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1.发明授权Interpenetrating polymer network structure and polishing pad, and process for producing the same 失效互穿聚合物网络结构和抛光垫，及其制造方法公开(公告)号：US08314192B2
公开(公告)日：2012-11-20
申请号：US12375371
申请日：2006-07-28
申请人： Norikazu Tabata , Kazuhiko Hashisaka , Masahiro Sugimura , Takuo Sakamoto , Masaki Ue , Hiroyuki Nakayama , Seiji Fukuda
发明人： Norikazu Tabata , Kazuhiko Hashisaka , Masahiro Sugimura , Takuo Sakamoto , Masaki Ue , Hiroyuki Nakayama , Seiji Fukuda
IPC分类号： C08F2/00
CPC分类号： B24B37/24 , B24D18/0027 , C08F2/38 , C08F2/40 , C08F265/04 , C08F283/00 , C08J3/246 , C08L33/10 , C08L75/00 , C08L2205/04 , C08L75/04
摘要： The present invention relates to a process for producing an interpenetrating polymer network structure, which comprises the steps of impregnating a polymer molding with a radical polymerizable composition containing an ethylenically unsaturated compound and a radical polymerization initiator; and polymerizing the ethylenically unsaturated compound in a swollen state of the polymer molding impregnated with the radical polymerizable composition; wherein a chain transfer agent and/or a radical polymerization inhibitor are added to the radical polymerizable composition and/or the polymer molding before impregnating the polymer molding with the radical polymerizable composition. According to the present invention, a highly uniform interpenetrating polymer network structure can be obtained. The present invention also provides a polishing pad which is exhibits high in-plane uniformity of a polishing rate during polishing, and also has excellent flattening properties and improved pad lifetime during polishing, and a process for producing the same.
摘要翻译： 本发明涉及一种互穿聚合物网状结构体的制造方法，其特征在于，包括使含有烯键式不饱和化合物和自由基聚合引发剂的自由基聚合性组合物浸渍聚合物成型体的工序; 并在浸渍有自由基聚合性组合物的聚合物成型体的溶胀状态下聚合烯属不饱和化合物; 其中在用可自由基聚合的组合物浸渍聚合物模制品之前，将链转移剂和/或自由基聚合抑制剂加入到可自由基聚合的组合物和/或聚合物模制品中。 根据本发明，可以获得高度均匀的互穿聚合物网络结构。 本发明还提供一种研磨抛光时的研磨速度平面均匀性高的抛光垫，并且还具有优异的平坦化性能和抛光时的垫寿命的改善及其制造方法。
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2.发明申请公开(公告)号：US20090280723A1
公开(公告)日：2009-11-12
申请号：US12375371
申请日：2006-07-28
申请人： Norikazu Tabata , Kazuhiko Hashisaka , Masahiro Sugimura , Takuo Sakamoto , Masaki Ue , Hiroyuki Nakayama , Seiji Fukuda
发明人： Norikazu Tabata , Kazuhiko Hashisaka , Masahiro Sugimura , Takuo Sakamoto , Masaki Ue , Hiroyuki Nakayama , Seiji Fukuda
CPC分类号： B24B37/24 , B24D18/0027 , C08F2/38 , C08F2/40 , C08F265/04 , C08F283/00 , C08J3/246 , C08L33/10 , C08L75/00 , C08L2205/04 , C08L75/04
摘要： The present invention relates to a process for producing an interpenetrating polymer network structure, which comprises the steps of impregnating a polymer molding with a radical polymerizable composition containing an ethylenically unsaturated compound and a radical polymerization initiator; and polymerizing the ethylenically unsaturated compound in a swollen state of the polymer molding impregnated with the radical polymerizable composition; wherein a chain transfer agent and/or a radical polymerization inhibitor are added to the radical polymerizable composition and/or the polymer molding before impregnating the polymer molding with the radical polymerizable composition. According to the present invention, a highly uniform interpenetrating polymer network structure can be obtained. The present invention also provides a polishing pad which is exhibits high in-plane uniformity of a polishing rate during polishing, and also has excellent flattening properties and improved pad lifetime during polishing, and a process for producing the same.
