公开(公告)号：US08314192B2

公开(公告)日：2012-11-20

申请号：US12375371

申请日：2006-07-28

申请人： Norikazu Tabata ,  Kazuhiko Hashisaka ,  Masahiro Sugimura ,  Takuo Sakamoto ,  Masaki Ue ,  Hiroyuki Nakayama ,  Seiji Fukuda

发明人： Norikazu Tabata ,  Kazuhiko Hashisaka ,  Masahiro Sugimura ,  Takuo Sakamoto ,  Masaki Ue ,  Hiroyuki Nakayama ,  Seiji Fukuda

IPC分类号： C08F2/00

CPC分类号： B24B37/24 ,  B24D18/0027 ,  C08F2/38 ,  C08F2/40 ,  C08F265/04 ,  C08F283/00 ,  C08J3/246 ,  C08L33/10 ,  C08L75/00 ,  C08L2205/04 ,  C08L75/04

摘要： The present invention relates to a process for producing an interpenetrating polymer network structure, which comprises the steps of impregnating a polymer molding with a radical polymerizable composition containing an ethylenically unsaturated compound and a radical polymerization initiator; and polymerizing the ethylenically unsaturated compound in a swollen state of the polymer molding impregnated with the radical polymerizable composition; wherein a chain transfer agent and/or a radical polymerization inhibitor are added to the radical polymerizable composition and/or the polymer molding before impregnating the polymer molding with the radical polymerizable composition. According to the present invention, a highly uniform interpenetrating polymer network structure can be obtained. The present invention also provides a polishing pad which is exhibits high in-plane uniformity of a polishing rate during polishing, and also has excellent flattening properties and improved pad lifetime during polishing, and a process for producing the same.

摘要翻译： 本发明涉及一种互穿聚合物网状结构体的制造方法，其特征在于，包括使含有烯键式不饱和化合物和自由基聚合引发剂的自由基聚合性组合物浸渍聚合物成型体的工序; 并在浸渍有自由基聚合性组合物的聚合物成型体的溶胀状态下聚合烯属不饱和化合物; 其中在用可自由基聚合的组合物浸渍聚合物模制品之前，将链转移剂和/或自由基聚合抑制剂加入到可自由基聚合的组合物和/或聚合物模制品中。 根据本发明，可以获得高度均匀的互穿聚合物网络结构。 本发明还提供一种研磨抛光时的研磨速度平面均匀性高的抛光垫，并且还具有优异的平坦化性能和抛光时的垫寿命的改善及其制造方法。

公开(公告)号：US20090280723A1

公开(公告)日：2009-11-12

申请号：US12375371

申请日：2006-07-28

申请人： Norikazu Tabata ,  Kazuhiko Hashisaka ,  Masahiro Sugimura ,  Takuo Sakamoto ,  Masaki Ue ,  Hiroyuki Nakayama ,  Seiji Fukuda

发明人： Norikazu Tabata ,  Kazuhiko Hashisaka ,  Masahiro Sugimura ,  Takuo Sakamoto ,  Masaki Ue ,  Hiroyuki Nakayama ,  Seiji Fukuda

IPC分类号： B24B1/00 ,  C08G18/00 ,  C09K3/14 ,  B24D3/32 ,  B24D7/00

CPC分类号： B24B37/24 ,  B24D18/0027 ,  C08F2/38 ,  C08F2/40 ,  C08F265/04 ,  C08F283/00 ,  C08J3/246 ,  C08L33/10 ,  C08L75/00 ,  C08L2205/04 ,  C08L75/04

摘要： The present invention relates to a process for producing an interpenetrating polymer network structure, which comprises the steps of impregnating a polymer molding with a radical polymerizable composition containing an ethylenically unsaturated compound and a radical polymerization initiator; and polymerizing the ethylenically unsaturated compound in a swollen state of the polymer molding impregnated with the radical polymerizable composition; wherein a chain transfer agent and/or a radical polymerization inhibitor are added to the radical polymerizable composition and/or the polymer molding before impregnating the polymer molding with the radical polymerizable composition. According to the present invention, a highly uniform interpenetrating polymer network structure can be obtained. The present invention also provides a polishing pad which is exhibits high in-plane uniformity of a polishing rate during polishing, and also has excellent flattening properties and improved pad lifetime during polishing, and a process for producing the same.

摘要翻译： 本发明涉及一种互穿聚合物网状结构体的制造方法，其特征在于，包括使含有烯键式不饱和化合物和自由基聚合引发剂的自由基聚合性组合物浸渍聚合物成型体的工序; 并在浸渍有自由基聚合性组合物的聚合物成型体的溶胀状态下聚合烯属不饱和化合物; 其中在用可自由基聚合的组合物浸渍聚合物模制品之前，将链转移剂和/或自由基聚合抑制剂加入到可自由基聚合的组合物和/或聚合物模制品中。 根据本发明，可以获得高度均匀的互穿聚合物网络结构。 本发明还提供一种研磨抛光时的研磨速度平面均匀性高的抛光垫，并且还具有优异的平坦化性能和抛光时的垫寿命的改善及其制造方法。