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公开(公告)号：US08110321B2
公开(公告)日：2012-02-07
申请号：US11749384
申请日：2007-05-16
申请人： Kevin S. Petrarca , Donald F. Canaperi , Mahadevaiyer Krishnan , Rebecca D. Mih , Steven Steen , Henry Grabarz , Michael S. Hibbs
发明人： Kevin S. Petrarca , Donald F. Canaperi , Mahadevaiyer Krishnan , Rebecca D. Mih , Steven Steen , Henry Grabarz , Michael S. Hibbs
摘要： A method for manufacturing an optical projection reticle employs a damascene process. First feature recesses are etched into a projection reticle mask plate which is transmissive or transparent. Then feature recesses are tilled with a radiation transmissivity modifying material comprising a partially transmissive material and/or a radiation absorber for absorbing actinic radiation. Sacrificial materials may be added to the recess temporarily prior to filling the recess to provide gaps juxtaposed with the material filling the recess. Thereafter, the sacrificial materials are removed. Then the projection mask is planarized leaving feature recesses filled with transmissivity modifying material, and any gaps desired. The projection mask is planarized while retained in a fixture holding it in place during polishing with a polishing tool and a slurry.
摘要翻译： 光学投影掩模版的制造方法采用镶嵌工艺。 第一特征凹槽被蚀刻到透射或透明的突出掩模掩模板中。 然后，特征凹部用包括用于吸收光化辐射的部分透射材料和/或辐射吸收体的辐射透射率改性材料研磨。 牺牲材料可以在填充凹部之前临时添加到凹部中，以提供与填充凹部的材料并置的间隙。 此后，去除牺牲材料。 然后将投影掩模平坦化，留下填充有透射率改性材料的特征凹部，以及任何期望的间隙。 投影面罩被平坦化，同时保持在用抛光工具和浆料抛光过程中将其固定在位置的夹具中。
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公开(公告)号：US20120040277A1
公开(公告)日：2012-02-16
申请号：US13278571
申请日：2011-10-21
申请人： Kevin S. Petrarca , Donald F. Canaperi , Mahadevaiyer Krishnan , Rebecca D. Mih , Steven Steen , Henry Grabarz , Michael S. Hibbs
发明人： Kevin S. Petrarca , Donald F. Canaperi , Mahadevaiyer Krishnan , Rebecca D. Mih , Steven Steen , Henry Grabarz , Michael S. Hibbs
摘要： A reticle carrier for a polishing tool capable of accommodating a reticle includes a base plate with an obverse and reverse surfaces, a retaining ring secured to the obverse surface of the base plate forming a recess defined by the obverse surface of the rigid base plate and internal edges of the retaining ring. A reticle pad supports a reticle in the recess. The base plate and the reticle pad having an array of matching, aligned passageway holes therethrough for exhaustion of air from space between the base plate and a the reticle and for supply of air to that space so a vacuum can retain a the reticle in place on the reticle carrier under vacuum conditions and application of air under pressure can eject a reticle from the reticle carrier.
摘要翻译： 用于能够容纳标线的抛光工具的掩模版载体包括具有正面和反面的基板，固定在基板的正面的保持环，形成由刚性基板的正面限定的凹部和内部 固定环的边缘。 掩模垫在凹槽中支撑掩模版。 基板和标线垫具有一组匹配的对准的通孔，用于从底板和标线板之间的空间排出空气，并将空气供给到该空间，因此真空可以将该掩模版保持在适当的位置上 在真空条件下的掩模版载体和在压力下施加空气可以从掩模版载体喷出掩模版。
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公开(公告)号：US20080286660A1
公开(公告)日：2008-11-20
申请号：US11749384
申请日：2007-05-16
申请人： Kevin S. Petrarca , Donald F. Canaperi , Mahadevaiyer Krishnan , Rebecca D. Mih , Steven Steen , Henry Grabarz , Michael S. Hibbs
发明人： Kevin S. Petrarca , Donald F. Canaperi , Mahadevaiyer Krishnan , Rebecca D. Mih , Steven Steen , Henry Grabarz , Michael S. Hibbs
摘要： A method for manufacturing an optical projection reticle employs a damascene process. First feature recesses are etched into a projection reticle mask plate which is transmissive or transparent. Then feature recesses are tilled with a radiation transmissivity modifying material comprising a partially transmissive material and/or a radiation absorber for absorbing actinic radiation. Sacrificial materials may be added to the recess temporarily prior to filling the recess to provide gaps juxtaposed with the material filling the recess. Thereafter, the sacrificial materials are removed. Then the projection mask is planarized leaving feature recesses filled with transmissivity modifying material, and any gaps desired. The projection mask is planarized while retained in a fixture holding it in place during polishing with a polishing tool and a slurry.