摘要翻译： 本发明涉及一种互穿聚合物网状结构体的制造方法，其特征在于，包括使含有烯键式不饱和化合物和自由基聚合引发剂的自由基聚合性组合物浸渍聚合物成型体的工序; 并在浸渍有自由基聚合性组合物的聚合物成型体的溶胀状态下聚合烯属不饱和化合物; 其中在用可自由基聚合的组合物浸渍聚合物模制品之前，将链转移剂和/或自由基聚合抑制剂加入到可自由基聚合的组合物和/或聚合物模制品中。 根据本发明，可以获得高度均匀的互穿聚合物网络结构。 本发明还提供一种研磨抛光时的研磨速度平面均匀性高的抛光垫，并且还具有优异的平坦化性能和抛光时的垫寿命的改善及其制造方法。
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3.发明授权Particle distribution analysis method for computer readable storage medium for storing program for executing the method 有权用于存储用于执行该方法的程序的计算机可读存储介质的粒子分布分析方法公开(公告)号：US08768644B2
公开(公告)日：2014-07-01
申请号：US13175219
申请日：2011-07-01
申请人： Kunio Miyauchi , Hiroyuki Nakayama
发明人： Kunio Miyauchi , Hiroyuki Nakayama
IPC分类号： G01N31/00
CPC分类号： G01N15/0625 , G01N15/0227 , G06K9/6212 , G06K9/6218 , H01L22/20
摘要： There is provided a support method for a particle distribution analysis for a substrate. In the support method, histogram data of inter-particle distances are created for all particles on a target substrate subjected to the particle distribution analysis from particle coordinate data of the target substrate. Further, histogram data of inter-particle distances are created for multiple virtual substrates each having the same number of randomly distributed particles as the particles on the target substrate. Based on a difference between the histogram data of the target substrate and the histogram data of each of the virtual substrates, determination data are created by quantifying a distance between the histogram data of the target substrate and the histogram data of the multiple virtual substrates, and the determination data are displayed on a display unit.
摘要翻译： 提供了用于衬底的粒子分布分析的支持方法。 在支持方法中，通过目标基板的粒子坐标数据，对经过粒子分布分析的目标基板上的所有粒子产生粒子间距离的直方图数据。 此外，针对每个具有与目标衬底上的粒子相同数量的随机分布的粒子的多个虚拟衬底创建颗粒间距离的直方图数据。 基于目标基板的直方图数据和每个虚拟基板的直方图数据之间的差异，通过量化目标基板的直方图数据与多个虚拟基板的直方图数据之间的距离来创建确定数据，以及 确定数据显示在显示单元上。
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公开(公告)号：US08409328B2
公开(公告)日：2013-04-02
申请号：US12726598
申请日：2010-03-18
申请人： Jun Yamawaku , Junji Oikawa , Hiroyuki Nakayama
发明人： Jun Yamawaku , Junji Oikawa , Hiroyuki Nakayama
IPC分类号： B03C3/016
CPC分类号： H01L21/67781 , H01L21/67017
摘要： A substrate transfer device includes an atmosphere introduction unit and an atmosphere exhaust unit provided at a top and a bottom portion of a main body of the device, respectively; and a substrate transfer mechanism provided between the atmosphere introduction unit and the atmosphere exhaust unit. The substrate transfer device further includes a downward flow forming unit provided, adjacent to the atmosphere introduction unit, to allow an atmosphere to be introduced through the atmosphere introduction unit and to downwardly flow through the substrate transfer mechanism and be exhausted through the atmosphere exhaust unit; and a gas ionizing unit for ionizing the atmosphere and a particle collecting unit for collecting particles included in the atmosphere, the gas ionizing unit and the particle collecting unit being sequentially provided in the direction in which the atmosphere downwardly flows, between the downward flow forming unit and the substrate transfer mechanism.
