-
公开(公告)号：US6157133A
公开(公告)日：2000-12-05
申请号：US90162
申请日：1998-06-04
CPC分类号： H01J61/18 , H01J65/042
摘要： A sealed, metal oxide, electrodeless discharge lamp having a high emissionntensity in the visible 400-700 nm range. Within the sealed container assembly of the lamp there is a source of metal atoms capable of forming a volatile oxide and a source of an oxygen containing gas. The lamp produces a plasma and volatilizes the metal into the plasma. Preferably the lamp is at a low pressure of about 20-40 torr and the metals are molybdenum or tungsten. Power is applied by inductively coupled electromagnetic radiation. A regenerative agent such as a halogen is added for recycling any deposited metal into the gas phase and to form a volatile compound with the source of metal atoms. The agent lowers the temperatures needed to volatilize the metal into the plasma. The lamp is operated by first providing energy at a low level to initiate the plasma and then supplying the metal atoms into the plasma.
摘要翻译： 一种密封的金属氧化物无电极放电灯，其可见光范围为400-700nm，发光强度高。 在灯的密封容器组件内，存在能够形成挥发性氧化物和含氧气体源的金属原子源。 灯产生等离子体并将金属挥发成等离子体。 优选地，灯处于约20-40托的低压，并且金属是钼或钨。 电感通过电感耦合电磁辐射施加。 加入诸如卤素的再生剂用于将任何沉积的金属再循环到气相中并与金属原子源形成挥发性化合物。 该试剂降低将金属挥发成等离子体所需的温度。 通过首先以低水平提供能量以启动等离子体，然后将金属原子供应到等离子体中来操作灯。
-
公开(公告)号：US08481109B2
公开(公告)日：2013-07-09
申请号：US12597764
申请日：2008-08-06
CPC分类号： G02B5/285
摘要： The present invention provides a method of forming a flexible dichroic optical filter. The method comprises depositing a plurality of pairs of layers adjacent a substrate. Each of the plurality of pairs of layers includes a first layer formed of a silicon-and-carbon containing material having a first index of refraction and a second layer formed of a silicon-and-carbon containing material having a second index of refraction that is different than the first index of refraction.
摘要翻译： 本发明提供一种形成柔性二向色滤光器的方法。 该方法包括在衬底附近沉积多对层。 多对层中的每一层包括由具有第一折射率的含硅和碳的材料形成的第一层和由具有第二折射率的含硅和碳的材料形成的第二层，所述第二层是第二折射率 不同于第一折射率。
-
公开(公告)号：US20100284088A1
公开(公告)日：2010-11-11
申请号：US12597764
申请日：2008-08-06
CPC分类号： G02B5/285
摘要： The present invention provides a method of forming a flexible dichroic optical filter. The method comprises depositing a plurality of pairs of layers adjacent a substrate. Each of the plurality of pairs of layers includes a first layer formed of a silicon-and-carbon containing material having a first index of refraction and a second layer formed of a silicon-and-carbon containing material having a second index of refraction that is different than the first index of refraction.
摘要翻译： 本发明提供一种形成柔性二向色滤光器的方法。 该方法包括在衬底附近沉积多对层。 多对层中的每一层包括由具有第一折射率的含硅和碳的材料形成的第一层和由具有第二折射率的含硅和碳的材料形成的第二层，所述第二层是第二折射率 不同于第一折射率。
-
4.发明申请Roll-To-Roll Plasma Enhanced Chemical Vapor Deposition Method of Barrier Layers Comprising Silicon And Carbon 审中-公开包括硅和碳的阻隔层的辊对辊等离子体增强化学气相沉积方法公开(公告)号：US20100092781A1
公开(公告)日：2010-04-15
申请号：US12576646
申请日：2009-10-09
申请人： Ludmil M. Zambov , Vasgen A. Shamamian , William K. Weidner , Mark J. Loboda , Steve A. Snow , Glenn A. Cerny
发明人： Ludmil M. Zambov , Vasgen A. Shamamian , William K. Weidner , Mark J. Loboda , Steve A. Snow , Glenn A. Cerny
CPC分类号： C23C16/545 , C23C16/30 , C23C16/325 , Y10T428/249978 , Y10T428/31507 , Y10T428/3154 , Y10T428/31663
摘要： A method and process for forming a barrier layer on a flexible substrate are provided. A continuous roll-to-roll method includes providing a substrate to a processing chamber using at least one roller configured to guide the substrate through the processing chamber. The process includes depositing a barrier layer adjacent the substrate by exposing at least one portion of the substrate that is within the processing chamber to plasma comprising a silicon-and-carbon containing precursor gas. Also provided is a coated flexible substrate comprising a barrier layer based on the structural unit SiC:H, or SiOC:H, or SiOCN:H. The barrier layer possesses high density and low porosity. The barrier layer exhibits low water vapor transmission rate (WVTR) in the range of 10−2-10−4 g·m−2d−1 and is appropriate for very low permeability applications.
摘要翻译： 提供了在柔性基板上形成阻挡层的方法和工艺。 连续的卷对卷方法包括使用至少一个被配置为将基底引导通过处理室的辊将处理室提供衬底。 该方法包括通过将处理室内的衬底的至少一部分暴露于包含含硅和碳的前体气体的等离子体来沉积邻近衬底的阻挡层。 还提供了包括基于结构单元SiC：H或SiOC：H或SiOCN：H的阻挡层的涂覆的柔性基材。 阻隔层具有高密度和低孔隙率。 阻隔层在10-2-10-4g·m-2d-1的范围内表现出低的水蒸汽透过率（WVTR），适用于极低渗透性的应用。
-
-
-
搜索结果
4 条记录 (耗时 0.012 秒)
