中科微点-全球专利检索

  1. Login
  2. Sign Up

Search Results

8 records (took 0.024 seconds)

    OPTICAL MULTILAYER THIN-FILM FILTERS AND METHODS FOR MANUFACTURING SAME
    1.
    发明申请
    OPTICAL MULTILAYER THIN-FILM FILTERS AND METHODS FOR MANUFACTURING SAME 失效
    光学薄膜薄膜过滤器及其制造方法

    公开(公告)号：US20090153971A1

    公开(公告)日：2009-06-18

    申请号：US12330421

    申请日：2008-12-08

    Applicant: Motoo Takada ,  Shinya Kikegawa ,  Toshimasa Nishi ,  Hiroto Ishikawa

    Inventor： Motoo Takada ,  Shinya Kikegawa ,  Toshimasa Nishi ,  Hiroto Ishikawa

    IPC: G02B5/28 ,  B05D5/06

    CPC classification number: G02B5/285

    Abstract: Optical multilayer thin-film filters (OMTFFs) are disclosed. An exemplary filter includes a transparent substrate, a multilayer film (MF) on a surface of the substrate, and a top layer. The MF is of alternatingly laminated layers of a high-refractive-index (HRI) material and a low-refractive-index (LRI) material. The top layer is on an uppermost layer of the MF and is of a material having atoms of lower atomic weight than atoms of either the HRI or LRI materials. The OMTFFs are made in a vacuum environment by alternatingly laminating respective thin films of the HRI and LRI materials on the substrate. The top layer is formed on the MF. Between forming the MF and top layer is a suppression step in which the newly formed MF is exposed to moisture by briefly venting the vacuum to atmosphere. The moisture inhibits migration of the low-molecular-weight atoms into the HRI and LRI materials.

    Abstract translation: 公开了多层薄膜滤光片（OMTFF）。 示例性滤光器包括透明基板，在基板的表面上的多层膜（MF）和顶层。 MF是高折射率（HRI）材料和低折射率（LRI）材料的交替叠层的层。 顶层位于MF的最上层，并且具有比HRI或LRI材料的原子低的原子的原子的材料。 OMTFF在真空环境中通过在衬底上交替地层压HRI和LRI材料的各个薄膜来制成。 顶层形成在MF上。 在形成MF和顶层之间是通过将真空短暂地排放到大气中而使新形成的MF暴露于水分的抑制步骤。 水分抑制低分子量原子迁移到HRI和LRI材料中。

    HEARTH LINER FOR OPTICAL THIN FILM FORMATION
    2.
    发明申请
    HEARTH LINER FOR OPTICAL THIN FILM FORMATION 审中-公开
    用于光薄膜形成的心形衬垫

    公开(公告)号：US20130107369A1

    公开(公告)日：2013-05-02

    申请号：US13454025

    申请日：2012-04-23

    Applicant: KEN SEKI ,  TOSHIMASA NISHI ,  HIROTO ISHIKAWA

    Inventor： KEN SEKI ,  TOSHIMASA NISHI ,  HIROTO ISHIKAWA

    IPC: B05C11/00 ,  G02B5/22

    CPC classification number: B05C11/00 ,  C23C14/243 ,  C23C14/30 ,  G02B5/22 ,  Y10T428/24479 ,  Y10T428/24628

    Abstract: In a hearth liner wherein an evaporation material is adhered to a substrate to form an optical thin film thereon, the present invention is directed to prevent bumping (splashing) when the evaporation material is irradiated by an electron beam from an electron gun to melt and vaporize thereof. A hearth liner of a vacuum evaporation apparatus wherein the electron beam from the electron gun is irradiated on the evaporation material to form an optical thin film on a substrate, wherein the cross-section shape of an evaporation material storage part of the hearth liner is a shallow semicircular (spherical) shape (bowl shape).

    Abstract translation: 在其中蒸发材料粘附到基底以在其上形成光学薄膜的炉底衬里中，本发明涉及当蒸发材料被来自电子枪的电子束照射以熔化和蒸发时防止碰撞（飞溅） 其中。 一种真空蒸发装置的炉床衬里，其中来自电子枪的电子束照射在蒸发材料上，以在衬底上形成光学薄膜，其中炉床衬里的蒸发材料储存部分的横截面形状为 浅半圆形（球形）（碗形）。

    Optical thin-films and optical elements comprising same
    3.
    发明授权
    Optical thin-films and optical elements comprising same 失效
    光学薄膜和包含该薄膜的光学元件

    公开(公告)号：US08367191B2

    公开(公告)日：2013-02-05

    申请号：US13293057

    申请日：2011-11-09

    Applicant: Shinya Kikegawa ,  Toshimasa Nishi ,  Motoo Takada

    Inventor： Shinya Kikegawa ,  Toshimasa Nishi ,  Motoo Takada

    IPC: B32B3/02

    CPC classification number: C23C14/541 ,  C23C14/505 ,  Y10T428/12396 ,  Y10T428/24479 ,  Y10T428/24942 ,  Y10T428/2495

    Abstract: Optical thin-films are disclosed that are formed from optical thin films formed on a base plate arranged in a vacuum chamber. The base plates are held on a plurality of retaining frames of a base-plate retainer. The thin films are formed by heating the base plate and emitting a deposition material from a deposition source. The retaining frames are configured to make the entire base plate uniformly heated.