摘要翻译： 基板转印装置包括分别设置在装置的主体的顶部和底部的气氛引入单元和气体排出单元; 以及设置在大气引入单元和大气排气单元之间的基板输送机构。 基板转印装置还包括与大气引入单元相邻设置的向下流动形成单元，以允许气氛通过大气引入单元引入并向下流过基板传送机构并通过大气排气单元排出; 和用于使气氛离子化的气体离子化单元和用于收集包含在大气中的颗粒的颗粒收集单元，气体离子化单元和颗粒收集单元沿着大气向下流动的方向依次设置在下流形成单元 和基板转印机构。
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公开(公告)号：US08398745B2
公开(公告)日：2013-03-19
申请号：US12726612
申请日：2010-03-18
申请人： Jun Yamawaku , Junji Oikawa , Hiroyuki Nakayama
发明人： Jun Yamawaku , Junji Oikawa , Hiroyuki Nakayama
CPC分类号： H01L21/67017
摘要： A substrate processing apparatus includes a processing chamber for accommodating therein a processing target substrate; a gas exhaust path through which a gas inside the processing chamber is exhausted; one or more exhaust pumps provided in the gas exhaust path; and a scrubber for collecting harmful components from an exhaust gas. The apparatus further includes an ionized gas supply unit for supplying to the gas exhaust path an ionized gas for neutralizing charged particles included in the exhaust gas flowing therethrough.
摘要翻译： 基板处理装置包括：处理室，用于在其中容纳加工对象基板; 气体排出通道，处理室内的气体通过该排气路径排出; 设置在排气通道中的一个或多个排气泵; 以及用于从废气中收集有害成分的洗涤器。 该装置还包括电离气体供应单元，用于向气体排出通道供应用于中和包含在流过其中的废气中的带电粒子的电离气体。
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公开(公告)号：US08337629B2
公开(公告)日：2012-12-25
申请号：US13495404
申请日：2012-06-13
CPC分类号： H01L21/67028 , B08B3/12 , H01J37/32862 , H01L21/6831
摘要： To clean an element in a vacuum chamber by causing particles sticking to the element to scatter, the present invention uses a means for applying a voltage to the element and causing the particles to scatter by utilizing Maxwell's stress, a means for electrically charging the particles and causing the particles to scatter by utilizing the Coulomb force, a means for introducing a gas into the vacuum chamber and causing the particles sticking to the element to scatter by causing a gas shock wave to hit the element, a means for heating the element and causing the particles to scatter by utilizing the thermal stress and thermophoretic force, or a means for causing the particles to scatter by applying mechanical vibrations to the element. The thus scattered particles are removed by carrying them in a gas flow in a relatively high pressure atmosphere.
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公开(公告)号：US08330454B2
公开(公告)日：2012-12-11
申请号：US12578083
申请日：2009-10-13
IPC分类号： G01B7/14
CPC分类号： G01D5/145 , F16H59/0204 , F16H59/105
摘要： A position detection apparatus includes a position detection target member, a magnet that moves in accordance with movement of the position detection target member, and a plurality of magnetic detectors provided on a surface opposite a movement plane of the magnet. A flat yoke is provided on the reverse face of the magnet. The magnetic polarity of a peripheral side part of the magnet is opposite to the magnetic polarity of a center part thereof. The peripheral side part is formed at a regional range that can be defined on the basis of a predetermined distance(s) measured from a side edge of the yoke.
摘要翻译： 位置检测装置包括位置检测对象部件，根据位置检测对象部件的移动而移动的磁体以及设置在与磁体的移动面相反的面的多个磁检测器。 在磁铁的背面设置有扁平磁轭。 磁体的周边侧部分的磁极性与其中心部分的磁极性相反。 周边部分形成在可以基于从轭的侧边缘测量的预定距离来限定的区域范围。
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公开(公告)号：US20120285623A1
公开(公告)日：2012-11-15
申请号：US13559373
申请日：2012-07-26
申请人： Tsuyoshi MORIYA , Hiroyuki Nakayama
发明人： Tsuyoshi MORIYA , Hiroyuki Nakayama
IPC分类号： H01L21/3065 , B05C11/00
CPC分类号： H01J37/32431 , H01J2237/022
摘要： There is provided a plasma processing apparatus including a plasma generating unit for generating a plasma in a processing chamber in which a set processing is performed on a substrate serving as an object to be processed. The plasma processing apparatus further includes a particle moving unit for electrostatically driving particles in a region above the substrate to be removed out of the region above the substrate in the processing chamber while the processing on the substrate is performed by using the plasma. In addition, there is provided a plasma processing method of a plasma processing apparatus including the steps of generating plasma in a processing chamber in which a set processing is performed on a substrate serving as an object to be processed; and performing the processing on the substrate by the plasma.
