公开(公告)号：US06390904B1

公开(公告)日：2002-05-21

申请号：US09082891

申请日：1998-05-21

申请人： Allan Gleason ,  Manoocher Birang ,  John Prince ,  Mohsen Salek ,  Syed Askari

发明人： Allan Gleason ,  Manoocher Birang ,  John Prince ,  Mohsen Salek ,  Syed Askari

IPC分类号： B24B500

CPC分类号： B24B37/32 ,  H01L21/30625

摘要： The present invention provides a retaining ring having an resilient liner for protecting the substrate edge from being damaged during chemical mechanical polishing and a method for making the same. Retainers made of wear resistant ceramics, such as alumina, provide better overall performance, including wear resistance, and reduced particle formation than other retaining ring materials. By incorporating a resilient liner, such as an epoxy, on the inner surface of the wear resistant ring, the substrate edge is protected from damage that can be easily caused by the hard surface of the ceramic alone.

摘要翻译： 本发明提供了一种保持环，其具有用于保护基板边缘在化学机械抛光期间不被损坏的弹性衬垫及其制造方法。 由耐磨陶瓷制成的保持件，如氧化铝，提供比其他保持环材料更好的整体性能，包括耐磨性和减少的颗粒形成。 通过在耐磨环的内表面上并入弹性衬垫，例如环氧树脂，可以保护衬底边缘免受仅由陶瓷硬表面容易引起的损伤。

公开(公告)号：US6159087A

公开(公告)日：2000-12-12

申请号：US241910

申请日：1999-02-02

申请人： Manoocher Birang ,  John Prince

发明人： Manoocher Birang ,  John Prince

IPC分类号： B24B53/007 ,  B24B53/017 ,  B24D3/28 ,  B24D11/00 ,  B24B1/00

CPC分类号： B24B53/017 ,  B24D11/001 ,  B24D3/28

摘要： An end effector is provided for conditioning pads used to polish semiconductor wafers. The end effector has a substrate with a matrix (preferably a polymer) disposed thereon. Abrasive particles such as diamond crystals are embedded in the matrix. Preferred particle size and number/spacing is provided for optimal conditioning. The particles are embedded by at least a predetermined amount (e.g., 75%) so as to provide uniform/repeatable conditioning while avoiding dislodged particles. The particles may be embedded such that the tips thereof are coplanar, or such that the profile of diamond tips form a plurality of curved regions. A method for checking end effector quality is also provided.

摘要翻译： 提供端部执行器用于调整用于抛光半导体晶片的衬垫。 末端执行器具有设置在其上的基体（优选聚合物）的基底。 磨料颗粒如金刚石晶体嵌入基质中。 提供优选的粒度和数量/间距用于最佳调理。 颗粒被嵌入至少预定量（例如75％），以便提供均匀/可重复的调理，同时避免脱落的颗粒。 颗粒可以被嵌入，使得其尖端是共面的，或者使得金刚石尖端的轮廓形成多个弯曲区域。 还提供了一种用于检查末端执行器质量的方法。

公开(公告)号：US5989103A

公开(公告)日：1999-11-23

申请号：US933815

申请日：1997-09-19

申请人： Manoocher Birang ,  John Prince ,  James Nystrom

发明人： Manoocher Birang ,  John Prince ,  James Nystrom

IPC分类号： B23Q3/154 ,  B24B41/06 ,  B24B1/00

CPC分类号： B24B37/30 ,  B23Q3/1546 ,  B24B41/068

摘要： A carrier head assembly including a drive shaft and a system flange connectable to the drive shaft where the system flange includes a number of magnetic plates. The carrier head assembly also includes a carrier head flange. The carrier head flange has more magnetic plates, these magnetic plates generally facing the previous plates. The magnetic plates magnetically engage to couple the carrier head flange to the system flange.

摘要翻译： 一种载体头组件，其包括驱动轴和连接到驱动轴的系统凸缘，其中系统凸缘包括多个磁性板。 承载头组件还包括承载头凸缘。 载体头法兰具有更多的磁性板，这些磁性板通常面向以前的板。 磁性板磁性接合以将承载头凸缘与系统凸缘相连接。

公开(公告)号：US5938507A

公开(公告)日：1999-08-17

申请号：US549480

申请日：1995-10-27

申请人： Sen-Hou Ko ,  Richard V. Rafloski ,  James C. Nystrom ,  John Prince ,  Alfred A. Goldspiel ,  Stephen J. Blumenkranz ,  Manoocher Birang

发明人： Sen-Hou Ko ,  Richard V. Rafloski ,  James C. Nystrom ,  John Prince ,  Alfred A. Goldspiel ,  Stephen J. Blumenkranz ,  Manoocher Birang

IPC分类号： B24B53/017 ,  H01L21/304 ,  B24B21/18

CPC分类号： B24B53/017

摘要： A conditioner apparatus uses one or more linear conditioners. The linear conditioners extend from the edge of the polishing pad almost to the center of the pad. The conditioner apparatus may use two conditioner rods located on either side of a radial segment. The rods gimbal so that if one rod rises, the other rod is forced downwardly. In addition, the rods can pivot independently about a lateral axis, but they cannot pivot around the vertical axis. The linear conditioners may be actuated by a piezoelectric member or swept by an arm toward and away from the center of the polishing pad.

