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公开(公告)号：US06209357B1
公开(公告)日：2001-04-03
申请号：US09280588
申请日：1999-03-29
IPC分类号： C03B802
CPC分类号： C01B33/1417 , C03B19/12 , C03C1/006 , C03C2203/30
摘要： A silica body useful for forming an optical fiber preform exhibits an ultimate strength of at least 20 MPa at 10 wt. % water loss. The body attains this strength, it is believed, by precipitation of silica at the contact sites of adjacent silica particles, thereby forming neck regions. The resultant network provides the strength to the gel body, such that the body is capable of being dried under more severe conditions than a gel body formed by previous sol-gel methods and is also more robust toward handling. The controlled precipitation is attained by inducing gelation and initiating drying at a pH of about 10.5 or higher, at which silica remains highly soluble. By gelling and drying at this pH level, the solubilized silica appears to precipitate in a controlled manner at the point of contact of adjacent silica particles, since such sites are the minimum free energy sites for precipitation.
摘要翻译： 用于形成光纤预制件的二氧化硅体在10重量％时显示出至少20MPa的极限强度。 ％失水。 通过在相邻的二氧化硅粒子的接触部位析出二氧化硅，能够达到这个强度，从而形成颈部区域。 所得网络为凝胶体提供强度，使得身体能够在比由先前的溶胶 - 凝胶法形成的凝胶体更恶劣的条件下干燥，并且对于处理也更加坚固。 通过诱导凝胶化并在约10.5或更高的pH下开始干燥来实现受控沉淀，其中二氧化硅保持高度可溶。 通过在该pH水平下凝胶化和干燥，溶解的二氧化硅似乎在相邻二氧化硅颗粒的接触点处以可控的方式沉淀，因为这些位点是沉淀的最小自由能位点。
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公开(公告)号：US5976625A
公开(公告)日：1999-11-02
申请号：US56133
申请日：1998-04-07
IPC分类号： H01L21/316 , B05D5/12 , B05D1/36
CPC分类号： H01L21/316 , Y10S438/974
摘要： A method for forming a dielectric oxide layer on selected areas of a substrate is disclosed. The dielectric oxide layer is formed on selected areas of the substrate using a sol process. The substrate has an area of a first material and an area of a second material which is different from the first. The first material is coated with a layer of a first compound. The layer of the first compound has a hydrophobic top surface. The second material is coated with a layer of a second compound. The layer of the second compound has a hydrophilic top surface. A layer of hydrous oxide is formed over the second compound by applying an aqueous sol solution on the surface of the substrate. The substrate is then heated to remove the first compound and the second compound from the surface of the substrate. Thereafter, the substrate with the layer of hydrous oxide thereon, is sintered to form the dielectric oxide layer.
摘要翻译： 公开了一种在衬底的选定区域上形成电介质氧化物层的方法。 电介质氧化物层使用溶胶法在衬底的选定区域上形成。 基板具有第一材料的区域和与第一材料不同的第二材料的区域。 第一材料涂覆有第一化合物层。 第一化合物的层具有疏水性顶表面。 第二材料涂覆有第二化合物层。 第二化合物的层具有亲水性顶表面。 通过在基材的表面上施加水溶胶溶液，在第二化合物上形成一层含水氧化物。 然后加热衬底以从衬底的表面除去第一化合物和第二化合物。 此后，将其上含有氧化氢层的基材烧结以形成电介质氧化物层。
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公开(公告)号：US06555411B1
公开(公告)日：2003-04-29
申请号：US10024831
申请日：2001-12-18
IPC分类号： H01L540
CPC分类号： H01L51/0021 , H01L21/2885 , H01L51/0541 , H01L51/102
摘要： The specification describes thin film transistor (TFT) devices with source/drain contacts made by a metallo organic deposition (MOD) method wherein a metallo organic compound/metal particulate mixture is deposited to form a base pattern, and the base pattern is then plated with gold. The porous, relatively high resistance base pattern is thereby converted to a corrosion resistant, low resistance contact. The plating covers the sidewalls of the base pattern, thus allowing the final channel length to be less than the minimum design rule used for depositing the base pattern.