    Abstract translation: 公开了由布置在真空室中的基板上形成的光学薄膜形成的光学薄膜。 基板被保持在基板固定器的多个保持框架上。 通过加热基板并从沉积源发射沉积材料形成薄膜。 保持框架构造成使整个基板均匀地加热。

    OPTICAL MULTILAYER THIN-FILM FILTERS AND METHODS FOR MANUFACTURING SAME
    5.
    发明申请
    OPTICAL MULTILAYER THIN-FILM FILTERS AND METHODS FOR MANUFACTURING SAME 审中-公开
    光学薄膜薄膜过滤器及其制造方法

    公开(公告)号：US20120263872A1

    公开(公告)日：2012-10-18

    申请号：US13532028

    申请日：2012-06-25

    Applicant: Motoo TAKADA ,  Shinya KIKEGAWA ,  Toshimasa NISHI ,  Hiroto ISHIKAWA

    Inventor： Motoo TAKADA ,  Shinya KIKEGAWA ,  Toshimasa NISHI ,  Hiroto ISHIKAWA

    IPC: B05D5/06

    CPC classification number: G02B5/285

    Abstract: Optical multilayer thin-film filters (OMTFFs) are disclosed. An exemplary filter includes a transparent substrate, a multilayer film (MF) on a surface of the substrate, and a top layer. The MF is of alternatingly laminated layers of a high-refractive-index (HRI) material and a low-refractive-index (LRI) material. The top layer is on an uppermost layer of the MF and is of a material having atoms of lower atomic weight than atoms of either the HRI or LRI materials. The OMTFFs are made in a vacuum environment by alternatingly laminating respective thin films of the HRI and LRI materials on the substrate. The top layer is formed on the MF. Between forming the MF and top layer is a suppression step in which the newly formed MF is exposed to moisture by briefly venting the vacuum to atmosphere. The moisture inhibits migration of the low-molecular-weight atoms into the HRI and LRI materials.

    Abstract translation: 公开了多层薄膜滤光片（OMTFF）。 示例性滤光器包括透明基板，在基板的表面上的多层膜（MF）和顶层。 MF是高折射率（HRI）材料和低折射率（LRI）材料的交替叠层的层。 顶层位于MF的最上层，并且具有比HRI或LRI材料的原子低的原子的原子的材料。 OMTFF在真空环境中通过在衬底上交替地层压HRI和LRI材料的各个薄膜来制成。 顶层形成在MF上。 在形成MF和顶层之间是通过将真空短暂地排放到大气中而使新形成的MF暴露于水分的抑制步骤。 水分抑制低分子量原子迁移到HRI和LRI材料中。

    Optical multilayer thin-film filters and methods for manufacturing same
    6.
    发明授权
    Optical multilayer thin-film filters and methods for manufacturing same 失效
    光学多层薄膜滤光片及其制造方法

    公开(公告)号：US08233219B2

    公开(公告)日：2012-07-31

    申请号：US12330421

    申请日：2008-12-08

    Applicant: Motoo Takada ,  Shinya Kikegawa ,  Toshimasa Nishi ,  Hiroto Ishikawa

    Inventor： Motoo Takada ,  Shinya Kikegawa ,  Toshimasa Nishi ,  Hiroto Ishikawa

    IPC: G02B1/10 ,  G02B5/28 ,  H04N5/225

    CPC classification number: G02B5/285

    Abstract: Optical multilayer thin-film filters (OMTFFs) are disclosed. An exemplary filter includes a transparent substrate, a multilayer film (MF) on a surface of the substrate, and a top layer. The MF is of alternatingly laminated layers of a high-refractive-index (HRI) material and a low-refractive-index (LRI) material. The top layer is on an uppermost layer of the MF and is of a material having atoms of lower atomic weight than atoms of either the HRI or LRI materials. The OMTFFs are made in a vacuum environment by alternatingly laminating respective thin films of the HRI and LRI materials on the substrate. The top layer is formed on the MF. Between forming the MF and top layer is a suppression step in which the newly formed MF is exposed to moisture by briefly venting the vacuum to atmosphere. The moisture inhibits migration of the low-molecular-weight atoms into the HRI and LRI materials.

    Abstract translation: 公开了多层薄膜滤光片（OMTFF）。 示例性滤光器包括透明基板，在基板的表面上的多层膜（MF）和顶层。 MF是高折射率（HRI）材料和低折射率（LRI）材料的交替叠层的层。 顶层位于MF的最上层，并且具有比HRI或LRI材料的原子低的原子的原子的材料。 OMTFF在真空环境中通过在衬底上交替地层压HRI和LRI材料的各个薄膜来制成。 顶层形成在MF上。 在形成MF和顶层之间是通过将真空短暂地排放到大气中而使新形成的MF暴露于水分的抑制步骤。 水分抑制低分子量原子迁移到HRI和LRI材料中。

Patent Agency Ranking