摘要翻译： 调节装置使用一个或多个线性调节器。 线性调节器从抛光垫的边缘几乎延伸到垫的中心。 调理装置可以使用位于径向段两侧的两个调节杆。 杆状万向节，如果一根杆上升，另一根杆被迫向下。 此外，杆可以围绕横向轴线独立地枢转，但是它们不能围绕垂直轴线枢转。 线性调节器可以由压电元件驱动，或者由臂朝着抛光垫的中心或远离抛光垫的中心扫动。

公开(公告)号：US5743784A

公开(公告)日：1998-04-28

申请号：US574501

申请日：1995-12-19

申请人： Manoocher Birang ,  John Prince

发明人： Manoocher Birang ,  John Prince

IPC分类号： B24B53/00 ,  B24B37/013 ,  B24B49/02 ,  B24B7/22 ,  B24B53/02

CPC分类号： B24B37/013 ,  B24B49/02

摘要： An apparatus and method for detecting the roughness of a CMP pad surface, in situ, during pad conditioning by measuring and making use of surface friction effects. The effect is advantageously exploited to determine an endpoint for the pad conditioning process i.e. when the surface roughness of the pad is within a desired range, to facilitate the qualification of conditioning process parameter changes by determining their effect on the conditioning process, and to optimize these parameters. Also, the effect is employed to measure non-uniformities in the pad's surface roughness, and to guide corrective measures. Generally, these objectives are accomplished using an apparatus which includes a floating head having its bottom surface in contact with the top surface of a rotating CMP pad undergoing a CMP pad conditioning process. A bracket is employed to restrain the floating head so as to prevent the head from moving along with the rotating CMP pad. A force sensing device is used to sense a restraining force exerted by the bracket on the floating head and to output a signal indicative of the restraining force. This restraining force is indicative of the friction between the floating head and the pad, and can be used to determine the coefficient of friction. The coefficient of friction is directly related to the surface roughness of the pad.

摘要翻译： 一种用于通过测量和利用表面摩擦效应在衬垫调节期间原位检测CMP焊盘表面的粗糙度的装置和方法。 有利地利用该效果来确定衬垫调节过程的端点，即当衬垫的表面粗糙度在期望的范围内时，以便于通过确定其对调理过程的影响来调节过程参数变化的限定，并优化这些 参数。 此外，该效果用于测量垫表面粗糙度中的不均匀性，并指导纠正措施。 通常，这些目的是使用包括浮动头的装置来实现的，该浮动头的底面与经历CMP垫调节过程的旋转CMP垫的顶表面相接触。 采用支架来限制浮动头，以防止头部与旋转的CMP垫一起移动。 力感测装置用于感测由支架施加在浮动头上的约束力并输出指示约束力的信号。 该约束力表示浮动头和垫之间的摩擦，并且可用于确定摩擦系数。 摩擦系数与垫的表面粗糙度直接相关。

公开(公告)号：US06443823B1

公开(公告)日：2002-09-03

申请号：US09478123

申请日：2000-01-05

申请人： Robert D. Tolles ,  Tsungan Cheng ,  John Prince

发明人： Robert D. Tolles ,  Tsungan Cheng ,  John Prince

IPC分类号： B24B722

CPC分类号： B24B37/30

摘要： A carrier head for a chemical mechanical polishing apparatus. A layer of conformable material is disposed in a recess of the carrier head to provide a mounting surface for a substrate. The conformable material may be elastic and undergo normal strain in response to an applied load. The carrier head may also include a support fixture detachably connected to a backing fixture, a retaining ring connected directly to the conformable material, and a shield ring which projects over a portion of the layer of conformable material.

摘要翻译： 用于化学机械抛光装置的载体头。 一层适形材料设置在承载头的凹槽中以提供用于基底的安装表面。 适形材料可以是弹性的并且响应于所施加的负载而经历正常应变。 承载头还可以包括可拆卸地连接到背衬固定件的支撑固定件，直接连接到适形材料的保持环，以及在适形材料层的一部分上突出的屏蔽环。

公开(公告)号：US09110931B2

公开(公告)日：2015-08-18

申请号：US11054701

申请日：2005-02-08

申请人： John Prince

发明人： John Prince

IPC分类号： G06F7/00 ,  G06F17/30

CPC分类号： G06F17/30283 ,  G06F17/2705 ,  G06F17/3002 ,  G06F17/30038 ,  G06F17/30053 ,  G06F17/30864 ,  G06F17/30867 ,  G06F17/30876 ,  G06F17/30997 ,  Y10S707/913 ,  Y10S707/923 ,  Y10S707/959 ,  Y10S707/99933 ,  Y10S707/99934 ,  Y10S707/99935 ,  Y10S707/99943 ,  Y10S707/99945 ,  Y10S707/99948

摘要： A method for querying metadata associated with media, such as multimedia and/or streaming media, on a computer network includes separating the metadata into keywords. The keywords are compared with valid keywords. A score is calculated in accordance with the degree of similarity between the keywords and valid keywords. If the degree of similarity is above a threshold, the metadata is qualified as valid metadata. Valid metadata is available for comparison and correction of other (invalid) metadata.

