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6 条记录 (耗时 0.015 秒)

    Pressure measuring system
    1.
    发明授权
    Pressure measuring system 失效
    压力测量系统

    公开(公告)号：US4687927A

    公开(公告)日：1987-08-18

    申请号：US790501

    申请日：1985-10-23

    申请人： Katsuharu Iwamoto ,  Osamu Kawakami ,  Hideo Miyagawa ,  Ikuo Tashiro ,  Takiji Ishimura

    发明人： Katsuharu Iwamoto ,  Osamu Kawakami ,  Hideo Miyagawa ,  Ikuo Tashiro ,  Takiji Ishimura

    IPC分类号： G01L9/00

    CPC分类号： G01L9/0077

    摘要： A pressure measuring system wherein light is transmitted from a light source via a first optical fiber to a pressure-receiving diaphragm having a reflecting surface which undergoes a deflection in relation to the pressure being measured. The diaphragm reflects light transmitted thereto to a second optical fiber which transmits the reflected light to a first photosensitive element. A reference optical fiber is arranged approximately coextensive to the first and second optical fibers and transmits light from the light source in round trip fashion along substantially the same path as light transmitted by the first and second optical fibers to a second photosensitive element. The photosensitive elements produce respective electrical signals which are applied to an operational circuit which eliminates variations in the amount of light due to external disturbances by dividing one electrical signal by the other. With such a construction, it is possible to have a pressure measuring system which is unaffected by electromagnetic induction accompanying large currents and high voltages, which enables more accurate and more sensitive pressure measurements.

    摘要翻译： 一种压力测量系统，其中光从光源经由第一光纤传输到具有相对于被测压力发生偏转的反射表面的受压隔膜。 光阑反射透射到第一光纤的光，其将反射光透射到第一感光元件。 参考光纤被布置成与第一和第二光纤大致共同延伸，并且以与来自第一和第二光纤的光传播的光基本上相同的路径，以往复方式将光从光源透射到第二光敏元件。 感光元件产生相应的电信号，其被施加到操作电路，通过将一个电信号彼此分开来消除由于外部干扰导致的光量的变化。 通过这样的结构，可以具有不受电流感应影响的压力测量系统，其具有大电流和高电压，这使得能够进行更精确和更灵敏的压力测量。

    Base sequence detection apparatus and base sequence automatic analyzing apparatus
    2.
    发明申请
    Base sequence detection apparatus and base sequence automatic analyzing apparatus 审中-公开
    基序检测装置和基序自动分析装置

    公开(公告)号：US20080060940A1

    公开(公告)日：2008-03-13

    申请号：US11980409

    申请日：2007-10-31

    申请人： Sadato Hongo ,  Minoru Ishikawa ,  Takiji Ishimura ,  Shigeru Wakayama ,  Shinji Yanaga ,  Kenji Oki ,  Jun Okada

    发明人： Sadato Hongo ,  Minoru Ishikawa ,  Takiji Ishimura ,  Shigeru Wakayama ,  Shinji Yanaga ,  Kenji Oki ,  Jun Okada

    IPC分类号： G01N27/416

    CPC分类号： G01N33/5438

    摘要： A base sequence detection apparatus is provided with a channel formed on a base sequence detection chip. Working electrodes are formed along the channel and include a probe immobilized thereon, counter electrodes are formed on the inner surface of the channel and, reference electrodes are formed on the inner surface of the channel. An introduction port introduces solution or air from the upstream side of the channel, a delivery port delivers the solution or air in the channel, and the sample is injected into the channel through a sample injection port.

    摘要翻译： 碱基序列检测装置具有形成在基序列检测芯片上的信道。 沿通道形成工作电极，并且包括固定在其上的探针，在通道的内表面上形成相对电极，并且在通道的内表面上形成参考电极。 引入端口从通道的上游侧引入溶液或空气，输送口将溶液或空气输送到通道中，并且样品通过样品注入口注入通道。

    Electron beam drawing apparatus, electron beam drawing method, and a semiconductor device manufacturing method
    5.
    发明申请
    Electron beam drawing apparatus, electron beam drawing method, and a semiconductor device manufacturing method 审中-公开
    电子束描绘装置，电子束描绘法和半导体器件制造方法

    公开(公告)号：US20080001097A1

    公开(公告)日：2008-01-03

    申请号：US11812008

    申请日：2007-06-14

    申请人： Tetsuro Nakasugi ,  Takiji Ishimura

    发明人： Tetsuro Nakasugi ,  Takiji Ishimura

    IPC分类号： G03F7/23 ,  H01L21/66

    CPC分类号： B82Y40/00 ,  B82Y10/00 ,  H01J37/3174

    摘要： An electron beam drawing apparatus includes an acquisition unit which acquires a position data of an Nth drawing area, an acquisition unit which acquires a stage position and speed, a prediction unit which predicts a stage position when drawing on the Nth area is carried out, a determination unit which determines whether a distance from the stage position to the Nth area position is less than a deflection distance, a decision unit which, when the distance is less than the deflection distance, corrects a deflection distortion in accordance with the determined distance and decides a deflection voltage, a detection unit which detects a drawing end of an (N-1)th drawing area when drawing on the (N-1)th area is ended, and a drawing unit which, when the drawing end is detected, deflects an electron beam in accordance with the deflection voltage to draw a pattern on the Nth area.

    摘要翻译： 一种电子束描绘装置，包括获取第N绘制区域的位置数据的获取单元，获取阶段位置和速度的获取单元，预测在第N个区域进行绘制时的阶段位置的预测单元， 确定单元，其确定从舞台位置到第N个区域位置的距离是否小于偏转距离;判定单元，当距离小于偏转距离时，根据确定的距离校正偏转失真，并且确定 偏转电压，在第（N-1）区域上绘制时检测第（N-1）个绘图区域的绘制结束的检测单元结束，以及绘制单元，当检测到绘图结束时， 电子束根据偏转电压在第N个区域绘制图案。