Charged particle beam generating apparatus, charged particle beam apparatus, high voltage generating apparatus, and high potential apparatus
    3.
    发明授权
    Charged particle beam generating apparatus, charged particle beam apparatus, high voltage generating apparatus, and high potential apparatus 有权
    带电粒子束产生装置,带电粒子束装置,高压发生装置和高电位装置

    公开(公告)号:US09548182B2

    公开(公告)日:2017-01-17

    申请号:US14406909

    申请日:2013-05-08

    摘要: An instrument producing a charged particle beam according to the present invention is provided with: a charged particle source; a plurality of first electrodes disposed along a direction of irradiation of charged particles from the charged particle source; a plurality of insulation members disposed between the first electrodes; and a housing mounted around the plurality of first electrodes. The housing is formed from an insulating solid material, and includes a plurality of second electrodes disposed at positions in proximity to the plurality of first electrodes. At least one of the plurality of second electrodes is electrically connected to at least one of the plurality of first electrodes, each of the plurality of second electrodes having the same potential as the potential of the proximate one of the first electrodes.

    摘要翻译: 根据本发明的产生带电粒子束的仪器具有:带电粒子源; 多个第一电极,其沿带电粒子源的带电粒子的照射方向设置; 设置在所述第一电极之间的多个绝缘构件; 以及围绕所述多个第一电极安装的壳体。 壳体由绝缘固体材料形成,并且包括设置在靠近多个第一电极的位置处的多个第二电极。 所述多个第二电极中的至少一个电连接到所述多个第一电极中的至少一个,所述多个第二电极中的每一个具有与所述第一电极中的所述第一电极的电位相同的电位。

    Plasma Arc Chamber
    4.
    发明申请
    Plasma Arc Chamber 有权
    等离子弧室

    公开(公告)号:US20150270093A1

    公开(公告)日:2015-09-24

    申请号:US14222147

    申请日:2014-03-21

    IPC分类号: H01J37/04 H05H1/34

    摘要: The plasma arc chamber is made in part of a one piece base fabricated from 95.95% pure tungsten having four rigid walls defining a rectangular central opening. A bottom plate closes the bottom of the base and a cover with a slit for the passage of an ion beam closes the top of the base. Liners are fitted into the bottom plate, the top of base and against the four walls of the base.

    摘要翻译: 等离子体电弧室是由95.95%纯钨制成的一体式基座的一部分,其具有限定矩形中心开口的四个刚性壁。 底板封闭基座的底部,并且具有用于离子束通过的狭缝的盖封闭基座的顶部。 衬里装配到底板,底座的顶部和底座的四个墙壁上。

    MULTI-ELECTRODE STACK ARRANGEMENT
    5.
    发明申请
    MULTI-ELECTRODE STACK ARRANGEMENT 有权
    多电极堆栈布置

    公开(公告)号:US20150137010A1

    公开(公告)日:2015-05-21

    申请号:US14541238

    申请日:2014-11-14

    摘要: The invention relates to an electrode stack (70) comprising stacked electrodes (71-80) for manipulating a charged particle beam along an optical axis (A). Each electrode comprises an electrode body with an aperture for the charged particle beam. The electrode bodies are mutually spaced and the electrode apertures are coaxially aligned along the optical axis. The electrode stack comprises electrically insulating spacing structures (89) between each pair of adjacent electrodes for positioning the electrodes (71-80) at predetermined mutual distances along the axial direction (Z). A first electrode and a second electrode each comprise an electrode body with one or more support portions (86), wherein each support portion is configured to accommodate at least one spacing structure (89). The electrode stack has at least one clamping member (91-91c) configured to hold the support portions (86) of the first and second electrodes, as well as the intermediate spacing structure (89) together.

    摘要翻译: 本发明涉及一种电极堆叠(70),其包括用于沿光轴(A)操纵带电粒子束的堆叠电极(71-80)。 每个电极包括具有用于带电粒子束的孔的电极体。 电极体相互间隔开,并且电极孔沿光轴同轴对准。 电极堆叠包括在每对相邻电极之间的电绝缘间隔结构(89),用于将电极(71-80)沿着轴向方向(Z)定位在预定的相互距离处。 第一电极和第二电极各自包括具有一个或多个支撑部分(86)的电极主体,其中每个支撑部分构造成容纳至少一个间隔结构(89)。 电极堆叠具有至少一个构造成将第一和第二电极的支撑部分(86)以及中间间隔结构(89)保持在一起的夹紧构件(91-91c)。

    MULTI-ELECTRODE COOLING ARRANGEMENT
    6.
    发明申请
    MULTI-ELECTRODE COOLING ARRANGEMENT 有权
    多电极冷却装置

    公开(公告)号:US20150137009A1

    公开(公告)日:2015-05-21

    申请号:US14541236

    申请日:2014-11-14

    摘要: The invention relates to a collimator electrode, comprising an electrode body (81) that is provided with a central electrode aperture (82), wherein the electrode body defines an electrode height between two opposite main surfaces, and wherein the electrode body accommodates a cooling conduit (105) inside the electrode body for transferring a cooling liquid (102). The electrode body preferably has a disk shape or an oblate ring shape.The invention further relates to a collimator electrode stack for use in a charged particle beam generator, comprising a first collimator electrode and a second collimator electrode that are each provided with a cooling conduit (105) for transferring the cooling liquid (102), and a connecting conduit (110) for a liquid connection between the cooling conduits of the first and second collimator electrodes.