公开(公告)号：US20050154620A1

公开(公告)日：2005-07-14

申请号：US10707733

申请日：2004-01-08

申请人： Timothy Hentschel ,  John Prince

发明人： Timothy Hentschel ,  John Prince

IPC分类号： G06Q10/00 ,  G06F17/60

CPC分类号： G06Q10/02 ,  G06Q10/025

摘要： The Lexyl Online Group Reservations System is a network computer system and method in which a groups travel coordinator may gather information from Internet hotel booking engines and hotels in their desired destinations worldwide. The invention accomplishes this by collecting all necessary information from the group travel coordinator. It then uses this information to conduct a search of the Internet for rooms fitting the group coordinators needs. Once its search is completed, the system will automatically notify the hotel group managers through electronic mail. The group managers are then invited through this electronic mail invitation to enter the system and view the group travel coordinators booking needs. Once they have the required information, the system allows the hotel managers to respond with all necessary information about their hotel for the group travel coordinator to make their decision.

摘要翻译： Lexyl在线团队预约系统是一种网络计算机系统和方法，其中团队旅行协调员可以从互联网酒店预订引擎和全球所需目的地的酒店收集信息。 本发明通过从组旅行协调员收集所有必要的信息来实现。 然后使用这些信息对互联网搜索符合组协调员需求的房间。 搜索完成后，系统将通过电子邮件自动通知酒店集团经理。 然后，通过这个电子邮件邀请函邀请小组经理进入系统，并查看团队旅行协调员的预订需求。 一旦他们获得所需的信息，该系统允许酒店管理人员回答有关酒店的所有必要信息，供团队旅行协调员做出决定。

公开(公告)号：US06602116B1

公开(公告)日：2003-08-05

申请号：US09632504

申请日：2000-08-03

申请人： John Prince

发明人： John Prince

IPC分类号： B24B100

CPC分类号： B24B37/30 ,  B24B37/32

摘要： A retaining ring is configured for use with an apparatus for polishing a substrate. The substrate has upper and lower faces and a perimeter. The apparatus has a movable polishing pad with an upper polishing surface for contacting and polishing the lower face of the substrate. The retaining ring has a retaining face for engaging and retaining the substrate against lateral movement and a bottom face for contacting the polishing surface of the polishing pad. The bottom face of the retaining ring extends downward from an inner portion adjacent the retaining face to a lowermost portion radially outboard of the retaining face.

摘要翻译： 保持环被配置为与用于抛光衬底的设备一起使用。 基板具有上表面和下表面以及周边。 该装置具有可移动的抛光垫，该抛光垫具有用于接触和抛光基底的下表面的上抛光表面。 保持环具有用于接合和保持基板以防止侧向运动的保持面和用于接触抛光垫的抛光表面的底面。 保持环的底面从邻近保持面的内部向下延伸到保持面的径向外侧的最下部。

公开(公告)号：US06474509B1

公开(公告)日：2002-11-05

申请号：US10171938

申请日：2002-06-14

申请人： John Prince ,  Suzanne Prince

发明人： John Prince ,  Suzanne Prince

IPC分类号： B65D3534

CPC分类号： B65D35/34

摘要： A toothpaste dispensing device for dispensing toothpaste from a tube of toothpaste. The toothpaste dispensing device includes a housing comprises a perimeter wall defining an interior space of the housing. The housing comprises an access aperture extending through the perimeter wall whereby the access aperture is designed for permitting access into the interior space of the housing. A delivery assembly extends through the perimeter wall of the housing. The delivery assembly is designed for being coupled to a dispensing end of the tube of toothpaste. The delivery assembly is designed for transferring toothpaste squeezed from the tube of toothpaste through the perimeter wall of the housing. A dispensing assembly extends through the perimeter wall of the housing. The dispensing assembly is designed for being coupled to a crimped end of the tube of toothpaste whereby actuation of the dispensing assembly squeezes toothpaste into the delivery assembly.

摘要翻译： 一种用于从牙膏管分配牙膏的牙膏分配装置。 牙膏分配装置包括壳体，其包括限定壳体的内部空间的周边壁。 壳体包括延伸穿过周边壁的进入孔，由此进入孔被设计成允许进入壳体的内部空间。 输送组件延伸穿过壳体的周边壁。 输送组件被设计成耦合到牙膏管的分配端。 输送组件设计用于将从牙膏管挤出的牙膏转移通过外壳的周边壁。 分配组件延伸穿过壳体的周边壁。 分配组件被设计成耦合到牙膏管的压接端，由此分配组件的致动将牙膏挤压到输送组件中。