摘要翻译： 本说明书描述了具有通过金属有机沉积（MOD）方法制造的源极/漏极触点的薄膜晶体管（TFT）器件，其中沉积金属有机化合物/金属颗粒混合物以形成基底图案，然后将基底图案镀覆 金。 因此，多孔，较高电阻的基底图案被转变成耐腐蚀，低电阻的接触。 电镀覆盖基底图案的侧壁，从而允许最终通道长度小于用于沉积基底图案的最小设计规则。
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4.发明授权Method for coating an article with a ladder siloxane polymer and coated article 有权用梯状硅氧烷聚合物和涂层制品涂覆制品的方法公开(公告)号：US06251486B1
公开(公告)日：2001-06-26
申请号：US09352674
申请日：1999-07-11
IPC分类号： B05D512
CPC分类号： C09D183/04 , C03C17/30 , C03C25/106 , C03C25/40 , C08G77/04 , C08K5/07 , C08K5/5317 , Y10T428/249953 , Y10T428/2962 , C08L83/04 , C08L83/00 , C08L2666/28
摘要： An improved siloxane-based composition for use as a low &kgr; dielectric material in integrated circuit applications is provided, the composition exhibiting desirable thermal mechanical stability compared to conventional siloxane-based low-&kgr; compositions. Specifically, the invention provides a modified methylsilsesquioxane composition suitable for higher temperature applications than a composition formed from only methylsilsesquioxane. The modified oligomer is characterized by the pendant group ratio A:B:C, where A represents the percentage of pendant groups that are methyl and is about 13 to about 67, B represents the percentage of pendant groups that are dimethyl and is greater than 0 to about 33, and C represents the percentage of pendant groups that are phenyl and is greater than 0 to about 67. The presence of dimethyl and phenyl pendant groups provides a molecular structure that has improved crack-resistance compared to an all-methyl silsesquioxane. Advantageously, the modified methylsilsesquioxane oligomer is fabricated by a particular technique, involving mixing methyltriethoxysilane monomer, before hydrolysis and condensation, with dimethyldiethoxysilane monomer that has already been partially hydrolyzed and condensed. This technique further improves the thermal mechanical stability of the resultant cured material. For low &kgr; integrated circuit application, a pore generator material is advantageously used to provide a porous final structure.
摘要翻译： 提供了一种用于集成电路应用中的低κ电介质材料的改进的基于硅氧烷的组合物，与常规的基于硅氧烷的低kappa组合物相比，该组合物具有所需的热机械稳定性。 具体地说，本发明提供了比仅由甲基倍半硅氧烷形成的组合物适用于更高温度应用的改性甲基倍半硅氧烷组合物。 改性低聚物的特征在于侧基组比A：B：C，其中A表示甲基侧基的百分比，约为13至约67，B表示二甲基侧链的百分比并且大于0 至约33，C表示苯基侧基的百分比，并且大于0至约67.二甲基和苯基侧基的存在提供了与全甲基倍半硅氧烷相比具有改善的抗裂性的分子结构。 有利地，通过特殊技术制造改性甲基倍半硅氧烷低聚物，包括在水解和缩合之前将甲基三乙氧基硅烷单体与已经部分水解和缩合的二甲基二乙氧基硅烷单体混合。 该技术进一步提高所得固化材料的热机械稳定性。 对于低kappa集成电路应用，孔发生器材料有利地用于提供多孔的最终结构。
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公开(公告)号：US6007727A
公开(公告)日：1999-12-28
申请号：US036715
申请日：1998-03-06
申请人： Michael Philip Bohrer , Edwin Arthur Chandross , David Anton Mixon , Linda A. Psota-Kelty , Dennis J. Trevor
发明人： Michael Philip Bohrer , Edwin Arthur Chandross , David Anton Mixon , Linda A. Psota-Kelty , Dennis J. Trevor
CPC分类号： C02F1/722 , Y10S210/903 , Y10S210/908
摘要： It has been found that in sol-gel processes utilizing TMAH, it is possible to treat a trimethylamine (TRIMA)-containing solution with hydrogen peroxide to form trimethylamine oxide--(CH.sub.3).sub.3 N.sup.+ --O.sup.- (TRIMAO), a water soluble compound which is less volatile and less odorous than TRIMA, and which is capable of being sent to a standard wastewater treatment plant. The hydrogen peroxide is generally added to the TRIMA-containing solution in a H.sub.2 O.sub.2 :TRIMA ratio of at least 3:1, advantageously at least 10:1. Because of the resultant TRIMAO solution's ability to be sent to a standard wastewater treatment facility, improved productivity and lowered expense of the overall fiber fabrication process are obtained. The invention is also suitable for treatment of triethylamine.
