METHODS FOR DEPOSITING III-ALLOYS ON SUBSTRATES AND COMPOSITIONS THEREFROM

    公开(公告)号:US20220108889A1

    公开(公告)日:2022-04-07

    申请号:US17495913

    申请日:2021-10-07

    Abstract: A method for depositing III-V alloys on substrates and compositions therefrom. A first layer comprises a Group III element. A second layer comprises a silica. A substrate has a surface. The second layer is deposited onto a first layer. The depositing is performed by a sol-gel method. The second layer is exposed to a precursor that comprises a Group V element. At least one of the precursor or the Group V element diffuse through the silica. The first layer is transformed into a solid layer comprising a III-V alloy, wherein at least a portion of the first layer to a liquid. The silica retains the liquified first layer, enabling at least one of the precursor or the Group V element to diffuse into the liquid, resulting in the forming of the III-V alloy.

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