摘要翻译： 提供了一种等离子体处理装置，其包括等离子体产生单元，用于在处理室中产生等离子体，其中对作为待处理对象的基板进行设定处理。 等离子体处理装置还包括一个粒子移动单元，用于在通过使用等离子体进行基板上的处理的同时，在处理室中的基板上方的区域中，将基板上方的区域中的颗粒静电驱动。 此外，提供了一种等离子体处理装置的等离子体处理方法，其包括以下步骤：在对作为被处理对象的基板进行设定处理的处理室中产生等离子体; 并通过等离子体对衬底进行处理。
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公开(公告)号：US08303834B2
公开(公告)日：2012-11-06
申请号：US12411953
申请日：2009-03-26
申请人： Masanobu Honda , Kenji Masuzawa , Hiroyuki Nakayama , Manabu Iwata , Manabu Sato , Kazuki Narishige
发明人： Masanobu Honda , Kenji Masuzawa , Hiroyuki Nakayama , Manabu Iwata , Manabu Sato , Kazuki Narishige
CPC分类号： H01J37/32027 , H01J37/32091
摘要： A plasma processing apparatus includes an inner upper electrode provided to face a lower electrode mounting thereon a substrate, an outer upper electrode provided in a ring shape at a radially outside of the inner upper electrode and electrically isolated from the inner upper electrode in a vacuum evacuable processing chamber and a processing gas supply unit for supplying a processing gas into a processing space between the inner and the outer upper electrode and the lower electrode. A radio frequency (RF) power supply unit is also provide to apply a RF power to the lower electrode or the inner and the outer upper electrode to generate a plasma of the processing gas by RF discharge. A first and a second DC power supply unit are provided to apply a first and a second variable DC voltage to the inner upper electrode, respectively.
摘要翻译： 一种等离子体处理装置，包括：内部上部电极，其设置在其上安装有基板的下部电极;外部上部电极，其在所述内部上部电极的径向外侧设置成环状，并且在真空抽真空中与所述内部上部电极电隔离 处理室和处理气体供应单元，用于将处理气体供应到内外电极和下电极之间的处理空间中。 射频（RF）电源单元还提供向下电极或内外电极施加RF功率以通过RF放电产生处理气体的等离子体。 提供第一和第二直流电源单元，以分别向内部上部电极施加第一和第二可变直流电压。
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公开(公告)号：US08298622B2
公开(公告)日：2012-10-30
申请号：US11407907
申请日：2006-04-21
IPC分类号： C08F2/48
CPC分类号： B01J19/123 , C01B33/1585
摘要： Methods for producing a silica aerogel coating by: producing a wet gel formed by the hydrolysis and polymerization of an alkoxysilane having an ultraviolet-polymerizable unsaturated group; organically modifying the wet gel with an organic-modifying agent to obtain an organically modified silica having a modification ratio of 10-30% based on a total amount of Si—OH in the wet gel; coating a dispersion of the organically modified silica on a substrate to form a layer; and subjecting the layer of the organically modified silica to ultraviolet irradiation and baking, wherein the silica aerogel coating includes the organically modified silica and wherein the silica aerogel coating has a refractive index in the range of 1.05-1.2.
摘要翻译： 二氧化硅气凝胶涂层的制造方法：制造通过具有紫外线聚合性不饱和基团的烷氧基硅烷的水解和聚合而形成的湿凝胶; 用有机改性剂有机改性湿凝胶，得到基于湿凝胶中Si-OH总量的改性比为10-30％的有机改性二氧化硅; 将有机改性二氧化硅的分散体涂布在基材上以形成层; 并对有机改性二氧化硅层进行紫外线照射和烘烤，其中二氧化硅气凝胶涂层包括有机改性二氧化硅，其中二氧化硅气凝胶涂层的折射率在1.05-1.2范围内。
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