摘要翻译： 已经发现，在使用TMAH的溶胶 - 凝胶法中，可以用过氧化氢处理含三甲胺（TRIMA）的溶液，形成三甲胺氧化物 - （CH 3）3 N + -O-（TRIMAO），这是一种水溶性化合物， 与TRIMA相比，挥发性低，气味较差，能够被送到标准废水处理厂。 过氧化氢通常以至少3:1，有利地至少10:1的H 2 O 2：TRIMA比加到含TRIMA的溶液中。 由于所得到的TRIMAO解决方案能够被送到标准废水处理设备，因此获得了整个纤维制造工艺的提高的生产率和降低的费用。 本发明也适用于治疗三乙胺。
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6.发明授权Energy-sensitive resist material and a process for device fabrication using an energy-sensitive resist material 失效能量敏感抗蚀剂材料和使用能量敏感抗蚀剂材料的器件制造方法
公开(公告)号：US5879857A
公开(公告)日：1999-03-09
申请号：US813732
申请日：1997-03-07
申请人： Edwin Arthur Chandross , Francis Michael Houlihan , Omkaram Nalamasu , Elsa Reichmanis , Thomas Ingolf Wallow
发明人： Edwin Arthur Chandross , Francis Michael Houlihan , Omkaram Nalamasu , Elsa Reichmanis , Thomas Ingolf Wallow
IPC分类号： G03F7/004 , G03F7/039 , H01L21/027 , G03C5/00 , G03C1/492
CPC分类号： G03F7/039 , G03F7/0045 , Y10S430/111
摘要： A process for device fabrication and resist materials that are used in the process are disclosed. The resist material contains a polymer in combination with a dissolution inhibitor and a photoacid generator (PAG). The dissolution inhibitor is the condensation reaction product of a saturated polycyclic hydrocarbon compound with at least one hydroxy (OH) substituent and a difunctional saturated linear, branched, or cyclic hydrocarbon compound wherein the functional groups are either carboxylic acid or carboxylic acid chloride groups. The condensation product has at least two polycylic moieties. The polymer optionally has acid labile groups pendant thereto which significantly decrease the solubility of the polymer in a solution of aqueous base. A film of the resist material is formed on a substrate and exposed to delineating radiation. The radiation induces a chemical change in the resist material rendering the exposed resist material substantially more soluble in aqueous base solution than the unexposed portion of the resist material. The image introduced into the resist material is developed using conventional techniques, and the resulting pattern is then transferred into the underlying substrate.
摘要翻译： 公开了一种在该方法中使用的器件制造和抗蚀材料的方法。 抗蚀剂材料包含与溶解抑制剂和光酸产生剂（PAG）组合的聚合物。 溶解抑制剂是饱和多环烃化合物与至少一种羟基（OH）取代基和双官能饱和直链，支链或环状烃化合物的缩合反应产物，其中官能团是羧酸或羧酰氯基团。 缩合产物具有至少两个多环部分。 聚合物任选地具有垂饰的酸不稳定基团，其显着降低聚合物在碱性水溶液中的溶解度。 抗蚀剂材料的膜形成在基板上并暴露于描绘辐射。 辐射引起抗蚀剂材料中的化学变化，使得暴露的抗蚀剂材料比抗蚀剂材料的未曝光部分基本上更溶于碱性水溶液。 使用常规技术开发引入抗蚀剂材料的图像，然后将所得到的图案转移到下面的基底中。
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公开(公告)号：US6160645A
公开(公告)日：2000-12-12
申请号：US427421
申请日：1999-10-26
CPC分类号： G03H1/0252 , B32B17/10036 , G03H1/02 , G03H1/181 , G03H1/182 , G03H2001/0482 , G03H2001/0497 , G03H2250/37 , G03H2260/12 , G03H2270/22
摘要： A holographic medium uses a photosensitive polymer medium. The shelf life of the photosensitive polymer medium is improved by hermetically sealing the polymer between glass plates. The hermetic seal is designed so that high T.sub.g materials, or solder, can be used as the sealant without damage to the polymer already contained between the plates. The hermetic seal comprises metal foils attached to the plates with the edges thereof extending away from the plates in tab-like fashion. The foils are attached prior to filling the assembly with polymer. After filling, the outer edges of the foil tabs are the sealed with local heating away from the site of the polymer, or crimped using mechanical crimping.