摘要翻译： 光学投影掩模版的制造方法采用镶嵌工艺。 第一特征凹槽被蚀刻到透射或透明的突出掩模掩模板中。 然后，特征凹部用包括用于吸收光化辐射的部分透射材料和/或辐射吸收体的辐射透射率改性材料研磨。 牺牲材料可以在填充凹部之前临时添加到凹部中，以提供与填充凹部的材料并置的间隙。 此后，去除牺牲材料。 然后将投影掩模平坦化，留下填充有透射率改性材料的特征凹部，以及任何期望的间隙。 投影面罩被平坦化，同时保持在用抛光工具和浆料抛光过程中将其固定在位置的夹具中。
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公开(公告)号：US08439728B2
公开(公告)日：2013-05-14
申请号：US13278571
申请日：2011-10-21
申请人： Kevin S. Petrarca , Donald F. Canaperi , Mahadevaiyer Krishnan , Rebecca D. Mih , Steven Steen , Henry Grabarz , Michael S. Hibbs
发明人： Kevin S. Petrarca , Donald F. Canaperi , Mahadevaiyer Krishnan , Rebecca D. Mih , Steven Steen , Henry Grabarz , Michael S. Hibbs
IPC分类号： B24B41/06
摘要： A reticle carrier for a polishing tool capable of accommodating a reticle includes a base plate with an obverse and reverse surfaces, a retaining ring secured to the obverse surface of the base plate forming a recess defined by the obverse surface of the rigid base plate and internal edges of the retaining ring. A reticle pad supports a reticle in the recess. The base plate and the reticle pad having an array of matching, aligned passageway holes therethrough for exhaustion of air from space between the base plate and a the reticle and for supply of air to that space so a vacuum can retain a the reticle in place on the reticle carrier under vacuum conditions and application of air under pressure can eject a reticle from the reticle carrier.
摘要翻译： 用于能够容纳标线的抛光工具的掩模版载体包括具有正面和反面的基板，固定在基板的正面的保持环，形成由刚性基板的正面限定的凹部和内部 固定环的边缘。 掩模垫在凹槽中支撑掩模版。 基板和标线垫具有一组匹配的对准的通孔，用于从底板和标线板之间的空间排出空气，并将空气供给到该空间，因此真空可以将该掩模版保持在适当的位置上 在真空条件下的掩模版载体和在压力下施加空气可以从掩模版载体喷出掩模版。
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公开(公告)号：US20070212654A1
公开(公告)日：2007-09-13
申请号：US11371820
申请日：2006-03-09
申请人： Carl Larson , Sharee McNab , Steven Steen , Raman Viswanathan , Gregory Wallraff
发明人： Carl Larson , Sharee McNab , Steven Steen , Raman Viswanathan , Gregory Wallraff
IPC分类号： G03F7/20
CPC分类号： G03F7/2022
摘要： A method of lithography is disclosed, which allows for independent resist process optimization of two or more exposure steps that are performed on a single resist layer. By providing for a separate post-exposure bake after each resist exposure step, pattern resolution for each exposure can be optimized. The method can generally be used with different lithographic techniques, and is well-suited for hybrid lithography. It has been applied to the fabrication of a device, in which the active area and the gate levels are defined in separate mask levels using hybrid lithography with an e-beam source and a 248 nm source respectively. Conditions for post-exposure bakes after the two exposure steps are independently adjusted to provide for optimized results.
摘要翻译： 公开了一种光刻方法，其允许在单个抗蚀剂层上执行的两个或多个曝光步骤的独立抗蚀剂工艺优化。 通过在每个抗蚀剂曝光步骤之后提供单独的曝光后烘烤，可以优化每个曝光的图案分辨率。 该方法通常可以用于不同的光刻技术，并且非常适用于混合光刻。 已经将其应用于器件的制造，其中使用具有电子束源和248nm源的混合光刻将有源面积和栅极电平限定在分开的掩模级中。 独立调整两次曝光步骤后暴露后烘烤条件以提供优化结果。
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