTFF在真空环境中通过在衬底上交替地层压HRI和LRI材料的各个薄膜来制成。 顶层形成在MF上。 在形成MF和顶层之间是通过将真空短暂地排放到大气中而使新形成的MF暴露于水分的抑制步骤。 水分抑制低分子量原子迁移到HRI和LRI材料中。
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Patent Agency Ranking
公开(公告)号：US08233219B2
公开(公告)日：2012-07-31
申请号：US12330421
申请日：2008-12-08
Applicant: Motoo Takada , Shinya Kikegawa , Toshimasa Nishi , Hiroto Ishikawa
Inventor： Motoo Takada , Shinya Kikegawa , Toshimasa Nishi , Hiroto Ishikawa
CPC classification number: G02B5/285
Abstract: Optical multilayer thin-film filters (OMTFFs) are disclosed. An exemplary filter includes a transparent substrate, a multilayer film (MF) on a surface of the substrate, and a top layer. The MF is of alternatingly laminated layers of a high-refractive-index (HRI) material and a low-refractive-index (LRI) material. The top layer is on an uppermost layer of the MF and is of a material having atoms of lower atomic weight than atoms of either the HRI or LRI materials. The OMTFFs are made in a vacuum environment by alternatingly laminating respective thin films of the HRI and LRI materials on the substrate. The top layer is formed on the MF. Between forming the MF and top layer is a suppression step in which the newly formed MF is exposed to moisture by briefly venting the vacuum to atmosphere. The moisture inhibits migration of the low-molecular-weight atoms into the HRI and LRI materials.
Abstract translation: 公开了多层薄膜滤光片（OMTFF）。 示例性滤光器包括透明基板，在基板的表面上的多层膜（MF）和顶层。 MF是高折射率（HRI）材料和低折射率（LRI）材料的交替叠层的层。 顶层位于MF的最上层，并且具有比HRI或LRI材料的原子低的原子的原子的材料。 OMTFF在真空环境中通过在衬底上交替地层压HRI和LRI材料的各个薄膜来制成。 顶层形成在MF上。 在形成MF和顶层之间是通过将真空短暂地排放到大气中而使新形成的MF暴露于水分的抑制步骤。 水分抑制低分子量原子迁移到HRI和LRI材料中。
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公开(公告)号：US20120064315A1
公开(公告)日：2012-03-15
申请号：US13293057
申请日：2011-11-09
Applicant: Shinya Kikegawa , Toshimasa Nishi , Motoo Takada
Inventor： Shinya Kikegawa , Toshimasa Nishi , Motoo Takada
CPC classification number: C23C14/541 , C23C14/505 , Y10T428/12396 , Y10T428/24479 , Y10T428/24942 , Y10T428/2495
Abstract: Optical thin-films are disclosed that are formed from optical thin films formed on a base plate arranged in a vacuum chamber. The base plates are held on a plurality of retaining frames of a base-plate retainer. The thin films are formed by heating the base plate and emitting a deposition material from a deposition source. The retaining frames are configured to make the entire base plate uniformly heated.
Abstract translation: 公开了由布置在真空室中的基板上形成的光学薄膜形成的光学薄膜。 基板被保持在基板固定器的多个保持框架上。 通过加热基板并从沉积源发射沉积材料形成薄膜。 保持框架构造成使整个基板均匀地加热。
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5.发明授权公开(公告)号：US08075947B2
公开(公告)日：2011-12-13
申请号：US12133287
申请日：2008-06-04
Applicant: Shinya Kikegawa , Toshimasa Nishi , Motoo Takada
Inventor： Shinya Kikegawa , Toshimasa Nishi , Motoo Takada
IPC: B05D5/06
CPC classification number: C23C14/541 , C23C14/505 , Y10T428/12396 , Y10T428/24479 , Y10T428/24942 , Y10T428/2495
Abstract: Optical thin-film-forming methods are disclosed that form optical thin film on a base plate arranged in a vacuum chamber. An exemplary method includes the steps of retaining the base plates on a plurality of retaining frames of a base-plate retainer, heating the base plate, and emitting a deposition material from a deposition source. The retaining frames are configured to make the entire base plate uniformly heated.
Abstract translation: 公开了在布置在真空室中的基板上形成光学薄膜的光学薄膜形成方法。 示例性方法包括以下步骤：将基板保持在基板固定器的多个保持框架上，加热基板，以及从沉积源发射沉积材料。 保持框架构造成使整个基板均匀地加热。
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公开(公告)号：US08367191B2
公开(公告)日：2013-02-05
申请号：US13293057
申请日：2011-11-09
Applicant: Shinya Kikegawa , Toshimasa Nishi , Motoo Takada
Inventor： Shinya Kikegawa , Toshimasa Nishi , Motoo Takada
IPC: B32B3/02
CPC classification number: C23C14/541 , C23C14/505 , Y10T428/12396 , Y10T428/24479 , Y10T428/24942 , Y10T428/2495
Abstract: Optical thin-films are disclosed that are formed from optical thin films formed on a base plate arranged in a vacuum chamber. The base plates are held on a plurality of retaining frames of a base-plate retainer. The thin films are formed by heating the base plate and emitting a deposition material from a deposition source. The retaining frames are configured to make the entire base plate uniformly heated.
Abstract translation: 公开了由布置在真空室中的基板上形成的光学薄膜形成的光学薄膜。 基板被保持在基板固定器的多个保持框架上。 通过加热基板并从沉积源发射沉积材料形成薄膜。 保持框架构造成使整个基板均匀地加热。
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7.发明申请OPTICAL THIN-FILM-FORMING METHODS AND APPARATUS, AND OPTICAL ELEMENTS FORMED USING SAME 失效光学薄膜成型方法和装置以及使用其形成的光学元件公开(公告)号：US20080305314A1
公开(公告)日：2008-12-11
申请号：US12133287
申请日：2008-06-04
Applicant: Shinya Kikegawa , Toshimasa Nishi , Motoo Takada
Inventor： Shinya Kikegawa , Toshimasa Nishi , Motoo Takada
CPC classification number: C23C14/541 , C23C14/505 , Y10T428/12396 , Y10T428/24479 , Y10T428/24942 , Y10T428/2495
Abstract: Optical thin-film-forming methods are disclosed that form optical thin film on a base plate arranged in a vacuum chamber. An exemplary method includes the steps of retaining the base plates on a plurality of retaining frames of a base-plate retainer, heating the base plate, and emitting a deposition material from a deposition source. The retaining frames are configured to make the entire base plate uniformly heated.
Abstract translation: 公开了在布置在真空室中的基板上形成光学薄膜的光学薄膜形成方法。 示例性方法包括以下步骤：将基板保持在基板固定器的多个保持框架上，加热基板，以及从沉积源发射沉积材料。 保持框架构造成使整个基板均匀地加热。
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