摘要翻译： 全息介质使用光敏聚合物介质。 通过在玻璃板之间密封聚合物来改善光敏聚合物介质的保质期。 气密密封设计成使得高Tg材料或焊料可以用作密封剂而不损坏已经包含在板之间的聚合物。 气密密封件包括附着在板上的金属箔，其边缘以片状方式从板延伸。 在用聚合物填充组件之前将箔连接。 填充后，箔片的外边缘是密封的，局部加热远离聚合物的位置，或使用机械卷曲卷曲。
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8.发明授权
公开(公告)号：US3998993A
公开(公告)日：1976-12-21
申请号：US584869
申请日：1975-06-09
IPC分类号： B05D7/14 , B05D7/16 , B23K35/22 , C09D5/08 , C09D133/04 , C09D155/00 , C23C22/00 , C23C22/63 , C23C22/68 , C23F11/00 , B32B15/08 , B32B27/00
CPC分类号： B05D7/16 , B23K35/226 , C23C22/68 , Y10T428/31692 , Y10T428/31699
摘要： Electrical device having a metal surface to at least a portion of which electrical connections are to be made by soldering, and having a coating on said portion which protects it against surface alteration which would tend to render such soldering more difficult but through which coating soldering can be effected, said coating comprising a polymer of at least one methacrylate of the general formula ##STR1## wherein R is selected from the group comprising alkyl radicals having from 1-6 carbon atoms and a glycidyl radical.
摘要翻译： 具有金属表面的电气设备至少部分地通过焊接进行电连接，并且在所述部分上具有保护其免受表面改变的涂层，这将导致这种焊接更困难，但是通过该涂层焊接可以 所述涂层包含至少一种通式为“IMAGE”的甲基丙烯酸酯的聚合物，其中R选自具有1-6个碳原子的烷基和缩水甘油基。
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9.发明授权Photorecording medium, process for fabricating medium, and process for holography using medium 失效光记录介质，介质制造工艺，以及使用介质的全息技术的处理公开(公告)号：US06627354B1
公开(公告)日：2003-09-30
申请号：US09259973
申请日：1999-03-01
IPC分类号： G03H104
摘要： A photorecording medium contains a polymeric matrix, typically cross-linked to provide a desired level of physical stability, and a photoimageable system containing a photoactive monomer. Unlike previous polymer media, which tend to contain a substantially homogeneous dispersion of photoimageable system and matrix polymer, the matrix and photoimageable system of the invention are phase separated, yet still exhibit low light scattering such that useful holographic properties are possible.
摘要翻译： 光记录介质包含通常交联以提供期望水平的物理稳定性的聚合物基质和含有光活性单体的可光成像的体系。 不同于以前的聚合物介质，其倾向于包含可光成像系统和基质聚合物的基本上均匀的分散体，本发明的基质和可光成像系统是相分离的，但仍然表现出低光散射，使得有用的全息性质是可能的。
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公开(公告)号：US06382807B1
公开(公告)日：2002-05-07
申请号：US09897671
申请日：2001-07-02
IPC分类号： G02B508
CPC分类号： G02B5/08
摘要： A reflective element, such as a mirror, includes a substrate and a reflective layer formed thereon. The substrate comprises at least one thixotropic metal alloy, which is injected into a mold to form the shape desired for the reflective element. The reflective element may also include an interface layer comprising a thermoset material, such as an epoxy resin, formed between the substrate and the reflective layer to increase the smoothness of the substrate.
摘要翻译： 诸如反射镜的反射元件包括基板和形成在其上的反射层。 基材包括至少一种触变性金属合金，其被注入到模具中以形成反射元件所需的形状。 反射元件还可以包括形成在基板和反射层之间的包含热固性材料（例如环氧树脂）的界面层，以增加基板的平滑度。
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