    摘要翻译: 本发明涉及一种准直器电极,包括设置有中心电极孔(82)的电极体(81),其中电极体限定两个相对的主表面之间的电极高度,并且其中电极体容纳冷却导管 (105),用于传送冷却液(102)。 电极体优选具有盘状或扁圆形状。 本发明还涉及一种用于带电粒子束发生器的准直器电极叠层,其包括第一准直器电极和第二准直器电极,每个准直器电极和第二准直器电极都设置有用于传送冷却液体(102)的冷却导管(105) 连接导管(110)用于第一和第二准直仪电极的冷却管道之间的液体连接。

    CHARGED PARTICLE BEAM APPARATUS
    8.
    发明申请

    公开(公告)号:US20140175278A1

    公开(公告)日:2014-06-26

    申请号:US14191769

    申请日:2014-02-27

    IPC分类号: H01J37/18 H01J37/244

    摘要: Provided is a charged particle beam apparatus or charged particle microscope capable of observing an observation target sample in an air atmosphere or a gas environment without making significant changes to the configuration of a conventional high vacuum charged particle microscope. In a charged particle beam apparatus configured such that a thin film (10) is used to separate a vacuum environment and an air atmosphere (or a gas environment), an attachment (121) capable of holding the thin film (10) and whose interior can be maintained at an air atmosphere or a gas environment is inserted into a vacuum chamber (7) of a high vacuum charged particle microscope. The attachment (121) is vacuum-sealed and fixed to a vacuum partition of the vacuum sample chamber. Image quality is further improved by replacing the atmosphere in the attachment with helium or a light-elemental gas that has a lower mass than atmospheric gases such as nitrogen or water vapor.

    Titanium diboride coating for plasma processing apparatus
    9.
    发明授权
    Titanium diboride coating for plasma processing apparatus 有权
    用于等离子体处理设备的二硼化钛涂层

    公开(公告)号:US08592783B2

    公开(公告)日:2013-11-26

    申请号:US13245035

    申请日:2011-09-26

    IPC分类号: G21K5/00

    摘要: An improved plasma processing chamber is disclosed, wherein some or all of the components which are exposed to the plasma are made of, or coated with, titanium diborane. Titanium diborane has a hardness in excess of 9 mhos, making it less susceptible to sputtering. In addition, titanium diborane is resistant to fluoride and chlorine ions. Finally, titanium diborane is electrically conductive, and therefore the plasma remains more uniform over time, as charge does not build on the surfaces of the titanium diborane components. This results in improved workpiece processing, with less contaminants and greater uniformity. In other embodiments, titanium diborane may be used to line components within a beam line implanter.

    摘要翻译: 公开了一种改进的等离子体处理室,其中暴露于等离子体的部分或全部组分由钛乙硼烷制成或涂覆。 钛乙硼烷的硬度超过9毫摩尔,使其不易溅射。 此外,乙硼烷钛耐氟化物和氯离子。 最后,乙硼烷钛是导电的,因此随着时间的推移,等离子体保持更均匀,因为电荷不会在钛二硼烷组分的表面上形成。 这导致改进的工件加工,更少的污染物和更大的均匀性。 在其它实施方案中,可以使用乙硼烷钛来在束线注入机内引导组分。

    APPARATUS FOR EVALUATING LUBRICAN
    10.
    发明申请
    APPARATUS FOR EVALUATING LUBRICAN 审中-公开
    评估润滑油的装置

    公开(公告)号:US20130239663A1

    公开(公告)日:2013-09-19

    申请号:US13872950

    申请日:2013-04-29

    IPC分类号: G01N33/00

    摘要: An apparatus having a vacuum vessel that has a mechanism using a lubricant therein and not causing defects and faults to samples introduced into the vacuum vessel even it is an apparatus where lubricating oil or grease is applied is provided. An apparatus having a vacuum vessel that has a mechanism using a lubricant therein such as CD-SEM, in which a lubricant (oil, grease) whose adsorption amount per minute to a surface of a material introduced into the vacuum vessel of an apparatus for evaluating a lubricant after the start of vacuum evacuation and after reaches a quasi-equilibrium state is below 0.09 ng/cm2 is employed.

    摘要翻译: 具有真空容器的装置是具有使用润滑剂的机构,即使是施加润滑油或润滑脂的装置,也不会引入到真空容器中的样品的缺陷和缺陷。 一种具有真空容器的设备,该真空容器具有使用其中的润滑剂的机构,例如CD-SEM,其中将润滑剂(油,油脂)的每分钟吸附量引入到用于评估的设备的真空容器中的材料的表面 真空抽真空后达到准平衡状态后的润滑剂低于0.09ng / cm2。