Process for forming patterned dielectric oxide films
    1.
    发明授权
    Process for forming patterned dielectric oxide films 失效
    用于形成图案化电介质氧化膜的工艺

    公开(公告)号:US5976625A

    公开(公告)日:1999-11-02

    申请号:US56133

    申请日:1998-04-07

    IPC分类号: H01L21/316 B05D5/12 B05D1/36

    CPC分类号: H01L21/316 Y10S438/974

    摘要: A method for forming a dielectric oxide layer on selected areas of a substrate is disclosed. The dielectric oxide layer is formed on selected areas of the substrate using a sol process. The substrate has an area of a first material and an area of a second material which is different from the first. The first material is coated with a layer of a first compound. The layer of the first compound has a hydrophobic top surface. The second material is coated with a layer of a second compound. The layer of the second compound has a hydrophilic top surface. A layer of hydrous oxide is formed over the second compound by applying an aqueous sol solution on the surface of the substrate. The substrate is then heated to remove the first compound and the second compound from the surface of the substrate. Thereafter, the substrate with the layer of hydrous oxide thereon, is sintered to form the dielectric oxide layer.

    摘要翻译: 公开了一种在衬底的选定区域上形成电介质氧化物层的方法。 电介质氧化物层使用溶胶法在衬底的选定区域上形成。 基板具有第一材料的区域和与第一材料不同的第二材料的区域。 第一材料涂覆有第一化合物层。 第一化合物的层具有疏水性顶表面。 第二材料涂覆有第二化合物层。 第二化合物的层具有亲水性顶表面。 通过在基材的表面上施加水溶胶溶液,在第二化合物上形成一层含水氧化物。 然后加热衬底以从衬底的表面除去第一化合物和第二化合物。 此后,将其上含有氧化氢层的基材烧结以形成电介质氧化物层。

    Method for forming article using sol-gel processing
    3.
    发明授权
    Method for forming article using sol-gel processing 失效
    使用溶胶 - 凝胶加工成型制品的方法

    公开(公告)号:US06209357B1

    公开(公告)日:2001-04-03

    申请号:US09280588

    申请日:1999-03-29

    IPC分类号: C03B802

    摘要: A silica body useful for forming an optical fiber preform exhibits an ultimate strength of at least 20 MPa at 10 wt. % water loss. The body attains this strength, it is believed, by precipitation of silica at the contact sites of adjacent silica particles, thereby forming neck regions. The resultant network provides the strength to the gel body, such that the body is capable of being dried under more severe conditions than a gel body formed by previous sol-gel methods and is also more robust toward handling. The controlled precipitation is attained by inducing gelation and initiating drying at a pH of about 10.5 or higher, at which silica remains highly soluble. By gelling and drying at this pH level, the solubilized silica appears to precipitate in a controlled manner at the point of contact of adjacent silica particles, since such sites are the minimum free energy sites for precipitation.

    摘要翻译: 用于形成光纤预制件的二氧化硅体在10重量%时显示出至少20MPa的极限强度。 %失水。 通过在相邻的二氧化硅粒子的接触部位析出二氧化硅,能够达到这个强度,从而形成颈部区域。 所得网络为凝胶体提供强度,使得身体能够在比由先前的溶胶 - 凝胶法形成的凝胶体更恶劣的条件下干燥,并且对于处理也更加坚固。 通过诱导凝胶化并在约10.5或更高的pH下开始干燥来实现受控沉淀,其中二氧化硅保持高度可溶。 通过在该pH水平下凝胶化和干燥,溶解的二氧化硅似乎在相邻二氧化硅颗粒的接触点处以可控的方式沉淀,因为这些位点是沉淀的最小自由能位点。