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    Retainers and non-abrasive liners used in chemical mechanical polishing
    1.
    发明授权
    Retainers and non-abrasive liners used in chemical mechanical polishing 失效
    用于化学机械抛光的保持器和非研磨衬垫

    公开(公告)号：US06390904B1

    公开(公告)日：2002-05-21

    申请号：US09082891

    申请日：1998-05-21

    申请人： Allan Gleason ,  Manoocher Birang ,  John Prince ,  Mohsen Salek ,  Syed Askari

    发明人： Allan Gleason ,  Manoocher Birang ,  John Prince ,  Mohsen Salek ,  Syed Askari

    IPC分类号： B24B500

    CPC分类号： B24B37/32 ,  H01L21/30625

    摘要： The present invention provides a retaining ring having an resilient liner for protecting the substrate edge from being damaged during chemical mechanical polishing and a method for making the same. Retainers made of wear resistant ceramics, such as alumina, provide better overall performance, including wear resistance, and reduced particle formation than other retaining ring materials. By incorporating a resilient liner, such as an epoxy, on the inner surface of the wear resistant ring, the substrate edge is protected from damage that can be easily caused by the hard surface of the ceramic alone.

    摘要翻译： 本发明提供了一种保持环，其具有用于保护基板边缘在化学机械抛光期间不被损坏的弹性衬垫及其制造方法。 由耐磨陶瓷制成的保持件，如氧化铝，提供比其他保持环材料更好的整体性能，包括耐磨性和减少的颗粒形成。 通过在耐磨环的内表面上并入弹性衬垫，例如环氧树脂，可以保护衬底边缘免受仅由陶瓷硬表面容易引起的损伤。